Chemical solution deposited thin films of titanium, chromium, zirconium, and tin oxides
作者:A. M. Abyzov
DOI:10.1134/s1070427217070096
日期:2017.7
TiO2, Cr2O3, ZrO2, and SnO2 films with thicknesses of similar to 10-100 nm were produced via dipping into solution and subsequent annealing in air. The films were studied by the methods of scanning electron microscopy, elemental X-ray spectral analysis, optical spectroscopy, and X-ray diffraction. The electrical conductivity of the films in air and in a vacuum was measured. The adhesion of most of the films to the substrate was found to be high. A crystalline structure was observed for films thicker than 10 nm. The films have a specific surface resistance of 10(8)-10(12) Omega in air and 10(9)-10(14) Omega in a vacuum. The films are promising as coatings for various purposes, including the development of structures of the core-shell type.