Curable composition for photo imprints, method for forming pattern, fine pattern, and method for manufacturing semiconductor device
申请人:FUJIFILM Corporation
公开号:US10175576B2
公开(公告)日:2019-01-08
Provided is a curable composition for photo imprints excellent in the mold releasability and the ink jettability. The curable composition for photo imprints, comprising: a polymerizable compound (A); a photo-polymerization initiator (B); and a mold releasing agent (C), the mold releasing agent (C) being represented by the formula (I) below. Rf represents a C1-8 fluorine-containing alkyl group having two or more fluorine atoms; m represents 1 or 2; L represents a single bond or divalent linking group; n represents 1 or 2; X represents a single bond, oxygen atom, sulfur atom, or nitrogen atom; R1 represents a C1-8 substituent being free from a polymerizable group; R2 represents a hydrogen atom, C1-8 substituent, or divalent linking group; p represents 1 or 2, q represents 0 or 1, and r represents 1 or 2; R1 and R2 may combine with each other to form a ring.
CURABLE COMPOSITION FOR IMPRINTS, PATTERNING METHOD AND PATTERN
申请人:FUJIFILM Corporation
公开号:EP2732460B1
公开(公告)日:2017-08-23
CURABLE COMPOSITION FOR PHOTO IMPRINTS, METHOD FOR FORMING PATTERN, FINE PATTERN, AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE
申请人:FUJIFILM Corporation
公开号:US20150185606A1
公开(公告)日:2015-07-02
Provided is a curable composition for photo imprints excellent in the mold releasability and the ink jettability. THe curable composition for photo imprints, comprising: a polymerizable compound (A); a photo-polymerization initiator (B); and a mold releasing agent (C), the mold releasing agent (C) being represented by the formula (I) below. Rf represents a C
1-8
fluorine-containing alkyl group having two or more fluorine atoms; m represents 1 or 2; L represents a single bond or divalent linking group; n represents 1 or 2; X represents a single bond, oxygen atom, sulfur atom, or nitrogen atom; R
1
represents a C
1-8
substituent being free from a polymerizable group; R
2
represents a hydrogen atom, C
1-8
substituent, or divalent linking group; p represents 1 or 2, q represents 0 or 1, and r represents 1 or 2; R
1
and R
2
may combine with each other to form a ring.
CURABLE COMPOSITION FOR OPTICAL IMPRINTING AND PATTERN FORMING METHOD
申请人:FUJIFILM Corporation
公开号:US20160211143A1
公开(公告)日:2016-07-21
A curable composition for optical imprinting which is excellent in ink jet adequacy and releasability, a pattern forming method, a fine pattern, and a method for manufacturing a semiconductor device are provided. The curable composition for optical imprinting contains a polymerizable compound (A), a photopolymerization initiator (B), and a compound (C) expressed by General Formula (I); in General Formula (I), A represents a dihydric to hexahydric polyhydric alcohol residue. p represents 0 to 2, q represents 1 to 6, p+q represents an integer of 2 to 6, each of m and n independently represents 0 to 20. r expressed by Formula (1) is 6 to 20. Each R independently represents an alkyl group having 1 to 10 carbon atoms, an aryl group, or an acyl group.