3,3'-二叠氮基二苯基砜 | 75742-13-1

• 分子结构分类: 有机化合物 - 苯类化合物 - 苯和取代衍生物
• 中文名称: 3,3'-二叠氮基二苯基砜
• 英文名称: 3,3'-Diazidodiphenylsulfon
• 英文别名: Meta-azidophenyl sulfone；Benzene, 1,1'-sulfonylbis[3-azido-；1-azido-3-(3-azidophenyl)sulfonylbenzene
• CAS: 75742-13-1
• 化学式: C₁₂H₈N₆O₂S
• mdl: MFCD00043695
• 分子量: 300.301
• InChiKey: LHCUYYJTVIYFEQ-UHFFFAOYSA-N

物化性质

• 熔点：
  110-114 °C
• 密度：
  1.4492 (rough estimate)

计算性质

• 辛醇/水分配系数(LogP)：
  4.6
• 重原子数：
  21
• 可旋转键数：
  4
• 环数：
  2.0
• sp3杂化的碳原子比例：
  0.0
• 拓扑面积：
  71.2
• 氢给体数：
  0
• 氢受体数：
  6

安全信息

• 危险品标志：
  Xn
• 危险类别码：
  R20/22
• WGK Germany：
  3
• 安全说明：
  S26,S36

SDS

Name:	3 3 -Diazido-Diphenylsulfone 97% Material Safety Data Sheet
Synonym:	None Known
CAS:	75742-13-1

Section 1 - Chemical Product MSDS Name:3 3 -Diazido-Diphenylsulfone 97% Material Safety Data Sheet
Synonym:None Known

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Section 2 - COMPOSITION, INFORMATION ON INGREDIENTS

CAS#	Chemical Name	content	EINECS#
75742-13-1	3,3'-Diazido-Diphenylsulfone	97%	278-300-8

Hazard Symbols: XN
Risk Phrases: 20/22 36/37

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Section 3 - HAZARDS IDENTIFICATION
EMERGENCY OVERVIEW
Harmful by inhalation and if swallowed. Irritating to eyes and respiratory system.Light sensitive.The toxicological properties of this material have not been fully investigated.
Potential Health Effects
Eye:
Causes eye irritation.
Skin:
May cause skin irritation.
Ingestion:
May cause irritation of the digestive tract. The toxicological properties of this substance have not been fully investigated.
Inhalation:
Causes respiratory tract irritation. The toxicological properties of this substance have not been fully investigated.
Chronic:
No information found.

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Section 4 - FIRST AID MEASURES
Eyes: Immediately flush eyes with plenty of water for at least 15 minutes, occasionally lifting the upper and lower eyelids. Get medical aid.
Skin:
Get medical aid. Flush skin with plenty of water for at least 15 minutes while removing contaminated clothing and shoes. Wash clothing before reuse.
Ingestion:
Never give anything by mouth to an unconscious person. Get medical aid. Do NOT induce vomiting. If conscious and alert, rinse mouth and drink 2-4 cupfuls of milk or water.
Inhalation:
Remove from exposure and move to fresh air immediately. If not breathing, give artificial respiration. If breathing is difficult, give oxygen. Get medical aid.
Notes to Physician:

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Section 5 - FIRE FIGHTING MEASURES
General Information:
As in any fire, wear a self-contained breathing apparatus in pressure-demand, MSHA/NIOSH (approved or equivalent), and full protective gear. During a fire, irritating and highly toxic gases may be generated by thermal decomposition or combustion. Runoff from fire control or dilution water may cause pollution.
Extinguishing Media:
In case of fire, use water, dry chemical, chemical foam, or alcohol-resistant foam. Use agent most appropriate to extinguish fire.

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Section 6 - ACCIDENTAL RELEASE MEASURES
General Information: Use proper personal protective equipment as indicated in Section 8.
Spills/Leaks:
Vacuum or sweep up material and place into a suitable disposal container. Clean up spills immediately, observing precautions in the Protective Equipment section. Avoid generating dusty conditions.
Provide ventilation.

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Section 7 - HANDLING and STORAGE
Handling:
Wash thoroughly after handling. Remove contaminated clothing and wash before reuse. Use with adequate ventilation. Minimize dust generation and accumulation. Avoid contact with eyes, skin, and clothing. Keep container tightly closed. Avoid ingestion and inhalation. Store protected from light.
Storage:
Store in a tightly closed container. Store in a cool, dry, well-ventilated area away from incompatible substances. Keep refrigerated. (Store below 4C/39F.) Store protected from light.

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Section 8 - EXPOSURE CONTROLS, PERSONAL PROTECTION
Engineering Controls:
Facilities storing or utilizing this material should be equipped with an eyewash facility and a safety shower. Use adequate ventilation to keep airborne concentrations low.
Exposure Limits CAS# 75742-13-1: Personal Protective Equipment Eyes: Wear appropriate protective eyeglasses or chemical safety goggles as described by OSHA's eye and face protection regulations in 29 CFR 1910.133 or European Standard EN166.
Skin:
Wear appropriate protective gloves to prevent skin exposure.
Clothing:
Wear appropriate protective clothing to prevent skin exposure.
Respirators:
Follow the OSHA respirator regulations found in 29 CFR 1910.134 or European Standard EN 149. Use a NIOSH/MSHA or European Standard EN 149 approved respirator if exposure limits are exceeded or if irritation or other symptoms are experienced.

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Section 9 - PHYSICAL AND CHEMICAL PROPERTIES

Physical State: Solid
Color: yellow
Odor: None reported.
pH: Not available.
Vapor Pressure: Not available.
Viscosity: Not available.
Boiling Point: Not available.
Freezing/Melting Point: 108.00 - 110.00 deg C
Autoignition Temperature: Not applicable.
Flash Point: Not applicable.
Explosion Limits, lower: Not available.
Explosion Limits, upper: Not available.
Decomposition Temperature:
Solubility in water: insoluble
Specific Gravity/Density:
Molecular Formula: C12H8N6O2S
Molecular Weight: 300.29

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Section 10 - STABILITY AND REACTIVITY
Chemical Stability:
Stable under normal temperatures and pressures.
Conditions to Avoid:
Incompatible materials, light, excess heat, strong oxidants.
Incompatibilities with Other Materials:
Oxidizing agents.
Hazardous Decomposition Products:
Nitrogen oxides, carbon monoxide, irritating and toxic fumes and gases, carbon dioxide, nitrogen, sulfur oxides (SOx), including sulfur oxide and sulfur dioxide.
Hazardous Polymerization: Has not been reported.

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Section 11 - TOXICOLOGICAL INFORMATION
RTECS#:
CAS# 75742-13-1 unlisted.
LD50/LC50:
Not available.
Carcinogenicity:
3,3'-Diazido-Diphenylsulfone - Not listed by ACGIH, IARC, or NTP.

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Section 12 - ECOLOGICAL INFORMATION

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Section 13 - DISPOSAL CONSIDERATIONS
Dispose of in a manner consistent with federal, state, and local regulations.

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Section 14 - TRANSPORT INFORMATION

IATA
Not regulated as a hazardous material.
IMO
Not regulated as a hazardous material.
RID/ADR
Not regulated as a hazardous material.

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Section 15 - REGULATORY INFORMATION

European/International Regulations
European Labeling in Accordance with EC Directives
Hazard Symbols: XN
Risk Phrases:
R 20/22 Harmful by inhalation and if swallowed.
R 36/37 Irritating to eyes and respiratory system.
Safety Phrases:
S 26 In case of contact with eyes, rinse immediately
with plenty of water and seek medical advice.
S 28A After contact with skin, wash immediately with
plenty of water.
S 37 Wear suitable gloves.
S 39 Wear eye/face protection.
S 45 In case of accident or if you feel unwell, seek
medical advice immediately (show the label where
possible).
WGK (Water Danger/Protection)
CAS# 75742-13-1: No information available.
Canada
CAS# 75742-13-1 is listed on Canada's NDSL List.
CAS# 75742-13-1 is not listed on Canada's Ingredient Disclosure List.
US FEDERAL
TSCA
CAS# 75742-13-1 is listed on the TSCA inventory.

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SECTION 16 - ADDITIONAL INFORMATION
N/A

反应信息

• 作为反应物：
  描述：

  3,3'-二叠氮基二苯基砜 在 palladium dihydroxide 、 甲烷 一水合肼 作用下， 以 甲醇 为溶剂， 反应 2.0h， 以73%的产率得到3,3'-二氨基二苯砜
  参考文献：
  名称：

  A Facile Reduction of Azides to Amines Using Hydrazine

  摘要：

  在钯的存在下，通过在回流甲醇中与肼反应，多种烷基和芳基叠氮化物被高产率还原成相应的胺。

  DOI：

  10.1055/s-1989-27284
• 作为产物：
  描述：

  3,3'-二氨基二苯砜 在 盐酸 、 sodium nitrite 、 sodium azide 作用下， 反应 0.5h， 以85%的产率得到3,3'-二叠氮基二苯基砜
  参考文献：
  名称：

  Size-Specific Ligands for RNA Hairpin Loops

  摘要：

  The targeting of one mRNA in the transcriptome requires small molecules that bind with substantial affinity and specificity. As such, compounds with specificity for individual RNA secondary structural motifs could be useful for targeting RNA. Described herein is the synthesis of a combinatorial library of 105 dimers of deoxystreptamine and the subsequent identification of compounds with specificity for specific RNA hairpin loop sizes, including tetraloops and octaloops. Such compounds will be useful for the perturbation of RNA function in vivo.

  DOI：

  10.1021/ja051685b

文献信息

• Hydrofluoroalkanesulfonic acids from fluorovinyl ethers
  申请人：Junk P. Christopher

  公开号：US20060276670A1

  公开（公告）日：2006-12-07

  Hydrofluoroalkanesulfonates of the general formula R—O—CXH—CX 2 —SO 3 M, where R is selected from the group consisting of alkyl groups, functionalized alkyl groups, and alkenyl groups; X is selected from the group consisting of hydrogen and fluorine with the proviso that at least one X is fluorine; and M is a cation, are made by reacting fluorovinyl ether with aqueous sulfite solution. Organic onium hydrofluoroalkanesulfonates are useful as ionic liquids and photoacid generators.

  通式为R—O—CXH—CX2—SO3M的氢氟烷磺酸盐，其中R选自烷基、官能化烷基和烯基组成的群；X选自氢和氟，但至少有一个X为氟；M为阳离子。通过将氟乙烯醚与含有亚硫酸盐的水溶液反应制备有机铵氢氟烷磺酸盐，这些化合物可用作离子液体和光酸发生剂。
• Short and Efficient Synthesis of Alkyne-Modified Amino Glycoside Building Blocks
  作者：Claudine M. Klemm、Arne Berthelmann、Saskia Neubacher、Christoph Arenz

  DOI：10.1002/ejoc.200900076

  日期：2009.6

  In the light of recent progress in RNA biology, the need for molecules that bind to RNA and thus may be suited to manipulating RNA-mediated processes is steadily increasing. We present a very short and efficient synthetic route to alkyne-modified neamine and 2-deoxystreptamine derivatives on a half-gram scale. These derivatives are suitable for constructing a library of potential divalent RNA binders

  鉴于 RNA 生物学的最新进展，对与 RNA 结合并因此可能适合操纵 RNA 介导过程的分子的需求正在稳步增加。我们提出了一种非常短且有效的合成路线，以半克规模合成炔烃改性的新胺和 2-脱氧链霉胺衍生物。这些衍生物适用于通过铜催化的 1,3-偶极环加成与二叠氮化物（“点击化学”）构建潜在二价 RNA 结合剂库。由此形成的缀合物二聚体抑制 Dicer 介导的微 RNA 成熟，IC50 值介于 0.6 和 15 μM 之间。（© Wiley-VCH Verlag GmbH & Co. KGaA，69451 Weinheim，德国，2009）
• (Meth) acrylate derivative, polymer and photoresist composition having lactone structure, and method for forming pattern by using it
  申请人：——

  公开号：US20010026901A1

  公开（公告）日：2001-10-04

  There are here disclosed a photoresist material for lithography using a light of 220 nm or less which comprises at least a polymer represented by the following formula (2) and a photo-acid generator for generating an acid by exposure: 1 wherein R 1 , R 2 , R 3 and R 5 are each a hydrogen atom or a methyl group; R 4 is an acid-labile group, an alicyclic hydrocarbon group having 7 to 13 carbon atoms, which has an acid labile group, an alicyclic hydrocarbon group having 7 to 13 carbon atoms, which has a carboxyl group, or a hydrocarbon group having 3 to 13 carbon atoms, which has an epoxy group; R 6 is a hydrogen atom, a hydrocarbon group having 1 to 12 carbon atoms, or an alicyclic hydrocarbon group having 7 to 13 carbon atoms, which has a carboxyl group; x, y and z are optional values which meet x+y+z=1, 0

  本发明公开了一种用于使用220纳米或更短波长的光进行光刻的光阻材料，其包括至少一种由以下式（2）表示的聚合物和用于通过曝光产���酸的光酸发生剂： 其中，R1、R2、R3和R5分别为氢原子或甲基基团；R4为酸可裂解基团、具有7至13个碳原子的脂环烃基团，其具有酸可裂解基团、具有7至13个碳原子的脂环烃基团，其具有羧基，或具有3至13个碳原子的烃基团，其具有环氧基团；R6为氢原子、具有1至12个碳原子的烃基团，或具有7至13个碳原子的脂环烃基团，其具有羧基；x、y和z是可选的值，满足x+y+z=1，0≤x≤1，0≤y<1和0≤z<1；聚合物的重均分子量在2000至200000范围内，以及具有由式（3）表示的脂环内酯结构的（甲）丙烯酸酯单元的树脂： 其中，R8为氢原子或甲基基团，R9为具有脂环内酯结构的7至16个碳原子的烃基团。
• Photoresists, polymers and processes for microlithography
  申请人：——

  公开号：US20040023150A1

  公开（公告）日：2004-02-05

  Photoresists and associated processes for microlithography in the extreme, far, and near UV are disclosed. The photoresists in some embodiments comprise (a) a fluorine-containing copolymer comprising a repeat unit derived from at least one ethylenically unsaturated compound characterized in that at least one ethylenically unsaturated compound is polycyclic and at least one ethylenically unsaturated compound contains at least one fluorine atom covalently attached to an ethylenically unsaturated carbon atom; and (b) at least one photoactive component. In other embodiments, the photoresists comprise a fluorine-containing copolymer comprising a repeat unit derived from at least one polycyclic ethylenically unsaturated compound having at least one atom or group selected from the group consisting of fluorine atom, perfluoroalkyl group, and perfluoroalkoxy group, characterized in that the at least one atom or group is covalently attached to a carbon atom which is contained within a ring structure and separated from each ethylenically unsaturated carbon atom of the ethylenically unsaturated compound by at least one covalently attached carbon atom. The photoresists have high transparency in the extreme/far UV as well as the near UV, high plasma etch resistance, and are useful for microlithography in the extreme, far, and near ultraviolet (UV) region, particularly at wavelengths ≦365 nm. Novel fluorine-containing copolymers are also disclosed.

  本文揭示了用于极端、远红外和近紫外微影的光阻及相关工艺。在某些实施例中，光阻包括（a）含有氟的共聚物，包括至少一个乙烯基不饱和化合物的重复单元，其特征在于至少一个乙烯基不饱和化合物是多环的，至少一个乙烯基不饱和化合物含有至少一个氟原子共价连接到一个乙烯基不饱和碳原子上；以及（b）至少一个光敏组分。在其他实施例中，光阻包括含有氟的共聚物，包括至少一个多环乙烯基不饱和化合物的重复单元，该乙烯基不饱和化合物具有至少一个来自氟原子、全氟烷基和全氟烷氧基的原子或基团，其特征在于至少一个原子或基团共价连接到一个环结构内的碳原子上，并且与每个乙烯基不饱和碳原子之间至少有一个共价连接的碳原子相隔开。这些光阻在极端/远红外和近紫外具有高透明度，高等离子体蚀刻抗性，并且适用于极端、远红外和近紫外（UV）区域的微影，特别是在波长≤365 nm的情况下。此外，还揭示了新型含氟共聚物。
• (Meth)acrylate derivative, polymer and photoresist composition having lactone structure, and method for forming pattern by using it
  申请人：Maeda Katsumi

  公开号：US20070218403A1

  公开（公告）日：2007-09-20

  There are here disclosed a photoresist material for lithography using a light of 220 nm or less which comprises at least a polymer represented by the following formula (2) and a photo-acid generator for generating an acid by exposure: wherein R 1 , R 2 , R 3 and R 5 are each a hydrogen atom or a methyl group; R 4 is an acid-labile group, an alicyclic hydrocarbon group having 7 to 13 carbon atoms, which has an acid labile group, an alicyclic hydrocarbon group having 7 to 13 carbon atoms, which has a carboxyl group, or a hydrocarbon group having 3 to 13 carbon atoms, which has an epoxy group; R 6 is a hydrogen atom, a hydrocarbon group having 1 to 12 carbon atoms, or an alicyclic hydrocarbon group having 7 to 13 carbon atoms, which has a carboxyl group; x, y and z are optional values which meet x+y+z=1, 0

  本文披露了一种光刻用220纳米或以下光的光阻材料，包括至少一种由以下式子（2）表示的聚合物和用于曝光生成酸的光酸发生剂： 其中，R1、R2、R3和R5分别是氢原子或甲基基团；R4是酸敏感基团、具有7至13个碳原子的脂环烃基团、具有酸敏感基团的7至13个碳原子的脂环烃基团、具有3至13个碳原子的环烃基团、具有环氧基团；R6是氢原子、具有1至12个碳原子的碳氢基团或具有7至13个碳原子的脂环烃基团，具有羧基；x、y和z是可选值，满足x+y+z=1，0