RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN
申请人:TOKYO OHKA KOGYO CO., LTD.
公开号:US20200174369A1
公开(公告)日:2020-06-04
A resist composition including a compound (D0) represented by general formula (d0) and a resin component (A1) has a structural unit (a0) in which a compound represented by general formula (a0-1) has a polymerizable group within the W
1
portion converted into a main chain (in formula (d0), Rd
01
represents a fluorine atom or a fluorinated alkyl group; In formula (a0-1), W
1
represents a polymerizable group-containing group; C
t
represents a tertiary carbon atom, and the α-position of C
t
is a carbon atom which constitutes a carbon-carbon unsaturated bond; R
11
represents an aromatic hydrocarbon group; or a chain hydrocarbon group; R
12
and R
13
each independently represents a chain hydrocarbon group, or R
12
and R
13
are mutually bonded to form a cyclic group).