SULFONATE COMPOUND, PHOTOACID GENERATOR, AND RESIN COMPOSITION FOR PHOTOLITHOGRAPHY
申请人:SAN-APRO LIMITED
公开号:US20170233336A1
公开(公告)日:2017-08-17
Provided are: a non-ionic photoacid generator containing a sulfonate compound having a high photosensitivity to i lines, exhibiting excellent heat-resistance stability, and exhibiting excellent solubility in a hydrophobic material; and a resin composition for photolithography containing the same. The present invention is a sulfonate compound characterized by being represented by general formula (1).
[In formula (1), R1 represents an aryl group having 6 to 18 carbon atoms or a heterocyclic hydrocarbon group having 4 to 20 carbon atoms. R2 represents a hydrogen atom, an alkyl group having 1 to 18 carbon atoms, an alkenyl group having 2 to 18 carbon atoms, an alkynyl group having 2 to 18 carbon atoms, or an aryl group having 6 to 18 carbon atoms. R3 represents a hydrocarbon group having 1 to 18 carbon atoms (in which some or all hydrogen atoms may be substituted with fluorine).]
提供的是:一种非离子光酸发生剂,含有对i线具有高光敏度的磺酸化合物,表现出优异的耐热稳定性,并在疏水材料中表现出优异的溶解性;以及含有该化合物的光刻树脂组合物。本发明是一种磺酸化合物,其特征在于由通式(1)表示。[在式(1)中,R1表示具有6至18个碳原子的芳基基团或具有4至20个碳原子的杂环烃基团。R2表示氢原子,具有1至18个碳原子的烷基基团,具有2至18个碳原子的烯基基团,具有2至18个碳原子的炔基基团或具有6至18个碳原子的芳基基团。R3表示具有1至18个碳原子的烃基团(其中一些或全部氢原子可以被氟代替)。]