申请人:BASF Aktiengesellschaft
公开号:US05202483A1
公开(公告)日:1993-04-13
Ethylenically unsaturated compounds of the general formula I ##STR1## where R.sub.1 is alkyl of 1 to 4 carbon atoms, cyclopropyl, cyclopentyl, cyclohexyl, phenyl or phenyl in which some or all of the hydrogen atoms have been replaced by radicals R.sup.4, not more than two substituents R.sup.4 being identical, or R.sup.1 together with R.sup.2 or together with R.sup.6 forms a --CH.sub.2 --CH.sub.2 -- or --CH.sub.2 --CH.sub.2 --CH.sub.2 -- bridge, R.sup.4 is alkyl of 1 to 24 carbon atoms, --OH, --O--R.sup.7, --S--R.sup.7, ##STR2## R.sup.2 or R.sup.6, independently of one another, both are hydrogen, or one of the radicals R.sup.4, or, where R.sup.1 is aryl, R.sup.2 or R.sup.6 is a direct bond to R.sup.1 in the ortho-position with respect to the carbonyl group, and R.sup.3 and R.sup.5 are each hydrogen, one of the radicals R.sup.4 or a group the general formula II ##STR3## where R.sup.7 and R.sup.8 are each alkyl of 1 to 4 carbon atoms, R.sup.9 is cycloalkyl of 5 or 6 carbon atoms, R.sup.10 is hydrogen or alkyl of 1 to 4 carbon atoms and R.sup.11 is hydrogen or alkyl of 1 to 4 carbon atoms, with the proviso that either R.sup.3 or R.sup.5 is a group of the general formula II, are suitable for the preparation of polymers which, after exposure to actinic radiation, have increased internal strength.
通用式I的乙烯不饱和化合物##STR1##其中R.sub.1是1至4个碳原子的烷基,环丙基,环戊基,环己基,苯基或苯基,其中一些或全部氢原子已被基团R.sup.4取代,不超过两个取代基R.sup.4相同,或R.sup.1与R.sup.2或与R.sup.6一起形成--CH.sub.2--CH.sub.2--或--CH.sub.2--CH.sub.2--CH.sub.2--桥,R.sup.4是1至24个碳原子的烷基,--OH,--O--R.sup.7,--S--R.sup.7,##STR2##R.sup.2或R.sup.6,彼此独立,都是氢,或一个基团R.sup.4,或者,其中R.sup.1是芳基,R.sup.2或R.sup.6是与R.sup.1相对于羰基的邻位直接键合,R.sup.3和R.sup.5分别是氢,基团R.sup.4中的一个,或通用式II的基团##STR3##其中R.sup.7和R.sup.8分别是1至4个碳原子的烷基,R.sup.9是5或6个碳原子的环烷基,R.sup.10是氢或1至4个碳原子的烷基,R.sup.11是氢或1至4个碳原子的烷基,条件是R.sup.3或R.sup.5是通用式II的基团之一,适用于制备聚合物,经过光辐射后,其内部强度增加。