There is provided an acid having a fluorine-containing carbanion structure or a salt having a fluorine-containing carbanion structure, which is represented by the following general formula (1).
By using a photoacid generator for chemically amplified resist materials that generates this acid, it is possible to provide a photoacid generator which has a high sensitivity to the ArF excimer laser light or the like, of which acid (photo generated acid) to be generated has a sufficiently high acidity, and which has a high dissolution in resist solvent and a superior compatibility with resin, and a resist material containing such a photoacid generator.
提供了一种具有含
氟碳离子结构的酸或具有含
氟碳离子结构的盐,其通式如下(1)。
通过使用产生这种酸的
化学放大抗蚀剂材料用光酸发生器,可以提供一种对 ArF 准分子激光或类似光具有高灵敏度的光酸发生器,其中生成的酸(光产生的酸)具有足够高的酸度,并且在抗蚀剂溶剂中具有高溶解性,与
树脂具有良好的相容性,还可以提供一种含有这种光酸发生器的抗蚀剂材料。