dibromoarenes) reacted with diphenols, catalyzed by CuI/Fe(acac)3 in the presence of K2CO3 in anhydrous DMSO at 110 °C for 7 days under nitrogen atmosphere, to afford macrocyclic aryl ethers effectively. To expand this methodology, a cyclic hepta(p-phenylene oxide) and cyclic deca(p-phenylene oxide) were synthesized in one pot. Some macrocyclic aryl ethers showed strong fluorescence in acetone at 25 °C.
在K 2 CO 3的存在下,在无水DMSO中,氮气氛下,CuI / Fe(acac)3催化二碘芳烃(或二溴芳烃)与二酚反应,在110°C的条件下,在氮气氛下,将其催化7天,从而有效地提供了大环芳基醚。为了扩展该方法,在一个罐中合成了环状七(对苯醚)和环状十(对苯醚)。一些大环芳基醚在25°C的丙酮中显示强荧光。
Synthesis of Large Macrocycles with Chiral Sulfur Centers via Enantiospecific SuFEx and SuPhenEx Click Reactions
Here we report the first asymmetric synthesis of large chiralmacrocycles with chiral sulfur atoms. Building on stereospecific SuFEx and SuPhenEx click chemistries, this approach utilizes disulfonimidoyl fluorides and disulfonimidoyl p-nitrophenolates─which are efficient building blocks with two chiral sulfur centers, and diphenols to efficiently form novel S–O bonds. Characteristic results include
POLYMER, COMPOSITION, MOLDED ARTICLE, CURED PRODUCT AND LAMINATE
申请人:JSR Corporation
公开号:EP3766919A1
公开(公告)日:2021-01-20
A novel polymer having high glass transition temperature and an excellent balance between heat resistance, high refractive index and mechanical properties, and a composition and molded article containing the polymer are provided. The polymer according to the invention has a first structural unit represented by at least one of formulae (1-1), (1-2) and (1-3) below and a second structural unit having either a secondary amino structure or a tertiary amino structure at two or more terminals.
The present disclosure relates to epoxide containing compounds comprising three benzene units linked by bridging groups. The disclosure also relates to the production of curable epoxy resin formulations comprising said epoxide containing compounds, and their possible incorporation into composite materials such as fibre reinforced composites. Possible methods for formulating the compounds epoxide containing compounds, as described herein, are also disclosed.