2-Cyanopropan-2-yl 1H-pyrazole-1-carbodithioate | 820227-19-8

• 分子结构分类: 有机化合物 - 有机杂环化合物 - 唑类
• 英文名称: 2-Cyanopropan-2-yl 1H-pyrazole-1-carbodithioate
• 英文别名: 2-cyanopropan-2-yl pyrazole-1-carbodithioate
• CAS: 820227-19-8
• 化学式: C₈H₉N₃S₂
• 分子量: 211.3
• InChiKey: YMBNINNBXSLJGA-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  2
• 重原子数：
  13
• 可旋转键数：
  2
• 环数：
  1.0
• sp3杂化的碳原子比例：
  0.38
• 拓扑面积：
  99
• 氢给体数：
  0
• 氢受体数：
  4

文献信息

• [EN] ALL PURPOSE RAFT AGENT<br/>[FR] AGENT RAFT POLYVALENT
  申请人：COMMW SCIENT IND RES ORG

  公开号：WO2016054689A1

  公开（公告）日：2016-04-14

  The present invention relates to a RAFT agent of formula (I) where R1, R2 and R3 are each independently selected from H and optionally substituted alkyl.

  本发明涉及一种公式（I）的RAFT试剂，其中R1、R2和R3分别独立地选择自H和可选取代烷基。
• RESIST POLYMER, RESIST COMPOSITION, PROCESS FOR PATTERN FORMATION, AND STARTING COMPOUNDS FOR PRODUCTION OF THE RESIST POLYMER
  申请人：Momose Hikaru

  公开号：US20090198065A1

  公开（公告）日：2009-08-06

  To provide a resist polymer comprising, as a structural unit, an acid-decomposable unit having a structure represented by formula (1) or (2) which exhibits a small line edge roughness and produces little defects in DUV excimer laser lithography or the like. In formulas (1) and (2), n represents an integer of 2 to 24; J represents a single bond or a divalent hydrocarbon group which may have a substituent/heteroatom when n=2, or represents an n-valent hydrocarbon group which may have a substituent/heteroatom when n≧3; E represents a residue of a polymerization terminator, a chain transfer agent or a polymerization initiator; K 1 and K 2 each represent at least one selected from alkylene, cycloalkylene, oxyalkylene, arylene, a divalent thiazoline ring, a divalent oxazoline ring and a divalent imidazoline ring; L 1 and L 2 each represent at least one selected from —C(O)O—, —C(O)— and —OC(O)—; M 1 , M 2 and M 3 each represent at least one selected from alkylene, cycloalkylene, oxyalkylene and arylene; Y, Y 1 and Y 2 each represent an acid-decomposable linkage; k1, k2, l1, l2, m1, m2, and m3 each represent 0 or 1; and R 1 represents H or a methyl group.

  提供一种抗蚀聚合物，其由一个具有结构式（1）或（2）所表示的酸分解单元作为结构单元，能够在DUV准分子激光微影或类似工艺中表现出小的线边粗糙度并产生少量缺陷。在式（1）和（2）中，n表示2至24的整数；J表示单键或二价碳氢基团，当n=2时可以具有取代基/杂原子，或者当n≥3时可以表示n价碳氢基团，可以具有取代基/杂原子；E表示聚合终止剂、链转移剂或聚合引发剂的残基；K1和K2分别表示至少选择自烷基、环烷基、氧烷基、芳烃、二价噻唑环、二价噁唑环和二价咪唑环中的至少一种；L1和L2分别表示至少选择自—C（O）O—、—C（O）—和—OC（O）—中的至少一种；M1、M2和M3分别表示至少选择自烷基、环烷基、氧烷基和芳烃中的至少一种；Y、Y1和Y2分别表示酸分解键；k1、k2、l1、L2、m1、m2和m3分别表示0或1；R1表示H或甲基基团。
• RESIST COMPOSITION AND PATTERN-FORMING METHOD USING SAME
  申请人：Kamimura Sou

  公开号：US20080241737A1

  公开（公告）日：2008-10-02

  A resist composition comprises (A) at least two kinds of resins each of which decomposes by the action of an acid to undergo an increase in its solubility for an alkali developer, wherein at least one kind of the resins (A) is a resin synthesized by living radical polymerization using a chain transfer agent represented by formula (I): wherein: A represents an organic group not containing hetero atoms; and Y represents an organic group capable of releasing a radical.

  一种抗蚀性组合物包括（A）至少两种树脂，每种树脂通过酸的作用分解，以增加其对碱性显影剂的溶解度，其中至少一种树脂（A）是通过使用由式（I）表示的链转移剂合成的活性自由基聚合树脂：其中：A代表不含杂原子的有机基团；Y代表能够释放自由基的有机基团。
• PHOTORESIST POLYMER COMPOSITIONS
  申请人：JSR Corporation

  公开号：EP1641848B1

  公开（公告）日：2007-08-22
• ALL PURPOSE RAFT AGENT
  申请人：Commonwealth Scientific and Industrial Research Organisation

  公开号：EP3204353A1

  公开（公告）日：2017-08-16