蒽-9-基甲基二乙基氨基甲酸酯 | 1228312-05-7

• 分子结构分类: 有机化合物 - 苯类化合物 - 蒽
• 中文名称: 蒽-9-基甲基二乙基氨基甲酸酯
• 英文名称: 9-anthrylmethyl N,N-diethylcarbamate
• 英文别名: Carbamic acid, N,N-diethyl-, 9-anthracenylmethyl ester；anthracen-9-ylmethyl N,N-diethylcarbamate
• CAS: 1228312-05-7
• 化学式: C₂₀H₂₁NO₂
• 分子量: 307.392
• InChiKey: ZWDNVDDEDBXBMD-UHFFFAOYSA-N

物化性质

• 沸点：
  477.4±15.0 °C(Predicted)
• 密度：
  1.150±0.06 g/cm3(Predicted)

计算性质

• 辛醇/水分配系数(LogP)：
  4.9
• 重原子数：
  23
• 可旋转键数：
  5
• 环数：
  3.0
• sp3杂化的碳原子比例：
  0.25
• 拓扑面积：
  29.5
• 氢给体数：
  0
• 氢受体数：
  2

反应信息

• 作为反应物：
  描述：

  蒽-9-基甲基二乙基氨基甲酸酯 以 乙腈 为溶剂， 反应 0.17h， 生成 二乙胺
  参考文献：
  名称：

  PHOTOBASE GENERATOR

  摘要：

  本发明旨在提供当受长波长光（活性能量射线）照射时易于产生碱的新化合物，包含这些化合物的光碱发生器以及光碱生成方法，本发明涉及由通式[1]表示的化合物，包含这些化合物的光碱发生器以及光碱生成方法：（其中，Ar代表从蒽基团、蒽醌基团和芘基团中选择的具有特定结构的任何基团；R1和R2各自独立地代表氢原子或具有1至10个碳原子的直链、支链或环烷基基团，或表示能够与它们结合的氮原子形成含氮原子的脂环烷基环或含氮原子的芳香环，这些环具有3至8个碳原子，可能有取代基；R3和R4各自独立地代表氢原子，具有1至10个碳原子的直链、支链或非环烷基基团）。

  公开号：

  US20110233048A1
• 作为产物：
  描述：

  9-蒽醇 、 N,N-二乙基氯甲酰胺 在 sodium hydride 作用下， 以 四氢呋喃 为溶剂， 反应 2.0h， 以61%的产率得到蒽-9-基甲基二乙基氨基甲酸酯
  参考文献：
  名称：

  PHOTOBASE GENERATOR

  摘要：

  本发明旨在提供当受长波长光（活性能量射线）照射时易于产生碱的新化合物，包含这些化合物的光碱发生器以及光碱生成方法，本发明涉及由通式[1]表示的化合物，包含这些化合物的光碱发生器以及光碱生成方法：（其中，Ar代表从蒽基团、蒽醌基团和芘基团中选择的具有特定结构的任何基团；R1和R2各自独立地代表氢原子或具有1至10个碳原子的直链、支链或环烷基基团，或表示能够与它们结合的氮原子形成含氮原子的脂环烷基环或含氮原子的芳香环，这些环具有3至8个碳原子，可能有取代基；R3和R4各自独立地代表氢原子，具有1至10个碳原子的直链、支链或非环烷基基团）。

  公开号：

  US20110233048A1

文献信息

• BORATE-BASED BASE GENERATOR, AND BASE-REACTIVE COMPOSITION COMPRISING SUCH BASE GENERATOR
  申请人：WAKO PURE CHEMICAL INDUSTRIES, LTD.

  公开号：US20160340374A1

  公开（公告）日：2016-11-24

  An object of the present invention is to provide a compound which is capable of attaining a composition having high storage stability without reacting with a base-reactive compound, even in the case of storage for a long period of time in a mixed state with the base-reactive compound, such as an epoxy-based compound, as well as capable of generating a strong base (guanidines, biguanides, phosphazenes or phosphoniums) by irradiation of light (active energy rays) or heating; a base generator comprising the compound; and a base-reactive composition comprising the base generator and the base-reactive compound. The present invention relates to the compound represented by the general formula (A); the base generator comprising the compound; and the base-reactive composition comprising the base generator and the base-reactive compound. (wherein R 1 represents an alkyl group; an arylalkynyl group which may be substituted with a halogen atom, an alkyl group, an alkoxy group, or an alkylthio group; an alkenyl group; a 2-furylethynyl group; a 2-thiophenylethynyl group; or a 2,6-dithianyl group; R 2 to R 4 each independently represent an alkyl group; an arylalkynyl group which may be substituted with a halogen atom, an alkyl group, an alkoxy group, or an alkylthio group; the aryl group which may be substituted with a halogen atom, an alkyl group, an alkoxy group, or an alkylthio group; a furanyl group; a thienyl group; or an N-alkyl-substituted pyrrolyl group; Z + represents an ammonium cation having a guanidinium group, a biguanidium group or a phosphazenium group, or a phosphonium cation.)

  本发明的目的是提供一种化合物，能够在与碱反应性化合物混合状态长时间存储的情况下，仍能获得具有高储存稳定性的组合物，而不与碱反应性化合物发生反应，同时还能通过光照（活性能量射线）或加热产生强碱（胍胺、双胍胺、磷氮烷或磷銨）；包括该化合物的碱发生器；以及包括该碱发生器和碱反应性化合物的碱反应性组合物。本发明涉及由通式（A）表示的化合物；包括该化合物的碱发生器；以及包括该碱发生器和碱反应性化合物的碱反应性组合物。（其中R1代表烷基；可能被卤素原子、烷基、烷氧基或烷硫基取代的芳基炔基；烯基；2-呋喃基炔基；2-噻吩基炔基；或2,6-二硫基基；R2到R4各自独立地代表烷基；可能被卤素原子、烷基、烷氧基或烷硫基取代的芳基炔基；可能被卤素原子、烷基、烷氧基或烷硫基取代的芳基；呋喃基；噻吩基；或N-烷基取代的吡咯基；Z+代表具有胍胺基团、双胍胺基团或磷氮烷基团的铵阳离子，或磷銨阳离子。）
• ACID-RESISTANT BASE AND/OR RADICAL GENERATOR, AND CURABLE RESIN COMPOSITION CONTAINING SAID BASE AND/OR RADICAL GENERATOR
  申请人：WAKO PURE CHEMICAL INDUSTRIES, LTD.

  公开号：US20190002403A1

  公开（公告）日：2019-01-03

  The present invention relates to a compound represented by the general formula (A), a base- and/or radical-generating agent comprising the compound, and so on. In the formula, four pieces of R 1 each independently represents a hydrogen atom or a fluorine atom; four pieces of R 2 each independently represent a fluorine atom or a trifluoromethyl group; R 3 , R 6 , R 7 and R 10 each independently represent a hydrogen atom or an alkyl group having 1 to 12 carbon atoms; R 4 and R 5 each independently represent a hydrogen atom or an alkyl group having 1 to 12 carbon atoms, or R 4 and R 5 are bonded to each other to represent an alkylene group having 2 to 4 carbon atoms; and R 8 and R 9 each independently represent a hydrogen atom, an alkyl group having 1 to 12 carbon atoms, or an aryl group having 6 to 14 carbon atoms and optionally having a substituent selected from the group consisting of an alkyl group having 1 to 6 carbon atoms, an alkoxy group having 1 to 6 carbon atoms, an alkylthio group having 1 to 6 carbon atoms, a dialkylamino group having 2 to 12 carbon atoms, a halogen atom, and a nitro group, or R 8 and R 9 are bonded to each other to represent an alkylene group having 2 to 4 carbon atoms; provided that two or three of the eight groups R 3 to R 10 are each a hydrogen atom, and, in a case where two of the eight groups are each a hydrogen atom, then three to six of the remaining groups are each an alkyl group having 1 to 12 carbon atoms, and, in a case where three of the eight groups are each a hydrogen atom, then four or five of the remaining groups are each an alkyl group having 1 to 12 carbon atoms.

  本发明涉及一种由通式（A）表示的化合物，包括该化合物的生成碱基和/或基团产生剂等。在该式中，四个R1分别独立表示氢原子或氟原子；四个R2分别独立表示氟原子或三氟甲基基团；R3、R6、R7和R10分别独立表示氢原子或具有1至12个碳原子的烷基基团；R4和R5分别独立表示氢原子或具有1至12个碳原子的烷基基团，或者R4和R5相互连接表示具有2至4个碳原子的亚烷基基团；R8和R9分别独立表示氢原子、具有1至12个碳原子的烷基基团或具有6至14个碳原子且可选地具有选自包括具有1至6个碳原子的烷基基团、具有1至6个碳原子的烷氧基团、具有1至6个碳原子的烷硫基团、具有2至12个碳原子的二烷基氨基团、卤素原子和硝基基团的取代基的芳基团，或者R8和R9相互连接表示具有2至4个碳原子的亚烷基基团；前提是八个基团R3至R10中的两个或三个分别是氢原子，并且在其中两个基团分别是氢原子的情况下，其余基团中的三到六个分别是具有1至12个碳原子的烷基基团，而在其中三个基团分别是氢原子的情况下，其余基团中的四个或五个分别是具有1至12个碳原子的烷基基团。
• NEGATIVE TYPE PHOTOSENSITIVE SILOXANE COMPOSITION AND METHODS FOR PRODUCING CURED FILM AND ELECTRONIC DEVICE USING THE SAME
  申请人：Merck Patent GmbH

  公开号：US20200333708A1

  公开（公告）日：2020-10-22

  [Object] To provide a negative type photosensitive siloxane composition capable of forming a cured film excellent in heat resistance and critical thickness for cracking [Means] The present invention provides a negative type photosensitive siloxane composition comprising : a polysiloxane containing silanol in a specific content, a particular photo base generator, and a solvent. The content of silanol is measured by FT-IR.

  【目标】提供一种负型光敏硅氧烷组合物，能形成热稳定性和临界厚度优异的固化膜。 【方法】本发明提供一种负型光敏硅氧烷组合物，包括：含有特定硅醇含量的聚硅氧烷、特定的光碱发生剂和溶剂。硅醇的含量由FT-IR测量。
• Photobase generator
  申请人：Kuramoto Ayako

  公开号：US08957212B2

  公开（公告）日：2015-02-17

  There is intended to provide the novel compounds which generate a base easily when irradiated with long wavelength light (active energy rays), a photobase generator containing the compounds and a photobase generation method, and the present invention relates to the compounds represented by the general formula [1], a photobase generator containing the compounds and a photobase generation method: (wherein, Ar represents any of groups with specific structures selected from the group consisting of an anthracenyl group, an anthraquinonyl group and a pyrenyl group; R1 and R2 each independently represent a hydrogen atom or a linear, branched or cyclic alkyl group having 1 to 10 carbon atoms, or represent ones which can form an alicyclic ring containing nitrogen atom(s) or an aromatic ring containing nitrogen atom(s) together with a nitrogen atom to which they are bound, which the rings having 3 to 8 carbon atoms which may have a substituent, R3 and R4 each independently represent a hydrogen atom, a linear, branched or acyclic alkyl group having 1 to 10 carbon atoms).

  本发明旨在提供一种新的化合物，当用长波长光（活性能量射线）照射时，可以轻易地产生碱基，以及包含这些化合物的光碱发生剂和光碱发生方法。本发明涉及由一般式[1]表示的化合物、包含这些化合物的光碱发生剂和光碱发生方法：（其中，Ar代表从含有特定结构的群组中选择的任何群组，所述群组包括蒽基群、蒽醌基群和芘基群；R1和R2各自独立地表示氢原子或具有1至10个碳原子的线性、支链或环状烷基基团，或者表示可以与它们结合的氮原子一起形成含有3至8个碳原子的脂环状环或含有氮原子的芳环，这些环可以具有取代基；R3和R4各自独立地表示氢原子、具有1至10个碳原子的线性、支链或非环状烷基基团）。
• COMPOSITION FOR WATER-REPELLENT TREATMENT OF SURFACE, AND METHOD FOR WATER-REPELLENT TREATMENT OF SURFACE OF SEMICONDUCTOR SUBSTRATE USING SAME
  申请人：Wako Pure Chemical Industries, Ltd.

  公开号：EP2615633A1

  公开（公告）日：2013-07-17

  The purpose of the present invention to provide: a composition which can be used for water-repellent treating of the entire surface of a semiconductor substrate having a pattern formed by laminating a Si-containing insulating layer and a metal layer, at one time; and a method for water-repellent treatment of the semiconductor substrate surface using the composition. The present invention relates to: (1) a composition for water-repellent treatment of a semiconductor substrate surface comprising a) at least one kind of a compound selected from the group consisting of a long-chain alkyl tertiary amine and a long-chain alkyl ammonium salt, b) a base or an acid generating agent, having a condensed ring structure or forming a condensed ring structure by generating a base or an acid and c) a polar organic solvent, and (2) a method for water-repellent treatment of the semiconductor substrate surface having the pattern formed by laminating the Si-containing insulating layer and the metal layer, using the composition.

  本发明的目的是：提供一种组合物，该组合物可用于一次性对具有通过层叠含硅绝缘层和金属层而形成的图案的半导体衬底的整个表面进行憎水处理；以及一种使用该组合物对半导体衬底表面进行憎水处理的方法。 本发明涉及(1) 一种用于对半导体衬底表面进行憎水处理的组合物，该组合物包含 a) 至少一种选自由长链烷基叔胺和长链烷基铵盐组成的组的化合物；b) 碱或酸生成剂、(2) 使用该组合物对具有通过层压含硅绝缘层和金属层而形成的图案的半导体衬底表面进行憎水处理的方法。