申请人:SANYO CHEMICAL INDUSTRIES, LTD.
公开号:EP0930540A1
公开(公告)日:1999-07-21
The present invention is related to a photosensitive composition which comprises 70 to 99 weight % of a vinyl polymer (A) comprising recurring units derived from a monomer (a) of the following general formula (1) and 1 to 30 weight % of at least one photosensitive compound (B) selected from the group consisting of azide compounds and diazo compounds.
H2C=CH-X-Q (1)
[wherein X is selected from the group consisting of a direct bond, a 1,4-phenylene group, a sulfonyl group, a methylene group, and an alkylene group of 2 to 5 carbon atoms (the methylene and alkylene groups may respectively have one ether, carbonyl, carboxyl, amide or urea group); Q represents a functional group selected from the group consisting of -NH-R, -COCH2COCH3, and -SO2NH2; R represents a residue selected from the group consisting of -CHO, -H (hydrogen), an alkyl group of 1 to 6 carbon atoms (the alkyl group may have one hydroxyl, ether, amino, nitro, cyano, carbonyl, carboxyl, amide, or urea group), -NH2, -N(CH3)2, -COOH, -CONH2 and -CONHCH3]
本发明涉及一种光敏组合物,它包括 70 至 99 重量百分比的
乙烯基聚合物 (A),该聚合物包含从下通式 (1) 单体 (a) 衍生的递归单元,以及 1 至 30 重量百分比的至少一种光敏化合物 (B),该化合物选自
叠氮化合物和重氮化合物组成的组。
H2C=CH-X-Q (1)
[其中 X 选自直接键、1,4-亚苯基、磺酰基、亚甲基和 2 至 5 个碳原子的亚烷基(亚甲基和亚烷基可分别具有一个醚基、羰基、羧基、酰胺基或
脲基)组成的组;Q 代表从 -NH-R、-COCH2CO 和 -SO2NH2 所组成的组中选出的官能团;R 代表从 -CHO、-H(氢)、1 至 6 个碳原子的烷基(烷基可分别具有一个羟基、醚基、
氨基、硝基、
氰基、羰基、羧基、酰胺基或
脲基)、-NH2、-N(
CH3)2、-COOH、-CONH2 和 -CONH 所组成的组中选出的残基。]