The invention provides a novel sulfonium salt having a substituted or unsubstituted arylsulfonate anion. The novel sulfonium salt minimizes the influence of deactivation by basic compounds not only at a resist surface, but also at a resist-substrate interface, assists a resist to be configured to a definite pattern profile. When the sulfonium salt has an acid labile group, it is effective for increasing the dissolution contrast between exposed and unexposed areas. The sulfonium salt is useful in a chemically amplified positive resist composition which lends itself to fine patterning and features high resolution.
本发明提供了一种具有取代或未取代芳基
磺酸盐阴离子的新型
磺胺盐。该新型
磺胺盐不仅可以最小化碱性化合物在抗蚀表面的影响,还可以在抗蚀-基底界面上发挥作用,帮助抗蚀材料形成明确的图案轮廓。当该
磺胺盐具有酸敏基团时,它可以有效地增加曝光区域和未曝光区域之间的溶解对比度。该
磺胺盐在
化学增强正型抗蚀组合物中非常有用,可用于细微图案化和高分辨率特征。