申请人:——
公开号:US20030165623A1
公开(公告)日:2003-09-04
The present invention relates to novel copper formate complexes and the deposition of metallic copper on substrates or in or on porous solids using these novel copper complexes.
本发明涉及新型的甲酸铜配合物以及使用这些新型铜配合物在基底上或多孔固体中沉积金属铜的方法。