申请人:Nippon Paint Co., Ltd.
公开号:EP0302941A1
公开(公告)日:1989-02-15
The resin composition comprises a resin obtained by reacting a polyepoxide compound, an aromatic or heterocyclic carboxylic acid having a phenolic hydroxy group, and 1,2-quinonediazidosulfonyl chloride in specific proportions. The resin composition shows excellent adhesion to a base, has good flexibility, and undergoes extremely reduced swelling of non-exposed areas with a developer upon development, and hence it is particularly useful as a photoresist material for fine processing or as photosensitive materials for producing lithographic printing plates.
该树脂组合物包括一种树脂,它是由聚环氧化物化合物、具有酚羟基的芳香族或杂环羧酸和 1,2-醌二磺酰氯按特定比例反应而成。这种树脂组合物对基底有极好的附着力,具有良好的柔韧性,在显影时,非暴露区域与显影剂的膨胀程度极低,因此,它特别适合用作精细加工的光阻材料或制作平版印刷板的感光材料。