4-苯基硫烷基苯磺酸 | 95684-39-2

• 分子结构分类: 有机化合物 - 有机硫化合物 - 硫醚类
• 中文名称: 4-苯基硫烷基苯磺酸
• 英文名称: phenyl p-sulphophenyl sulphide
• 英文别名: p-Phenylthiobenzolsulfonsaeure；4-phenylsulfanyl-benzenesulfonic acid；4-Phenylmercapto-benzolsulfonsaeure；Benzenesulfonic acid, 4-(phenylthio)-；4-phenylsulfanylbenzenesulfonic acid
• CAS: 95684-39-2
• 化学式: C₁₂H₁₀O₃S₂
• 分子量: 266.342
• InChiKey: GLEUKHIEIHXBQO-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  2.7
• 重原子数：
  17
• 可旋转键数：
  3
• 环数：
  2.0
• sp3杂化的碳原子比例：
  0.0
• 拓扑面积：
  88
• 氢给体数：
  1
• 氢受体数：
  4

反应信息

• 作为反应物：
  描述：

  4-苯基硫烷基苯磺酸 在 五氯化磷 作用下， 以 甲苯 为溶剂， 反应 1.0h， 生成 4,4'-thiodibenzenesulfonyl chloride
  参考文献：
  名称：

  [EN] COMPOUNDS WITH PGD2 ANTAGONIST ACTIVITY
  [FR] COMPOSES A ACTIVITE ANTAGONISTE DE PGD2

  摘要：

  通式（I）的化合物；其中R1、R2、R3和R4独立地是氢、卤素、-C1-C6烷基、-O(C1-C6烷基)、-C1-C6烷基(C3-C7环烷基)、-CON(R9)2、-SOR9、-S02R9、-S02N(R9)2、-N(R9)2、-NR9OR9、-C02R9、COR9、-SR9、-OH、-N02或-CN；每个R9独立地是氢或C1-C6烷基；R5和R6独立地是氢或C1-C6烷基，或者与它们连接的碳原子一起形成一个C3-C7环烷基基团；R7是氢或C1-C6烷基；R8是C1-C6烷基、C2-C6烯基、C2-C6炔基或芳香基，其中任何一个可以选择地被一个或多个卤素、-SOR13、-S02R13、-R14、-OR14、-CON(R14)2、-SOR14、-S02R14、-S02N(R14)、-SO2N(R14)2、-N(R14)2、NR14COR14、-CO2R14、COR14、-SR14、-N02或-CN的取代基取代；其中R13是一个含有5至7个成员的杂环；每个R14独立地是氢、烷基或芳基，芳基可以选择地被-R9、-OR9、-CON(R9)2、-SOR9、-S02R9、-S02N(R9)2、-N(R9)2、NR9COR9、-C02R9、-COR9、-SR9、卤素、-N02或-CN取代；其中R9如上所定义；但是当R1、R3和R4是氢且R2是氢、卤素或-O(C1-C6)烷基时，R8不是未取代的苯基或被卤素、C1-C6烷基、-O(C1-C6)烷基、-S(C1-C6)烷基或-CO(C1-C6)烷基取代的苯基；或者其药学上可接受的盐、水合物、溶剂合物或前药在治疗过敏性疾病，如哮喘、过敏性鼻炎和特应性皮炎中有用。

  公开号：

  WO2005040112A1
• 作为产物：
  描述：

  二苯硫醚 在 氯磺酸 作用下， 以 氯仿 为溶剂， 反应 0.5h， 生成 4-苯基硫烷基苯磺酸
  参考文献：
  名称：

  Cerebrovasodilatation through selective inhibition of the enzyme carbonic anhydrase. 3. 5-(Arylthio)-, 5-(arylsulfinyl)-, and 5-(arylsulfonyl)thiophene-2-sulfonamides

  摘要：

  A series of 5-(arylthio)-, 5-(arylsulfinyl)-, and 5-(arylsulfonyl)thiophene-2-sulfonamides is described and anticonvulsant activities are listed for the compounds. In most cases, the sulfones had the highest activity and the sulfides the least. Sulfones with 3- or 4-halo substituents generally had the highest activity, and one analogue, 5-[(4-fluorophenyl)sulfonyl]thiophene-2-sulfonamide (51, UK-17022), had an anticonvulsant ED50 fo 2 mg/kg when administered orally to mice. Compound 51 selectively increased cerebral blood flow in animals without an unacceptable level of diuresis.

  DOI：

  10.1021/jm00140a009

文献信息

• Antimicrobial Devices and Compositions
  申请人：Karandikar Bhalchandra M.

  公开号：US20090035342A1

  公开（公告）日：2009-02-05

  The present invention comprises methods and compositions for antimicrobial devices comprising metal containing compositions which are resistant to heat and light discoloration. The metal containing compositions may comprise salts or complexes of silver, copper or zinc. In one aspect the compositions comprise silver salts. In another aspect, the compositions comprise silver complexes. In one aspect, the metal salts may comprise metal salts of saccharin, acesulfame, long chain fatty acids, and alkyl dicarboxylic acids. The compositions further comprise polymers which form salts or complexes with silver, copper or zinc. The methods of the present invention comprise treating devices with the metal containing compositions, including, but not limited to, such devices as woven wound care materials, catheters, patient care devices, and collagen matrices. The present invention further comprises treatment of humans and animals with the antimicrobial devices described herein.

  本发明涉及一种包括金属含量组合物的抗菌装置的方法和组合物，该组合物对热和光变色具有抗性。金属含量组合物可以包括银、铜或锌的盐或络合物。在一方面，组合物包括银盐。在另一方面，组合物包括银络合物。在一方面，金属盐可以包括糖精盐、乙酰糖胺盐、长链脂肪酸盐和烷基二羧酸盐。该组合物进一步包括与银、铜或锌形成盐或络合物的聚合物。本发明的方法包括使用金属含量组合物处理装置，包括但不限于编织伤口护理材料、导管、患者护理设备和胶原蛋白基质等装置。本发明还包括使用上述抗菌装置治疗人类和动物的方法。
• ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM, MASK BLANK PROVIDED WITH ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM, PHOTOMASK, PATTERN FORMING METHOD, METHOD FOR MANUFACTURING ELECTRONIC DEVICE, ELECTRONIC DEVICE, COMPOUND, AND METHOD FOR PRODUCING COMPOUND
  申请人：FUJIFILM Corporation

  公开号：US20160280621A1

  公开（公告）日：2016-09-29

  The composition contains an alkali-soluble resin and a crosslinking agent that is represented by the following General Formula (I). In the formula, each of R 1 and R 6 independently represents a hydrogen atom or a hydrocarbon group having 5 or less carbon atoms; each of R 2 and R 5 independently represents an alkyl group, a cycloalkyl group, an aryl group, or an acyl group; and each of R 3 and R 4 independently represents a hydrogen atom or an organic group having 2 or more carbon atoms, and R 3 and R 4 may be bonded to each other to form a ring.

  该组合物包含一种碱溶性树脂和一种由下列通式（I）表示的交联剂。在该式中，R1和R6各自独立地表示氢原子或具有5个或更少碳原子的碳氢基团；R2和R5各自独立地表示烷基、环烷基、芳基或酰基；R3和R4各自独立地表示氢原子或具有2个或更多碳原子的有机基团，且R3和R4可以结合形成环。
• ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE COMPOSITION, AND RESIST FILM, RESIST-COATED MASK BLANKS, RESIST PATTERN FORMING METHOD AND PHOTOMASK EACH USING THE COMPOSITION
  申请人：FUJIFILM CORPORATION

  公开号：US20150010855A1

  公开（公告）日：2015-01-08

  There is provided an actinic ray-sensitive or radiation-sensitive composition containing (α) a compound represented by the formula (αI) capable of generating an acid having a size of 200 Å 3 or more in volume and (β) a compound capable of generating an acid upon irradiation with an actinic ray or radiation, and the formula (αI) is defined as herein, and a resist film formed using the actinic ray-sensitive or radiation-sensitive composition, a resist-coated mask blanks coated with the resist film, a resist pattern forming method comprising exposing the resist film and developing the exposed film, a photomask obtained by exposing and developing the resist-coated mask blanks, a method for manufacturing an electronic device, comprising the resist pattern forming method and an electronic device manufactured by the manufacturing method of an electronic device.

  提供一种感光或辐射敏感的组合物，其中包含(α)一种化合物，其由公式(αI)表示，能够产生大小为200Å3或更大的体积的酸，以及(β)一种化合物，能够在受到光辐射或辐射时产生酸，公式(αI)的定义如本文所述。还提供了使用该感光或辐射敏感组合物形成的光阻膜，涂有光阻膜的光阻涂层掩模坯料，包括曝光光阻膜和显影曝光后膜的光阻图案形成方法，通过曝光和显影涂有光阻涂层的掩模坯料获得的光掩模，以及一种电子器件的制造方法，包括光阻图案形成方法和制造电子器件的电子器件制造方法，以及通过该电子器件制造方法制造的电子器件。
• Process for the production of arylsulfonyl halides
  申请人：STAUFFER CHEMICAL COMPANY

  公开号：EP0243584A1

  公开（公告）日：1987-11-04

  There is disclosed a process for the production of arylsulfonyl halides, e.g., benzenesulfonyl chloride. The disclosed process adds a phosphorus-containing additive, e.g., phosphorous acid, before the reaction of an arylsulfonic acid with a sulfur halide and a halogen. The phosphorus-containing additive reduces the thermal instability of the residue remaining after distillation of the arylsulfonyl halide.

  本发明公开了一种生产芳基磺酰基卤化物（如苯磺酰氯）的工艺。所公开的工艺在芳基磺酸与硫卤化物和卤素反应之前添加了含磷添加剂，如磷酸。含磷添加剂可降低芳基磺酰基卤蒸馏后残留物的热不稳定性。
• Antimicrobial devices and compositions
  申请人：Karandikar Bhalchandra M.

  公开号：US10251392B2

  公开（公告）日：2019-04-09

  The present invention comprises methods and compositions for antimicrobial devices comprising metal containing compositions which are resistant to heat and light discoloration. The metal containing compositions may comprise salts or complexes of silver, copper or zinc. In one aspect the compositions comprise silver salts. In another aspect, the compositions comprise silver complexes. In one aspect, the metal salts may comprise metal salts of saccharin, acesulfame, long chain fatty acids, and alkyl dicarboxylic acids. The compositions further comprise polymers which form salts or complexes with silver, copper or zinc. The methods of the present invention comprise treating devices with the metal containing compositions, including, but not limited to, such devices as woven wound care materials, catheters, patient care devices, and collagen matrices. The present invention further comprises treatment of humans and animals with the antimicrobial devices described herein.

  本发明包括用于抗菌装置的方法和组合物，其中包含耐热和耐光变色的含金属组合物。含金属的组合物可包括银、铜或锌的盐或络合物。一方面，组合物包含银盐。另一方面，组合物还包括银络合物。一方面，金属盐可包括糖精、安赛蜜、长链脂肪酸和烷基二羧酸的金属盐。组合物还包括与银、铜或锌形成盐或络合物的聚合物。本发明的方法包括用含金属的组合物处理设备，包括但不限于编织伤口护理材料、导管、病人护理设备和胶原蛋白基质等设备。本发明还包括用本文所述的抗菌装置处理人和动物。