Polymer for photoresist, method of production thereof and photoresist composition containing polymer
申请人:——
公开号:US20020015906A1
公开(公告)日:2002-02-07
A polymer for a photoresist composition is given by the formula (I):
1
wherein R
1
is a hydrogen atom or a methyl group, R
2
is a C
1-12
linear or branched alkyl, haloalkyl or alkoxycarbonyl group, a C
5-12
cyclic alkyl, cyclic haloalkyl or cyclic alkoxycarbonyl group, a phenyl group or a naphthyl group, R
3
is a C
1-12
linear or branched alkyl or haloalkyl group, a C
5-12
cyclic alkyl or cyclic haloalkyl group, a phenyl group, or a naphthyl group, R
4
and R
5
are independently a hydrogen atom, a C
1-6
linear or branched alkyl, or a C
5-6
cyclic alkyl group, R′ and R″ are independently a hydrogen atom, a halogen atom, a C
1-8
alkyl or alkoxy group, a hydroxy group, a carbonate group or a phenyl group, and m, n, p and q are independently an integer provided that m and q are not zero, at least one of n and p are not zero, 0.4≦m/(m+n+p+q)≦0.9, 0≦n/(m+n+p+q)≦0.5, 0≦p/(m+n+p+q)≦0.5, and 0.01≦q/(m+n+p+q)≦0.3.
给出了一种用于光阻组合物的聚合物,其化学式为(I):其中R1是氢原子或甲基基团,R2是C1-12线性或支链烷基,卤代烷基或烷氧羰基基团,C5-12环烷基,环卤代烷基或环烷氧羰基基团,苯基或萘基,R3是C1-12线性或支链烷基或卤代烷基,C5-12环烷基或环卤代烷基,苯基或萘基,R4和R5分别是氢原子,C1-6线性或支链烷基或C5-6环烷基基团,R'和R"分别是氢原子,卤素原子,C1-8烷基或烷氧基团,羟基,碳酸酯基或苯基,m,n,p和q是整数,其中m和q不为零,n和p中至少有一个不为零,0.4≤m/(m+n+p+q)≤0.9,0≤n/(m+n+p+q)≤0.5,0≤p/(m+n+p+q)≤0.5,0.01≤q/(m+n+p+q)≤0.3。