申请人:Hoechst Celanese Corporation
公开号:US05200529A1
公开(公告)日:1993-04-06
A new monomer is used to prepare homo or copolymers containing blocked imide groups which are characterized by deblocking in two stages, first when acid catalyzed and thereafter in aqueous alkaline solutions. Such polymers are, therefore, especially useful in formulating positive photoresist compositions. The polymers are combined with a latent photoacid, which when exposed to actinic radiation removes the acid sensitive blocking moiety, preferably an acetal or ketal group, leaving a methylol group or substituted methylol group remaining attached to the nitrogen atom, which groups are subsequently removed by exposure to aqueous alkaline developing solutions, leaving only imide groups. ##STR1## The new monomer is a derivative of maleimide in which the imide hydrogen has been replaced with a methylol group, which is subsequently reacted to form an acetal or ketal. Preferred monomers include N-(2,4-dioxa-3,3-dimethylpentyl)-2H,5H-2,5-dioxopyrrole and related compounds.
一种新单体被用于制备含有阻塞酰亚胺基团的同聚物或共聚物,其特点是在酸催化和水性碱性溶液中分两步解除阻塞。因此,这些聚合物在制备正向光刻胶组合物方面特别有用。这些聚合物与潜在的光酸一起使用,当暴露于光线下时,会去除酸敏感的阻塞基团,优选为缩醛或缩酮基团,留下一个甲醇基团或取代甲醇基团仍附着在氮原子上,这些基团随后通过暴露于水性碱性显影溶液来除去,只留下酰亚胺基团。新单体是马来酰亚胺的衍生物,其中酰亚胺氢被甲醇基团替换,随后反应形成缩醛或缩酮。优选单体包括N-(2,4-二氧-3,3-二甲基戊基)-2H,5H-2,5-二氧吡咯和相关化合物。