10-hydrazono-9,10-dihydroanthracen-9-one | 3166-13-0

• 分子结构分类: 有机化合物 - 苯类化合物 - 蒽
• 英文名称: 10-hydrazono-9,10-dihydroanthracen-9-one
• 英文别名: 9,10-anthraquinone monohydrazone；9-Hydrazono-anthron-(10)；10-hydrazinylideneanthracen-9-one
• CAS: 3166-13-0
• 化学式: C₁₄H₁₀N₂O
• 分子量: 222.246
• InChiKey: NXAUAEWCWZJKIT-UHFFFAOYSA-N

物化性质

• 沸点：
  409.0±15.0 °C(Predicted)
• 密度：
  1.29±0.1 g/cm3(Predicted)

计算性质

• 辛醇/水分配系数(LogP)：
  2.63
• 重原子数：
  17.0
• 可旋转键数：
  0.0
• 环数：
  3.0
• sp3杂化的碳原子比例：
  0.0
• 拓扑面积：
  55.45
• 氢给体数：
  1.0
• 氢受体数：
  3.0

安全信息

• 海关编码：
  2928000090

反应信息

• 作为反应物：
  描述：

  10-hydrazono-9,10-dihydroanthracen-9-one 在 溶剂黄146 、 三乙胺 作用下， 以 1,4-二氧六环 、 乙醇 为溶剂， 反应 11.33h， 生成 4-(4-aminophenyl)-3-chloro-1-((10-oxoanthracen-9(10H)-ylidene) amino)azetidin-2-one
  参考文献：
  名称：

  10.13005/ojc/400225

  摘要：

  In order to assess the depression decreasing effect of the molecules, a forced swim protocol in rats was used to manufacture azetidinone compounds with a tricyclic nucleus. Three different procedures were used in order to synthesize the necessary compounds. Step one involved reacting anthracene-9,10-dione with hydrazine hydrate in the presence of methanol under refluxing conditions to produce 2. Next, several substituted aromatic aldehydes were refluxed with 2 under the influence glacial acetic acid as catalyst to create Schiff bases. Chloracetyl chloride was used under alkaline circumstances to accomplish cyclization in the last stage. The produced compounds 4a-e had a yield range from 61-70% and shown solubility or mild solubility in DMSO, methanol, and chloroform. Using methanol:ethyl acetate (4:6) as the solvent solution, TLC was used to evaluate the purity of the produced compounds. The compounds' Rf values ranged from 0.59 to 0.73. The compounds have a melting temperature range of 172-214°C and were produced as a white to yellow solid. The compounds demonstrated antidepressant activity that was dosage dependent. Compounds 4a, 4b, and 4d had significantly shorter immobility times (p<0.01) than the control group. It became clear that each test chemical may exhibit antidepressant activity when the dosage was increased.

  DOI：

  10.13005/ojc/400225
• 作为产物：
  描述：

  10-重氮基-9(10H)-蒽酮 在 溶剂黄146 作用下， 以 乙醇 、 乙腈 为溶剂， 生成 10-hydrazono-9,10-dihydroanthracen-9-one
  参考文献：
  名称：

  Regitz,M., Chemische Berichte, 1964, vol. 97, p. 2742 - 2754

  摘要：

  DOI：

文献信息

• Amphoteric Quinone–azine–cyclopentadithiophene System
  作者：Masatoshi Kozaki、Hiroaki Igarashi、Keiji Okada

  DOI：10.1246/cl.2004.156

  日期：2004.2

  Various quinoid groups have been connected with the cyclopentadithiophene (CPDT) skeleton via azine linkage to form a new D–π–A system. These compounds revealed weak absorptions extending to 590–630 nm, corresponding to small HOMO–LUMO gaps of 1.97–2.10 eV. Their reduction potentials were strongly dependent on the quinone moieties, whereas the oxidation potentials were controlled by the CPDT moiety. Some of these compounds underwent oxidative polymerization under electrochemical conditions to yield polymers with a highly amphoteric character.

  各种醌基通过叠氮连接与环戊二烯噻吩（CPDT）骨架相连，形成了一种新的 D-π-A 系统。这些化合物显示出延伸至 590-630 纳米的微弱吸收，对应于 1.97-2.10 eV 的小 HOMO-LUMO 间隙。它们的还原电位在很大程度上取决于醌分子，而氧化电位则由 CPDT 分子控制。其中一些化合物在电化学条件下发生氧化聚合，生成具有高度两性特性的聚合物。
• Loskutov, Russian Journal of Organic Chemistry, 2000, vol. 36, # 10, p. 1478 - 1481
  作者：Loskutov

  DOI：——

  日期：——
• COMPOSITION, METHOD OF PRODUCING SUBSTRATE, METHOD OF FORMING PATTERN, AND METHOD OF FORMING REVERSE PATTERN
  申请人：JSR CORPORATION

  公开号：US20210318619A1

  公开（公告）日：2021-10-14

  A composition includes: a cobalt-containing compound not containing a cobalt-carbon bond; and a solvent. The composition is capable of forming a coating film. The solvent preferably includes an organic solvent, and the organic solvent preferably includes an alcohol solvent. A method of producing a substrate includes applying the composition directly or indirectly on a substrate to form a coating film.
• [EN] COATING FILM FORMING COMPOSITION AND SUBSTRATE MANUFACTURING METHOD<br/>[FR] COMPOSITION DE FORMATION DE FILM DE REVÊTEMENT ET PROCÉDÉ DE FABRICATION DE SUBSTRAT<br/>[JA] 塗工膜形成用組成物及び基板の製造方法
  申请人：JSR CORP

  公开号：WO2020138121A1

  公开（公告）日：2020-07-02

  保存安定性に優れる塗工膜形成用組成物及び基板の製造方法の提供を目的とする。本発明は、コバルト－炭素結合を有さないコバルト含有化合物と、溶媒とを含有する塗工膜形成用組成物である。