13H-tetracosafluoro-tridecanoic acid | 423-73-4

• 分子结构分类: 有机化合物 - 脂质和类脂质分子 - 脂肪酰基
• 英文名称: 13H-tetracosafluoro-tridecanoic acid
• 英文别名: 13H-Tetracosafluor-tridecansaeure；13-H-Perfluorotridecanoic acid；2,2,3,3,4,4,5,5,6,6,7,7,8,8,9,9,10,10,11,11,12,12,13,13-tetracosafluorotridecanoic acid
• CAS: 423-73-4
• 化学式: C₁₃H₂F₂₄O₂
• 分子量: 646.119
• InChiKey: KPYKBTOWOKVJKN-UHFFFAOYSA-N

物化性质

• 沸点：
  278.5±35.0 °C(Predicted)
• 密度：
  1.749±0.06 g/cm3(Predicted)
• 熔点：
  138 °C(Solv: benzene (71-43-2))

计算性质

• 辛醇/水分配系数(LogP)：
  8
• 重原子数：
  39
• 可旋转键数：
  12
• 环数：
  0.0
• sp3杂化的碳原子比例：
  0.92
• 拓扑面积：
  37.3
• 氢给体数：
  1
• 氢受体数：
  26

反应信息

• 作为产物：
  描述：

  1H,1H,13H-全氟-1-十三醇 在 potassium permanganate 、 溶剂黄146 作用下， 生成 13H-tetracosafluoro-tridecanoic acid
  参考文献：
  名称：

  氟代醇

  摘要：

  DOI：

  10.1021/ie50595a028

文献信息

• METHOD FOR FORMING MULTILAYER RESIST
  申请人：DAIKIN INDUSTRIES, LTD.

  公开号：EP1686425A1

  公开（公告）日：2006-08-02

  There is formed a laminated resist which exhibits sufficient reflection reducing effect in a photolithography process using light of vacuum ultraviolet region and also has sufficient developing characteristics in a developing process. The method of forming the laminated photoresist comprises (I) a step for forming the photoresist layer (L1) on a substrate and (II) a step for forming the antireflection layer (L2) on the photoresist layer (L1) by applying the coating composition containing the fluorine-containing polymer (A) having hydrophilic group Y. The fluorine-containing polymer (A) contains a structural unit derived from a fluorine-containing ethylenic monomer having hydrophilic group Y and is characterized in that (i) the hydrophilic group Y contains an acidic OH group having a pKa value of not more than 11, (ii) a fluorine content is not less than 50 % by mass, and (iii) the number of moles of the hydrophilic group Y in 100 g of the fluorine-containing polymer (A) is not less than 0.14.

  形成了一种层状光刻胶，它在使用真空紫外区光的光刻工艺中显示出足够的减反射效果，并且在显影工艺中具有足够的显影特性。形成层状光刻胶的方法包括：(I) 在基底上形成光刻胶层 (L1) 的步骤；(II) 在光刻胶层 (L1) 上形成抗反射层 (L2) 的步骤，该步骤通过涂敷含有亲水基团 Y 的含氟聚合物 (A) 的涂层组合物来实现。含氟聚合物(A)含有由具有亲水基团 Y 的含氟乙烯单体衍生的结构单元，其特征在于：(i) 亲水基团 Y 含有 pKa 值不大于 11 的酸性 OH 基团；(ii) 氟含量不小于 50%（按质量计）；(iii) 100 克含氟聚合物(A)中亲水基团 Y 的摩尔数不小于 0.14。
• Polyfluoroalkanoic compounds and their preparation
  申请人：DU PONT

  公开号：US02559629A1

  公开（公告）日：1951-07-10
• LEHMS, INGEBURG;SLIWINSKI, SIEGFRIED;KADEN, REINFRIED
  作者：LEHMS, INGEBURG、SLIWINSKI, SIEGFRIED、KADEN, REINFRIED

  DOI：——

  日期：——
• Method of forming laminated resist
  申请人：Araki Takayuki

  公开号：US20070196763A1

  公开（公告）日：2007-08-23

  There is formed a laminated resist which exhibits sufficient reflection reducing effect in a photolithography process using light of vacuum ultraviolet region and also has sufficient developing characteristics in a developing process. The method of forming the laminated photoresist comprises (I) a step for forming the photoresist layer (L 1 ) on a substrate and (II) a step for forming the antireflection layer (L 2 ) on the photoresist layer (L 1 ) by applying the coating composition containing the fluorine-containing polymer (A) having hydrophilic group Y. The fluorine-containing polymer (A) contains a structural unit derived from a fluorine-containing ethylenic monomer having hydrophilic group Y and is characterized in that (i) the hydrophilic group Y contains an acidic OH group having a pKa value of not more than 11, (ii) a fluorine content is not less than 50% by mass, and (iii) the number of moles of the hydrophilic group Y in 100 g of the fluorine-containing polymer (A) is not less than 0.14.
• Fluoro Alcohols
  作者：Donald R. Baer

  DOI：10.1021/ie50595a028

  日期：1959.7