RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN
申请人:TOKYO OHKA KOGYO CO., LTD.
公开号:US20200174369A1
公开(公告)日:2020-06-04
A resist composition including a compound (D0) represented by general formula (d0) and a resin component (A1) has a structural unit (a0) in which a compound represented by general formula (a0-1) has a polymerizable group within the W
1
portion converted into a main chain (in formula (d0), Rd
01
represents a fluorine atom or a fluorinated alkyl group; In formula (a0-1), W
1
represents a polymerizable group-containing group; C
t
represents a tertiary carbon atom, and the α-position of C
t
is a carbon atom which constitutes a carbon-carbon unsaturated bond; R
11
represents an aromatic hydrocarbon group; or a chain hydrocarbon group; R
12
and R
13
each independently represents a chain hydrocarbon group, or R
12
and R
13
are mutually bonded to form a cyclic group).
2-Methoxy-4,6-bis(trifluoromethyl)phenyllithium: a new stable aryllithium useful as an intermediate to bis(trifluoromethyl)aromatics
作者:Wojciech Dmowski、Krystyna Piasecka-Maciejewska
DOI:10.1016/0022-1139(96)03418-5
日期:1996.5
A method for the preparation of 3,5-bis(trifluoromethyl)anisole (3) has been developed. Lithiation of 3 occurred exclusively at the position ortho to the CH3O group to give a thermally stable lithium derivative 6 which readily undergoes conventional reactions with a number of electrophiles. Formylation and carboxylation of 6 gave bis (trifluoromethyl) derivatives of salicylic aldehyde and salicylic