A gas for plasma reaction comprising a chainlike perfluoroalkyne having 5 or 6 carbon atoms, preferably perfluoro-2-pentyne. This plasma reaction gas is suitable for dry etching for formation of a fine pattern, for plasma CVD for formation of a thin film, and for plasma ashing. The plasma reaction gas is synthesized by contacting a dihydrofluoroalkane compound or a monohydrofluoroalkene compound with a basic compound.
一种用于等离子反应的气体,包括具有5或6个碳原子的链状
全氟烷炔,最好是
全氟-
2-戊炔。这种等离子反应气体适用于干法刻蚀形成细微图案,用于等离子CVD形成薄膜,以及用于等离子灰化。通过将二氢氟烷化合物或单氢
氟烯化合物与碱性化合物接触来合成等离子反应气体。