A patterning process comprises (a) providing at least one substrate having at least one major surface; (b) providing at least one patterning composition comprising at least one functionalizing molecule that is a perfluoropolyether organosulfur compound; (c) applying the patterning composition to the major surface of the substrate in a manner so as to form at least one functionalized region and at least one unfunctionalized region of the major surface; and (d) etching at least a portion of the unfunctionalized region.
一种图案化处理过程包括:(a)提供至少一个具有至少一个主表面的基板;(b)提供至少一种图案化组合物,其中包含至少一种功能化分子,该分子是一种
全氟聚醚
有机硫化合物;(c)以一种方式将图案化组合物应用于基板的主表面,以形成至少一个主表面的功能化区域和至少一个未功能化区域;(d)蚀刻至少部分未功能化区域。