4-(Ethylthio)-thiophenol | 56056-57-6

• 分子结构分类: 有机化合物 - 苯类化合物 - 苯硫酚类
• 英文名称: 4-(Ethylthio)-thiophenol
• 英文别名: 4-ethylthiobenzenethiol；4-(Ethylthio)thiophenol；4-ethylsulfanylbenzenethiol
• CAS: 56056-57-6
• 化学式: C₈H₁₀S₂
• mdl: MFCD06201756
• 分子量: 170.299
• InChiKey: YIZJHQYLSZSTKQ-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  3
• 重原子数：
  10
• 可旋转键数：
  2
• 环数：
  1.0
• sp3杂化的碳原子比例：
  0.25
• 拓扑面积：
  26.3
• 氢给体数：
  1
• 氢受体数：
  2

安全信息

• 海关编码：
  2930909090

反应信息

• 作为反应物：
  描述：

  4-(Ethylthio)-thiophenol 在 sodium 作用下， 以 六甲基磷酰三胺 为溶剂， 生成 4-(Methylthio)-phenyl isopropyl sulphide
  参考文献：
  名称：

  HMPA中钠对芳基烷基醚和硫醚的选择性脱烷基

  摘要：

  钠与HMPA中的双和三（烷氧基）苯反应可选择性地产生单脱烷基化产物。反应通过二价阴离子进行，该二价阴离子分裂成烷基和芳氧基阴离子。该片段的位置选择性由烷基和芳氧基的结构决定。对于出于对称原因可以提供具有相同碱性的芳氧基阴离子的双和三（烷氧基）苯，脱烷基化仅涉及较少取代的烷基。相反，在不对称术语中，脱烷基化过程的位置选择性由芳氧基阴离子的碱性决定。基于这些概念，已经开发了几种有效的和合成上有用的反应。在大多数情况下，在本反应中获得的选择性不同于在HMPA中使用甲醇钠或链烷硫醇钠的其他先前开发的方法所观察到的选择性。结果表明，适当的试剂选择可以使聚（烷氧基）苯的所需烷氧基选择性脱烷基。

  DOI：

  10.1016/0040-4020(82)80078-1
• 作为产物：
  描述：

  苯乙硫醚 生成 4-(Ethylthio)-thiophenol
  参考文献：
  名称：

  8-Alkylthio-10-piperazinodibenzo[b,f]thiepins

  摘要：

  DOI：

  10.1135/cccc19743338

文献信息

• Synthesis of arylthioacetamidoximes as potential antidepressants
  作者：Irena Červená、Marta Hrubantová、Marie Bartošová、Miroslav Protiva

  DOI：10.1135/cccc19811188

  日期：——

  Reactions of thiophenol and 16 of its derivatives with chloroacetonitrile afforded arylthioacetonitriles IVb-XXb which were treated with hydroxylamine and gave arylthioacetamidoximes IVa-XXa. Compounds VIIa-IXa, XIIa, XVIa and XVIIIa exhibited antireserpine activity in the test of ptosis in mice and compounds IXa and XVIIa in the test of reserpine hypothermia in mice.

  硫苯酚及其16种衍生物与氯乙腈反应生成芳基硫代乙腈IVb-XXb，经过氢氧胺处理后得到芳基硫代乙酰肟IVa-XXa。化合物VIIa-IXa、XIIa、XVIa和XVIIIa在小鼠睫下垂试验中表现出抗利血平活性，化合物IXa和XVIIa在小鼠利血平低体温试验中表现出活性。
• CHEMICALLY AMPLIFIED PHOTOSENSITIVE COMPOSITION, PHOTOSENSITIVE DRY FILM, METHOD OF MANUFACTURING PATTERNED RESIST FILM, METHOD OF MANUFACTURING SUBSTRATE WITH TEMPLATE, METHOD OF MANUFACTURING PLATED ARTICLE, AND COMPOUND
  申请人：TOKYO OHKA KOGYO CO., LTD.

  公开号：US20200209739A1

  公开（公告）日：2020-07-02

  A chemically amplified photosensitive composition which forms a resist pattern whose cross-sectional shape is rectangular, and which has a wide depth of focus margin; a photosensitive dry film having a photosensitive layer made from the composition; a method of manufacturing a patterned-resist film using the composition; a method of manufacturing a substrate with a template using the composition; a method of manufacturing a plated article using the substrate with a template; and a novel compound. An acid diffusion suppressing agent having a specific structure is blended into the composition including an acid generator which generates acid upon exposure to an irradiated active ray or radiation.

  一种化学增感光敏组合物，形成一个截面形状为矩形的抗蚀图案，具有宽广的焦深度余量；一种具有由该组合物制成的感光层的感光干膜；使用该组合物制造图案抗蚀膜的方法；使用该组合物制造带有模板的基板的方法；使用带有模板的基板制造电镀物品的方法；以及一种新型化合物。酸扩散抑制剂与包括在暴露于辐射活性光线或辐射时生成酸的酸发生剂的组合物中混合，具有特定的结构。
• Fluorinated tricyclic neuroleptics with prolonged action: 8-Methoxy, 8-ethoxy, 8-ethylthio and 8-hydroxy derivatives of 3-fluoro-10-(4-methylpiperazino)-10,11-dihydrodibenzo[b,f]thiepin
  作者：Jiří Jílek、Josef Pomykáček、Jiřina Metyšová、Miroslav Protiva

  DOI：10.1135/cccc19821382

  日期：——

  Acids IIa-c were prepared by reactions of (4-fluoro-2-iodophenyl)acetic acid with 4-methoxythiophenol, 4-ethoxythiophenol and 4-(ethylthio)thiophenol and cyclized with polyphosphoric acid in boiling toluene to dibenzo[b,f]thiepin-10(11H)-ones IIIa-c. Reduction with sodium borohydride afforded the alcohols IVa-c which were treated with hydrogen chloride and gave the chloro derivatives Va-c. Substitution reactions with 1-methylpiperazine resulted in the title compounds Ia-c out of which the methoxy derivative Ia was transformed by demethylation with boron tribromide to the phenol Id. Compounds Ia-d are very potent neuroleptics exhibiting a clear prolongation of the central depressant and some prolongation of the cataleptic activity.

  酸IIa-c是通过将（4-氟-2-碘苯基）乙酸与4-甲氧基噻吩酚、4-乙氧基噻吩酚和4-(乙硫基)噻吩反应，并在沸腾甲苯中用多聚磷酸环化得到二苯并[b,f]噻吩-10(11H)-酮IIIa-c。用硼氢化钠还原得到醇IVa-c，经过氯化氢处理得到氯代衍生物Va-c。与1-甲基哌嗪的取代反应产生了标题化合物Ia-c，其中甲氧基衍生物Ia通过三溴化硼的去甲基化反应转化为酚Id。化合物Ia-d是非常有效的神经抑制剂，具有明显的中枢抑制和一定的僵硬活动延长作用。

• Cleaning solution, method of removing a removal target and method of etching a substrate using said cleaning solution
  申请人：TOKYO OHKA KOGYO CO., LTD.

  公开号：US10363585B2

  公开（公告）日：2019-07-30

  A cleaning liquid which includes 3-alkoxy-3-methyl-1-butanol represented by the following general formula (1); at least one of diethylene glycol monomethyl ether and triethylene glycol monomethyl ether; and quaternary ammonium hydroxide: in which R1 represents an alkyl group having 1 to 5 carbon atoms.

  一种清洁液，包括以下通式 (1) 所代表的 3-烷氧基-3-甲基-1-丁醇；二乙二醇单甲醚和三乙二醇单甲醚中的至少一种；以及氢氧化季铵： 其中 R1 代表具有 1 至 5 个碳原子的烷基。
• Chemically amplified positive-type photosensitive resin composition, photosensitive dry film, method of manufacturing photosensitive dry film, method of manufacturing patterned resist film, method of manufacturing substrate with template and method of manufacturing plated article
  申请人：TOKYO OHKA KOGYO CO., LTD.

  公开号：US11131927B2

  公开（公告）日：2021-09-28

  A chemically amplified positive-type photosensitive resin composition which is highly sensitive and in which it is easy to form a resist pattern whose cross-sectional shape is rectangular, a photosensitive dry film which includes a photosensitive resin layer formed from the composition, a method of manufacturing the photosensitive dry film, a method of manufacturing a patterned resist film using the composition, a method of manufacturing a substrate with a template using the composition and a method of manufacturing a plated article using the substrate with the template. A Lewis acid compound is included in the composition that also includes an acid generator which generates an acid by application of an active ray or radiation, and a resin whose solubility in alkali is increased by action of an acid.

  一种化学放大的正型光敏树脂组合物，它具有高灵敏度，并且易于形成横截面形状为矩形的抗蚀剂图案；一种光敏干膜，它包括由该组合物形成的光敏树脂层；一种制造光敏干膜的方法；一种使用该组合物制造图案抗蚀膜的方法；一种使用该组合物制造带有模板的基片的方法；以及一种使用带有模板的基片制造电镀物品的方法。组合物中包含一种路易斯酸化合物，该组合物还包括一种酸发生器（通过应用活性射线或辐射产生一种酸）和一种树脂（通过酸的作用增加其在碱中的溶解度）。