(2-硝基-苯基)-甲磺酸 | 782389-43-9

• 分子结构分类: 有机化合物 - 苯类化合物 - 苯和取代衍生物
• 中文名称: (2-硝基-苯基)-甲磺酸
• 英文名称: (2-nitro-phenyl)-methanesulfonic acid
• 英文别名: (2-Nitro-phenyl)-methansulfonsaeure；(2-Nitrophenyl)methanesulfonic acid
• CAS: 782389-43-9
• 化学式: C₇H₇NO₅S
• 分子量: 217.202
• InChiKey: YSWBUABBMRVQAC-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  0.8
• 重原子数：
  14
• 可旋转键数：
  2
• 环数：
  1.0
• sp3杂化的碳原子比例：
  0.14
• 拓扑面积：
  109
• 氢给体数：
  1
• 氢受体数：
  5

反应信息

• 作为反应物：
  描述：

  (2-硝基-苯基)-甲磺酸 在 吡啶 、 氯化亚砜 、 N,N-二甲基甲酰胺 作用下， 以 二氯甲烷 为溶剂， 反应 3.5h， 生成 N-(2'-fluoro-4'-(1,1,1,3,3,3-hexafluoro-2-hydroxypropan-2-yl)-[1,1'-biphenyl]-4-yl)-1-(2-nitrophenyl)methanesulfonamide
  参考文献：
  名称：

  XY101的发现和表征，XY101是一种有效，选择性和口服可生物利用的RORγ反向激动剂，用于治疗去势抵抗性前列腺癌。

  摘要：

  我们报告了核受体RORγ反向激动剂作为前列腺癌治疗药物的设计，优化和生物学评估。最有效的化合物27（指定为XY101）在基于细胞的报告基因分析中表现出细胞活性，IC50值为30 nM，对其他核受体亚型具有良好的选择性。27与RORγ配体结合域复合的共晶体结构为其拮抗机制提供了坚实的结构基础。27有效抑制细胞生长，集落形成以及AR，AR-V7和PSA的表达。27还表现出良好的代谢稳定性和药代动力学特征，口服生物利用度为59％，半衰期为7.3小时。尤其，图27显示了在小鼠的前列腺癌异种移植模型中具有显着的肿瘤生长抑制作用的有希望的治疗作用。有效的，选择性的，代谢稳定的和口服可用的RORγ反向激动剂代表了一类新型化合物，可作为对抗前列腺癌的潜在疗法。

  DOI：

  10.1021/acs.jmedchem.9b00327
• 作为产物：
  描述：

  2-硝基苄氯 在 sodium sulfite 作用下， 生成 (2-硝基-苯基)-甲磺酸
  参考文献：
  名称：

  Marckwald; Frahne, Chemische Berichte, 1898, vol. 31, p. 1855

  摘要：

  DOI：

文献信息

• PROCESS FOR PRODUCING ALKOXYCARBONYLFLUOROALKANESULFONATES
  申请人：FUJIWARA Masaki

  公开号：US20080108846A1

  公开（公告）日：2008-05-08

  A process for producing an alkoxycarbonylfluoroalkanesulfonate represented by the formula [1] is provided. This process includes the steps of (a) reacting a halofluoroalkanoate represented by the formula [2], with a sulfinating agent, thereby obtaining an alkoxycarbonylfluoroalkanesulfinate represented by the formula [3]; and (b) reacting the alkoxycarbonylfluoroalkanesulfinate with an oxidizing agent, thereby obtaining the target alkoxycarbonylfluoroalkanesulfonate. Furthermore, it is possible to react the obtained alkoxycarbonylfluoroalkanesulfonate with a monovalent onium salt to conduct a salt exchange, thereby obtaining a alkoxycarbonylfluoroalkanesulfonic acid onium salt represented by the formula [4].

  提供了一种制备由公式[1]表示的烷氧羰基氟代烷磺酸盐的方法。这个过程包括以下步骤：(a)使由公式[2]表示的卤氟代烷酸盐与亚磺化剂反应，从而获得由公式[3]表示的烷氧羰基氟代烷亚磺酸盐；以及(b)使烷氧羰基氟代烷亚磺酸盐与氧化剂反应，从而获得目标烷氧羰基氟代烷磺酸盐。此外，可以将获得的烷氧羰基氟代烷磺酸盐与单价阳离子盐进行反应，进行盐交换，从而获得由公式[4]表示的烷氧羰基氟代烷磺酸阳离子盐。
• Novel sulfonyldiazomethanes, photoacid generators, resist compositions, and patterning process
  申请人：——

  公开号：US20040167322A1

  公开（公告）日：2004-08-26

  A chemical amplification type resist composition comprising a specific benzenesulfonyldiazomethane containing a long-chain alkoxyl group at the 2-position on benzene ring has many advantages including improved resolution, improved focus latitude, minimized line width variation or shape degradation even on long-term PED, minimized debris left after coating, development and peeling, and improved pattern profile after development and is thus suited for microfabrication.

  一种化学放大型抗蚀组合物，包括在苯环上的2-位含有长链烷氧基基团的特定苯磺酰二氮甲烷，具有许多优点，包括提高分辨率，改善焦点宽度，即使在长期PED上也减少线宽变化或形状退化，涂层、显影和剥离后减少残留物，并在显影后改善图案轮廓，因此适用于微加工。
• COMPOUND, RESIN, MATERIAL FOR FORMING UNDERLAYER FILM FOR LITHOGRAPHY, UNDERLAYER FILM FOR LITHOGRAPHY, PATTERN FORMING METHOD, AND METHOD FOR PURIFYING THE COMPOUND OR RESIN
  申请人：Mitsubishi Gas Chemical Company, Inc.

  公开号：US20170073288A1

  公开（公告）日：2017-03-16

  The compound according to the present invention is represented by a specific formula. The compound according to the present invention has a structure according to the specific formula, and therefore can be applied to a wet process and is excellent in heat resistance and etching resistance. In addition, the compound according to the present invention has such a specific structure, and therefore has a high heat resistance, a relatively high carbon concentration, a relatively low oxygen concentration and also a high solvent solubility. Therefore, the compound according to the present invention can be used to form an underlayer film whose degradation is suppressed at high-temperature baking and which is also excellent in etching resistance to oxygen plasma etching or the like. Furthermore, the compound is also excellent in adhesiveness with a resist layer and therefore can form an excellent resist pattern.

  根据本发明，该化合物由特定的公式表示。根据本发明，该化合物具有特定公式的结构，因此可应用于湿法工艺，具有优异的耐热性和耐蚀性。此外，根据本发明，该化合物具有特定结构，因此具有高耐热性、相对较高的碳浓度、相对较低的氧浓度以及高溶剂溶解性。因此，根据本发明的化合物可用于形成在高温烘烤时降解受抑制且在氧等离子体蚀刻中具有优异耐蚀性的底层膜。此外，该化合物在与光阻层的粘附性方面也表现出色，因此可形成优异的光阻图案。
• Methods for Producing Fluorine-Containing Hydroxyaldehyde, Fluorine-Containing Propanediol, and Fluorine-Containing Alcohol Monomer
  申请人：Central Glass Company, Limited

  公开号：US20150361026A1

  公开（公告）日：2015-12-17

  As shown by the following reaction formula, disclosed is a fluorine-containing hydroxyaldehyde production method, including the step of obtaining a fluorine-containing hydroxyaldehyde represented by the general formula (1) by reacting a fluorine-containing ketone represented by the general formula (4) and an aldehyde represented by the general formula (5) in the presence of an organic base selected from a heterocyclic compound which contains a nitrogen atom in its ring or a tertiary amine. By this production method, it is possible to obtain the fluorine-containing hydroxyaldehyde in a high yield. Furthermore, it is possible to easily obtain in high yields a fluorine-containing propanediol, which is a derivative of this fluorine-containing hydroxyaldehyde, and a fluorine-containing alcohol monomer by using the same.

  根据以下反应方程式，揭示了一种含氟羟基醛的生产方法，包括通过在选择的含氟酮（通式（4）表示）和醛（通式（5）表示）在含有从含有氮原子的杂环化合物或三级胺中选择的有机碱的情况下反应，获得由通式（1）表示的含氟羟基醛的步骤。通过这种生产方法，可以高产率地获得含氟羟基醛。此外，可以通过使用相同方法轻松高产率地获得含氟丙二醇（这是这种含氟羟基醛的衍生物）和含氟醇单体。
• Photoacid generators, chemically amplified resist compositions, and patterning process
  申请人：Ohsawa Youichi

  公开号：US20070292768A1

  公开（公告）日：2007-12-20

  A photoacid generator has formula (1). A chemically amplified resist composition comprising the photoacid generator has advantages including a high resolution, focus latitude, long-term PED dimensional stability, and a satisfactory pattern profile shape. When the photoacid generator is combined with a resin having acid labile groups other than those of the acetal type, resolution and top loss are improved. The composition is suited for deep UV lithography.

  一种光酸发生剂的化学式为（1）。包括该光酸发生剂的化学增感抗蚀组合物具有诸如高分辨率、焦点宽度、长期PED尺寸稳定性和令人满意的图案轮廓形状等优点。当该光酸发生剂与具有除了缩醛类型以外的酸敏感基团的树脂结合时，可以改善分辨率和顶部损失。该组合物适用于深紫外光刻。