申请人:Hoffmann-La Roche Inc.
公开号:US04124598A1
公开(公告)日:1978-11-07
New psoralen compounds have been synthesized. The compounds all include the addition of substituent groups at the 4' position on the basic trioxsalen structure. Specifically, the compounds have the structure: ##STR1## wherein X may be any desired substituent such as halogenated alkyls, alcohols, ethers, aminoalkyls, etc. The new substituted psoralens exhibit high solubility in aqueous solution and low dissociation constants from deoxyribonucleic acid (DNA), as well as a reactivity with ribonucleic acids (RNA). Such psoralen compounds find use in the study of secondary structures of nucleic acids; as inhibitors of RNA replication; in the inactivation of viruses; and in the photo chemotherapy of psoriasis.
新的苦参素化合物已经合成。这些化合物都包括在基本的三氧苯并结构的4'位置上添加取代基团。具体来说,这些化合物具有以下结构:##STR1## 其中X可以是任何所需的取代基团,如卤代烷基,醇,醚,氨基烷基等。这些新的取代苦参素在水溶液中具有高溶解度,并且从脱氧核糖核酸(DNA)中具有低离解常数,以及与核糖核酸(RNA)反应性。这些苦参素化合物可用于研究核酸的二级结构;作为RNA复制的抑制剂;在病毒灭活中使用;以及在牛皮癣的光化学治疗中使用。