A chemical amplification resist composition comprising an acid sensitive copolymer wherein the protecting group of a protected carboxyl group bonded to the side chain of a first monomer unit is represented by the following formula (I):
where R1 represents hydrogen or another substituent, L represents a linking group and n is an integer of 1 to 4, and a second monomer unit has an acidic functional group protected with an acid-unstable protecting group, bonded to its side chain. It can be used to form fine resist patterns that have practically usable sensitivity and undergo no swelling.
一种
化学放大光刻胶组合物,包括一种酸敏感共聚物,其中第一个单体单元的侧链上的受保护羧基的保护基由以下公式(I)表示:其中R1表示氢或另一种取代基,L表示连接基,n为1至4的整数,并且第二个单体单元具有一个酸性功能基,其侧链上带有不稳定的酸保护基。它可以用于形成精细的光刻胶图案,具有实用的灵敏度,并且不会膨胀。