di-hexafluoro isopropyl adipate | 871682-80-3

• 分子结构分类: 有机化合物 - 脂质和类脂质分子 - 脂肪酰基
• 英文名称: di-hexafluoro isopropyl adipate
• 英文别名: Bis(1,1,1,3,3,3-hexafluoropropan-2-yl) hexanedioate
• CAS: 871682-80-3
• 化学式: C₁₂H₁₀F₁₂O₄
• 分子量: 446.19
• InChiKey: PRLHKISQWQYOOQ-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  5.2
• 重原子数：
  28
• 可旋转键数：
  9
• 环数：
  0.0
• sp3杂化的碳原子比例：
  0.83
• 拓扑面积：
  52.6
• 氢给体数：
  0
• 氢受体数：
  16

反应信息

• 作为反应物：
  描述：

  di-hexafluoro isopropyl adipate 在 三乙烯二胺 、 sodium hydride 作用下， 以 四氢呋喃 、 二氯甲烷 为溶剂， 反应 18.0h， 生成 1,1,1,3,3,3-Hexafluoropropan-2-yl 2-oxo-1-(3-oxocyclopentyl)cyclopentane-1-carboxylate
  参考文献：
  名称：

  通过使用手性有机催化剂对α，β-不饱和酮进行高效，实用的共轭加成反应来构建四级立体中心。

  摘要：

  DOI：

  10.1002/anie.200502658
• 作为产物：
  描述：

  六氟异丙醇 、 己二酰氯 在 4-二甲氨基吡啶 作用下， 以 乙醚 为溶剂， 生成 di-hexafluoro isopropyl adipate
  参考文献：
  名称：

  [EN] ASYMMETRIC MICHAEL AND ALDOL ADDITION USING BIFUNCTIONAL CINCHONA-ALKALOID-BASED CATALYSTS
  [FR] ADDITIONS ASYMETRIQUES DE MICHAEL ET D'ALDOL UTILISANT DES CATALYSEURS BIFONCTIONNELS A BASE DE CINCHONINE

  摘要：

  本发明的一个方面涉及基于奎宁和奎宁的催化剂。发明的另一个方面涉及一种制备衍生奎宁或奎宁催化剂的方法，包括1）将奎宁或奎宁与5碱和具有适当离去基团的化合物反应，以及2）将环甲氧基转化为羟基。本发明的另一个方面涉及一种从前手性电子亏缺烯烃或偶氮化合物或前手性醛或前手性酮制备手性、非拉克米化合物的方法，包括以下步骤：在催化剂存在下，将前手性电子亏缺烯烃或偶氮化合物或前手性醛或前手性酮与亲核试剂反应；从而产生手性、非拉克米化合物；其中所述催化剂是衍生奎宁或奎宁。本发明的另一个方面涉及一种动力学分辨的方法，包括在衍生奎宁或奎宁存在下，将拉克米手性烯烃与亲核试剂反应的步骤。

  公开号：

  WO2005121137A1

文献信息

• ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, PATTERN FORMING METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE
  申请人：FUJIFILM Corporation

  公开号：US20200159117A1

  公开（公告）日：2020-05-21

  An actinic ray-sensitive or radiation-sensitive resin composition includes a resin whose solubility in an aqueous alkali solution increases by the action of an acid, a compound that generates an acid upon irradiation with actinic rays or radiation, an ester compound, and a fluorine-containing polymer, in which the ester compound has alkali decomposability and has a molecular weight of 50 or more and less than 1,500.
• PHOTOSENSITIVE RESIN COMPOSITION, RESIST FILM, PATTERN FORMING METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE
  申请人：FUJIFILM Corporation

  公开号：US20200183274A1

  公开（公告）日：2020-06-11

  A photosensitive resin composition includes a resin, a photoacid generator, a solvent, and a low-molecular-weight ester compound, in which low-molecular-weight ester compound has alkali degradability and has a molecular weight of less than 1,500, and a content of the low-molecular-weight ester compound is from 0.1% by mass to 6% by mass with respect to the total solid content of the composition.
• PHOTOSENSITIVE RESIN COMPOSITION, RESIST FILM, PATTERN FORMING METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE
  申请人：FUJIFILM Corporation

  公开号：US20200183279A1

  公开（公告）日：2020-06-11

  A photosensitive resin composition includes a resin having a constitutional unit having an acid-decomposable group, a photoacid generator, a solvent, and a compound represented by Formula D. In Formula D, X D represents an O atom or an S atom, R 1D represents a hydrogen atom, a hydrocarbon group, an acyl group, an acyloxy group, or an alkoxycarbonyl group, R 2D represents a substituent, nD represents an integer from 0 to 4, and two or more of R 2D 's may be bonded to each other to form a ring.
• PHOTORESIST COMPOSITIONS AND PATTERN FORMATION METHODS
  申请人：ROHM AND HAAS ELECTRONIC MATERIALS LLC

  公开号：US20220019143A1

  公开（公告）日：2022-01-20

  A photoresist composition comprising: a first polymer comprising a first repeating unit comprising a hydroxy-aryl group and a second repeating unit comprising an acid-labile group; a second polymer comprising a first repeating unit comprising an acid-labile group, a second repeating unit comprising a lactone group, and a third repeating unit comprising a base-soluble group, wherein the base-soluble group has a pKa of less than or equal to 12, and wherein the base-soluble group does not comprise a hydroxy-substituted aryl group; a photoacid generator; and a solvent, wherein the first polymer and the second polymer are different from each other.