The present invention relates to novel copper formate complexes and the deposition of metallic copper on substrates or in or on porous solids using these novel copper complexes.
[EN] COPPER DEPOSITION USING COPPER FORMATE COMPLEXES<br/>[FR] DEPOT DE CUIVRE A PARTIR DE COMPLEXES DE FORMATE DE CUIVRE
申请人:DU PONT
公开号:WO2003053895A2
公开(公告)日:2003-07-03
The present invention relates to novel copper formate complexes and the deposition of metallic copper on substrates or in or on porous solids using these novel copper complexes.