3,3,3',3'-四甲基-1,1'-螺二茚-5,5',6,6',7,7'-己醇 | 32737-33-0

• 分子结构分类: 有机化合物 - 苯类化合物 - 茚满类
• 中文名称: 3,3,3',3'-四甲基-1,1'-螺二茚-5,5',6,6',7,7'-己醇
• 英文名称: 3,3,3',3'-tetramethyl-2,3,2',3'-tetrahydro-[1,1']spirobiindene-5,6,7,5',6',7'-hexaol
• 英文别名: 3,3,3',3'-Tetramethyl-2,3,2',3'-tetrahydro-[1,1']spirobiinden-5,6,7,5',6',7'-hexaol；(+/-)-5,6,7,5',6',7'-Hexahydroxy-3,3,3',3'-tetramethyl-[1,1']spirobiindan；(+/-)-3,3,3',3'-Tetramethyl-[1,1']spirobiindanhexol-(5,6,7,5',6',7')；5,5',6,6',7,7'-Hexahydroxy-3,3,3',3'-tetramethyl-spiro-1,1'-bis-indan；1,1'-Spirobi[1H-indene]-5,5',6,6',7,7'-hexol, 2,2',3,3'-tetrahydro-3,3,3',3'-tetramethyl-；1,1,1',1'-tetramethyl-3,3'-spirobi[2H-indene]-4,4',5,5',6,6'-hexol
• CAS: 32737-33-0
• 化学式: C₂₁H₂₄O₆
• 分子量: 372.418
• InChiKey: AFYBVKGVQMFUMU-UHFFFAOYSA-N

物化性质

• 熔点：
  190～200℃

计算性质

• 辛醇/水分配系数(LogP)：
  4.4
• 重原子数：
  27
• 可旋转键数：
  0
• 环数：
  4.0
• sp3杂化的碳原子比例：
  0.428
• 拓扑面积：
  121
• 氢给体数：
  6
• 氢受体数：
  6

安全信息

• 海关编码：
  2906299090

反应信息

• 作为反应物：
  描述：

  3,3,3',3'-四甲基-1,1'-螺二茚-5,5',6,6',7,7'-己醇 、 硫酸二甲酯 在 氢氧化钾 作用下， 生成 5,6,7,5',6',7'-hexamethoxy-3,3,3',3'-tetramethyl-2,3,2',3'-tetrahydro-[1,1']spirobiindene
  参考文献：
  名称：

  Baker; Besly, Journal of the Chemical Society, 1939, p. 197

  摘要：

  DOI：
• 作为产物：
  描述：

  2,6-二甲基-2,5-庚二烯-4-酮 、 邻苯三酚 在 盐酸 、 溶剂黄146 作用下， 生成 3,3,3',3'-四甲基-1,1'-螺二茚-5,5',6,6',7,7'-己醇
  参考文献：
  名称：

  Ghiglieno, Atti della Accademia delle Scienze di Torino, Classe di Scienze Fisiche, Matematiche e Naturali, 1912, vol. 47, p. 16,20

  摘要：

  DOI：

文献信息

• ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, AND ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM AND PATTERN FORMING METHOD USING THE COMPOSITION
  申请人：INASAKI Takeshi

  公开号：US20130029255A1

  公开（公告）日：2013-01-31

  Provided is an actinic ray-sensitive or radiation-sensitive resin composition containing a compound (A) which contains at least one phenolic hydroxyl group and at least one group where a hydrogen atom in a phenolic hydroxyl group is substituted by a group represented by the following General Formula (1). (in the formula, each of R 11 and R 12 independently represents a hydrogen atom, an alkyl group, a cycloalkyl group, an aryl group, or an aralkyl group; X 11 represents an aryl group; M 11 represents a single bond or a divalent linking group; and Q 11 represents an alkyl group, a cycloalkyl group or an aryl group, wherein the number of carbon atoms which are included in the group represented by -M 11 -Q 11 is 3 or more, and at least two of R 11 , R 12 , Q 11 , and X 11 may form a ring by bonding to each other)

  提供的是一种感光树脂组合物，其中包含至少含有一个酚羟基和至少一个氢原子被以下通式（1）所代表的基替换的基团的化合物（A）。（在通式中，R11和R12分别独立地表示氢原子、烷基、环烷基、芳基或芳基烷基；X11表示芳基；M11表示单键或二价连接基团；Q11表示烷基、环烷基或芳基，其中包含在-M11-Q11所代表的基团中的碳原子数为3或更多，并且R11、R12、Q11和X11中至少有两个可以通过相互键合形成环）
• Light-sensitive compositions
  申请人：FUJI PHOTO FILM CO., LTD.

  公开号：EP0410760A2

  公开（公告）日：1991-01-30

  A light-sensitive composition comprising: (a) a polysiloxane compound having at least 1 mol% of a structural unit derived from a product of a thermal cycloaddition reaction between a compound of formula (I), (II), (III) or (IV) and a compound of formula (V), (VI), (VII) or (VIII), and (b) an orthoquinonediazide compound.

  一种光敏组合物，包括 (a) 聚硅氧烷化合物，其结构单元至少有 1 摩尔%来自式（I）、（II）、（III）或 （IV）化合物与式（V）、（VI）、（VII）或（VIII）化合物之间的热环化反应产物， 以及 (b) 邻醌噻嗪化合物。
• Positive type photoresist composition
  申请人：FUJI PHOTO FILM CO., LTD.

  公开号：EP0445680A2

  公开（公告）日：1991-09-11

  A positive type photoresist composition which is superior in the prevention of pattern break and scumming during development, comprising an alkali-soluble novolak resin and a 1,2-quinonediazide compound, wherein said novolak resin is a condensate of a mixture of m-cresol and p-cresol with at least one of formaldehyde, formaldehyde polymer and formaldehyde precursor and wherein the relationship between X = A/(A+B+C) and the content of m-cresol in said novolak resin falls within the shaded part (including the straight lines surrounding this part) in Figure 1, said A representing an integrated value of peak area between 23.0 ppm and 31.0 ppm , B representing an integrated value of peak area between 31.0 ppm and 34.0 ppm and C representing an integrated value of peak area between 34.0 ppm and 37.0 ppm in a ¹³C-NMR spectrum of a dimethyl sulfoxide-d₆ solution of said novolak resin.

  一种正型光刻胶组合物，在显影过程中可有效防止图案破裂和浮渣，该组合物由碱溶性酚醛树脂和 1,2-醌噻嗪化合物组成，其中所述酚醛树脂是间甲酚和对甲酚与甲醛、甲醛聚合物和甲醛前体中至少一种的混合物的缩合物、其中，X = A/(A+B+C) 与间甲酚在所述酚醛树脂中的含量之间的关系在图 1 中的阴影部分（包括围绕该部分的直线）内，所述 A 代表峰面积的综合值，介于 23.在所述酚醛树脂的二甲亚砜-d₆溶液的¹³C-NMR 光谱中，A 代表峰面积的综合值在 23.0 ppm 和 31.0 ppm 之间，B 代表峰面积的综合值在 31.0 ppm 和 34.0 ppm 之间，C 代表峰面积的综合值在 34.0 ppm 和 37.0 ppm 之间。
• Photoresist composition and etching method
  申请人：FUJI PHOTO FILM CO., LTD.

  公开号：EP0540032A1

  公开（公告）日：1993-05-05

  A positive type or negative type photoresist composition for fine processing having excellent resolution, sensitivity, adhesive-ness and developability comprising: (a) an alkali soluble resin or a resin having anti-alkali dissolution groups in the molecules thereof, (b) a light-sensitive compound, and (c) at least one organic compound selected from the group consisting of organic phosphorus acid compounds and esters thereof in an amount of 0.001 to 10% by weight based on a weight of the resin. In addtion, the present invention is directed to an etching method utilizing the positive type or negative type photoresist composition.

  一种用于精细加工的正型或负型光刻胶组合物，具有优异的分辨率、灵敏度、粘合性和显影性，包括 (a) 碱溶性树脂或在其分子中含有抗碱溶解基团的树脂、 (b) 一种光敏化合物，和 (c) 至少一种选自有机磷酸化合物及其酯类的有机化合物，其含量为树脂重量的 0.001 至 10%。此外，本发明还涉及一种利用正型或负型光刻胶组合物的蚀刻方法。
• Polylactide compounds as sensitivity enhancers for radiation sensitive mixtures
  申请人：OCG MICROELECTRONIC MATERIALS, INC.

  公开号：EP0561625A1

  公开（公告）日：1993-09-22

  A radiation-sensitive composition comprises an admixture in a solvent of: at least one alkali-soluble binder resin, at least one photoactive compound and an effective sensitivity enhancing amount of at least one polylactide compound; the amount of said binder resin being about 60 to 95% by weight, the amount of said photoactive component being about 5% to about 40% by weight, based on the total solids content of said radiation-sensitive compostion.

  一种辐射敏感性组合物包括以下物质在溶剂中的混合物：至少一种碱溶性粘合剂树脂、至少一种光活性化合物和有效提高敏感性的至少一种聚乳酸化合物；根据所述辐射敏感性组合物的总固体含量，所述粘合剂树脂的含量约为 60% 至 95%（按重量计），所述光活性成分的含量约为 5%至 40%（按重量计）。