申请人:CMET Inc.
公开号:US08293448B2
公开(公告)日:2012-10-23
Provided is a resin composition for stereolithography that absorbs little water and moisture over time in uncured state, maintains a low moisture absorption rate even under high humidity, and has high curing sensitivity, from which a stereolithography product excellent in the properties, such as dimensional accuracy, mechanical properties, and dimensional stability can be smoothly produced for reduced light irradiation time. The resin composition for stereolithography comprising an oxetane compound expressed by the general formula (I) below:
wherein R1 denotes an alkyl group having 1 to 5 carbon atoms, and R2 denotes an alkylene group having 2 to 10 carbon atoms that may contain an ether bond, in the proportion of from 3 to 60 mass % based on the total mass of the resin composition for stereolithography.
提供的是一种用于立体光刻的树脂组合物,其在未固化状态下吸收的水和湿气很少,即使在高湿度下也能保持低吸湿率,并具有高固化敏感性,从而可以顺利地生产出具有尺寸精度、机械性能和尺寸稳定性等优良性能的立体光刻产品,以减少光照时间。该立体光刻用树脂组合物包括以下一般式(I)表示的环氧乙烷化合物:其中R1表示具有1到5个碳原子的烷基,R2表示具有2到10个碳原子的烷基,可能含有醚键,在立体光刻用树脂组合物的总质量基础上,按3至60质量%的比例。