Provided is a treatment liquid for a semiconductor wafer or the like used in a process for forming a semiconductor. Namely a treatment liquid containing (A) a hypochlorite ion, and (B) an alkylammonium salt expressed by the following Formula (1), or the like is provided.
(In the Formula, "a" is an integer from 6 to 20; R1, R2, and R3 are independently, for example, an alkyl group with a carbon number from 1 to 20; and X- is, for example, a chloride ion.)
本发明提供了一种用于半导体晶片或类似物的处理液,该处理液在半导体的形成过程中使用。即提供一种含有 (A)
次氯酸根离子和 (B) 下式 (1) 表示的烷基
铵盐等的处理液。
(式中:"a "是 6 至 20 的整数;R1、R2 和 R3 独立地例如是碳原子数为 1 至 20 的烷基;X- 例如是
氯离子)。