申请人:SAN-APRO LTD.
公开号:US20210147352A1
公开(公告)日:2021-05-20
The sulfonium salt has high photosensitivity to i-rays and high compatibility with cationically polymerizable compounds such as epoxy compounds, and is excellent storage stability in formulations containing such compounds. The sulfonium salt is represented by general formula (1). In formula (1), R represents an alkyl group or an aryl group; substituents, R1 to R5, each independently represent an alkyl group, a hydroxy group, an alkoxy group, an aryl group, an aryloxy group, a hydroxy(poly)alkyleneoxy group, or a halogen atom; R6 to R9 each independently represent an alkyl group, an aryl group, or a hydrogen atom; m
1
to m
5
each represent the number of occurrences of each of R1 to R5, m
1
and m
4
represent an integer of 0 to 3, m
2
and m
5
represent an integer of 0 to 4, m
3
represents an integer of 0 to 5, and X
−
represents a monovalent polyatomic anion.
砜盐对紫外线具有很高的光敏性,与环氧化合物等阳离子聚合物化合物具有很高的相容性,并且在含有这些化合物的配方中具有优异的储存稳定性。砜盐的通用式表示为(1)。在式(1)中,R代表烷基或芳基;取代基R1至R5分别独立地代表烷基、羟基、烷氧基、芳基、芳氧基、羟基(聚)烷氧基或卤素原子;R6至R9分别独立地代表烷基、芳基或氢原子;m1至m5分别代表R1至R5的出现次数,m1和m4表示0到3的整数,m2和m5表示0到4的整数,m3表示0到5的整数,X−表示一价多原子阴离子。