benzyl 2,2-difluoro-3-(methacroyloxy)pentanoate | 1277186-94-3

• 分子结构分类: 有机化合物 - 苯类化合物 - 苯和取代衍生物
• 英文名称: benzyl 2,2-difluoro-3-(methacroyloxy)pentanoate
• 英文别名: benzyl 2,2-difluoro-3-(methacryloyloxy)pentanoate；Benzyl 2,2-difluoro-3-(2-methylprop-2-enoyloxy)pentanoate
• CAS: 1277186-94-3
• 化学式: C₁₆H₁₈F₂O₄
• 分子量: 312.313
• InChiKey: GWGKXDQHGAJOTF-UHFFFAOYSA-N

物化性质

• 沸点：
  394.3±42.0 °C(Predicted)
• 密度：
  1.167±0.06 g/cm3(Predicted)

计算性质

• 辛醇/水分配系数(LogP)：
  4.1
• 重原子数：
  22
• 可旋转键数：
  9
• 环数：
  1.0
• sp3杂化的碳原子比例：
  0.38
• 拓扑面积：
  52.6
• 氢给体数：
  0
• 氢受体数：
  6

反应信息

• 作为产物：
  描述：

  苯甲醇 在 potassium tert-butylate 、 三乙胺 、 锌 作用下， 以 四氢呋喃 、 正己烷 为溶剂， 反应 3.35h， 生成 benzyl 2,2-difluoro-3-(methacroyloxy)pentanoate
  参考文献：
  名称：

  JP2015/38072

  摘要：

  公开号：

文献信息

• RADIATION-SENSITIVE RESIN COMPOSITION, METHOD FOR FORMING RESIST PATTERN, POLYMER AND POLYMERIZABLE COMPOUND
  申请人：ASANO Yuusuke

  公开号：US20120237875A1

  公开（公告）日：2012-09-20

  A radiation-sensitive resin composition includes a first polymer including an acid-labile group, an acid generator to generate an acid upon exposure to radiation, and a second polymer including a fluorine atom and a functional group shown by a general formula (x). The second polymer has a fluorine atom content higher than a fluorine atom content of the first polymer. R 1 represents an alkali-labile group. A represents an oxygen atom, —NR′—, —CO—O— # or —SO 2 —O— ## , wherein the oxygen atom represented by A is not an oxygen atom bonded directly to an aromatic ring, a carbonyl group, or a sulfoxyl group, R′ represents a hydrogen atom or an alkali-labile group, and “#” and “##” indicates a bonding hand bonded to R 1 . -A-R 1 (x)

  一种辐射敏感树脂组合物包括第一聚合物，其中包括酸敏感基团，酸发生剂用于在辐射照射后生成酸，以及第二聚合物，其中包括氟原子和由通用公式（x）表示的功能基团。第二聚合物的氟原子含量高于第一聚合物的氟原子含量。R1代表碱性易裂解基团。A代表氧原子，-NR′—，-CO—O—#或-SO2—O—##，其中A代表的氧原子不是直接与芳香环、酰基或亚砜基结合的氧原子，R′代表氢原子或碱性易裂解基团，“#”和“##”表示与R1结合的键合手。-A-R1(x)
• RADIATION-SENSITIVE RESIN COMPOSITION, POLYMER AND COMPOUND
  申请人：Nakahara Kazuo

  公开号：US20120082934A1

  公开（公告）日：2012-04-05

  [Problem] To reduce the time required for a film to exhibit decreased hydrophobicity after liquid immersion lithography while allowing the surface of a film to exhibit high hydrophobicity during liquid immersion lithography. [Solution] A radiation-sensitive resin composition including (A) a polymer that includes a repeating unit (a1) and a fluorine atom, and (B) a photoacid generator, the repeating unit (a1) including a group shown by any of the following formulas (1-1) to (1-3).

  [问题] 在液体浸润光刻后，减少薄膜表现出降低的疏水性所需的时间，同时允许薄膜表面在液体浸润光刻期间表现出高疏水性。[解决方案] 包括（A）聚合物和（B）光酸发生剂的辐射敏感树脂组合物，其中重复单元（a1）包括重复单元（a1）和氟原子，并且（a1）包括以下任意一种公式（1-1）至（1-3）所示的基团。
• RADIATION-SENSITIVE RESIN COMPOSITION, METHOD FOR FORMING RESIST PATTERN, POLYMER AND COMPOUND
  申请人：JSR CORPORATION

  公开号：US20130022912A1

  公开（公告）日：2013-01-24

  A radiation-sensitive resin composition includes a first polymer having a structural unit represented by a following formula (1), and a radiation-sensitive acid generator. R C in the formula (1) preferably represents an aliphatic polycyclic hydrocarbon group having a valency of (n+1) and having 4 to 30 carbon atoms. The structural unit represented by the formula (1) is preferably a structural unit represented by a n following formula (1-1).

  一种辐射敏感的树脂组合物，包括具有以下公式（1）所代表的结构单元的第一聚合物和辐射敏感的酸发生剂。在公式（1）中，RC最好代表具有(n+1)价且具有4至30个碳原子的脂肪族多环烃基团。公式（1）所代表的结构单元最好是由以下公式（1-1）所代表的n的结构单元。
• Radiation-sensitive resin composition, method for forming resist pattern, polymer and polymerizable compound
  申请人：JSR Corporation

  公开号：EP2781959A2

  公开（公告）日：2014-09-24

  A radiation-sensitive resin composition includes (A) a polymer that includes an acid-labile group, (B) an acid generator that generates an acid upon exposure to radiation, and (C) a polymer that includes a fluorine atom and a functional group shown by the following general formula (x), the polymer (C) having a fluorine atom content higher than that of the polymer (A).         — A—R1     (x) wherein R1 represents an alkali-labile group, and A represents an oxygen atom (excluding an oxygen atom that is bonded directly to an aromatic ring, a carbonyl group, or a sulfoxyl group), an imino group, -CO-O-*, or -SO2-O-* (wherein "*" indicates a bonding hand bonded to R1).

  一种辐射敏感树脂组合物包括：(A) 含有酸亲和基的聚合物；(B) 在辐射照射下产生酸的酸发生器；(C) 含有氟原子和以下通式 (x) 所示官能团的聚合物，聚合物 (C) 的氟原子含量高于聚合物 (A)。 - A-R1 (x) 其中 R1 代表耐碱基团，A 代表氧原子（不包括直接与芳香环、羰基或亚磺酰基键合的氧原子）、亚氨基、-CO-O-* 或 -SO2-O-* （其中 "*"表示与 R1 键合的键手）。
• RADIATION-SENSITIVE RESIN COMPOSITION, PATTERN-FORMING METHOD, POLYMER, AND COMPOUND
  申请人：JSR CORPORATION

  公开号：US20130260315A1

  公开（公告）日：2013-10-03

  A radiation-sensitive resin composition includes a polymer component that includes one or more types of polymers, and a radiation-sensitive acid generator. At least one type of the polymer of the polymer component includes a first structural unit represented by a following formula (1). R 1 represents a hydrogen atom, a fluorine atom, a methyl group or a trifluoromethyl group. R 2 represents a linear alkyl group having 5 to 21 carbon atoms. Z represents a divalent alicyclic hydrocarbon group or an aliphatic heterocyclic group having a ring skeleton which has 4 to 20 atoms. A part or all of hydrogen atoms included in the alicyclic hydrocarbon group and the aliphatic heterocyclic group represented by Z are not substituted or substituted.