Positive tone photosensitive compositions containing amic acid as latent base catalyst
申请人:PROMERUS, LLC
公开号:US11061328B2
公开(公告)日:2021-07-13
Embodiments in accordance with the present invention encompass photosensitive compositions containing a base soluble polymer, a latent base catalyst, a photoactive compound and an epoxy crosslinking agent. The compositions are useful for forming films that can be patterned to create structures for microelectronic devices, microelectronic packaging, microelectromechanical systems, optoelectronic devices and displays. In some embodiments the compositions of this invention are shown to feature excellent hitherto unachievable mechanical properties. More specifically, the compositions exhibit increased photo speed, higher elongation to break, higher tensile strength and higher glass transitions temperatures than the conventional compositions, among other enhanced properties. Accordingly, the positive images formed therefrom exhibit improved thermo-mechanical properties, among other property enhancements.
根据本发明的实施方案,光敏组合物含有基溶性聚合物、潜基催化剂、光活性化合物和环氧交联剂。这些组合物可用于形成可图案化的薄膜,以创建微电子器件、微电子封装、微机电系统、光电子器件和显示器的结构。在某些实施方案中,本发明的组合物具有迄今为止无法实现的优异机械性能。更具体地说,与传统组合物相比,本发明组合物具有更高的光速、更高的断裂伸长率、更高的拉伸强度和更高的玻璃转化温度,以及其他更强的性能。因此,由其形成的正像除其他性能增强外,还具有更好的热机械性能。