α-(p-toluenesulfonyloxyimino)-2-thiopheneacetonitrile

• 分子结构分类: 有机化合物 - 苯类化合物 - 苯和取代衍生物
• 英文名称: α-(p-toluenesulfonyloxyimino)-2-thiopheneacetonitrile
• 英文别名: [(E)-[cyano(thiophen-2-yl)methylidene]amino] 4-methylbenzenesulfonate
• 化学式: C₁₃H₁₀N₂O₃S₂
• 分子量: 306.366
• InChiKey: KDBMVKXNOHAMIG-NTCAYCPXSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  3.6
• 重原子数：
  20
• 可旋转键数：
  4
• 环数：
  2.0
• sp3杂化的碳原子比例：
  0.08
• 拓扑面积：
  116
• 氢给体数：
  0
• 氢受体数：
  6

反应信息

• 作为反应物：
  描述：

  α-(p-toluenesulfonyloxyimino)-2-thiopheneacetonitrile 生成 3-(thien-2-yl)-4-amino-5-isothiazolecarboxylic acid
  参考文献：
  名称：

  BECK, J. R.;GAJEWSKI, R. P.;HACKLER, R. E.

  摘要：

  DOI：
• 作为产物：
  描述：

  2-噻吩乙腈 、 对甲苯磺酰氯 、 亚硝酸异戊酯 在 sodium methylate 作用下， 以 乙醚 、 乙醇 、 水 、 乙酸乙酯 、 苯 为溶剂， 生成 α-(p-toluenesulfonyloxyimino)-2-thiopheneacetonitrile
  参考文献：
  名称：

  3-Aryl-5-isothiazolecarboxylic acids and related compounds used to lower

  摘要：

  3-苯基（或间位或对位取代苯基）-4-可替代基-5-异噻唑羧酸盐、酯和简单酰胺，用于降低哺乳动物体内尿酸水平。

  公开号：

  US04346094A1

文献信息

• [EN] LATENT ACIDS AND THEIR USE<br/>[FR] ACIDES LATENTS ET LEUR UTILISATION
  申请人：BASF SE

  公开号：WO2016124493A1

  公开（公告）日：2016-08-11

  Compounds of the formula (I) and (IA) wherein X is -O(CO)-; R1 is C1-C12haloalkyl or C6-C10haloaryl; R2 is located in position 7 of the coumarinyl ring and is OR8; R2a, R2b and R2C independently of each other are hydrogen; R3 is C1-C8haloalkyl or C1-C8haloalkyl; R4 is hydrogen; and R8 is C1-C6alkyI; are suitable as photosensitive acid donors in the preparation of photoresist compositions such as used for example in the preparation of spacers, insulating layers, interlayer dielectric films, insulation layers, planarization layers, protecting layers, overcoat layers, banks for electroluminescence displays and liquid crystal displays (LCD).

  化合物的化学式（I）和（IA），其中X为-O(CO)-；R1为C1-C12卤代烷基或C6-C10卤代芳基；R2位于香豆素环的第7位，为OR8；R2a、R2b和R2C彼此独立地为氢；R3为C1-C8卤代烷基或C1-C8卤代烷基；R4为氢；R8为C1-C6烷基，适用于作为感光酸给体，用于制备光刻胶组合物，例如用于制备间隔层、绝缘层、层间介质膜、绝缘层、平坦化层、保护层、覆盖层、电致发光显示器和液晶显示器（LCD）的制备。
• [EN] SULFONIUM DERIVATIVES AND THE USE THEROF AS LATENT ACIDS<br/>[FR] DÉRIVÉS DE SULFONIUM ET LEUR UTILISATION EN TANT QU'ACIDES LATENTS
  申请人：BASF SE

  公开号：WO2010046240A1

  公开（公告）日：2010-04-29

  Compounds of the formula (I), wherein Ar1 is for example phenylene or biphenylene both unsubstituted or substituted; Ar2 and Ar3 are for example independently of each other phenyl, naphthyl, biphenylylyl or heteroaryl, all optionally substituted; or Ar1 and Ar2 for example together with a direct bond, O, S or (CO), form a fused ring system; R is for example hydrogen, C3-C30cycloalkyl or C1-C18alkyl; and R1, R2 and R3 independently of each other are for example C1-C10haloalkyl; are effective photoacid generators (PAG).

  化合物的公式（I），其中Ar1例如是未取代或取代的苯基或联苯基; Ar2和Ar3例如是独立的苯基，萘基，联苯基或杂环基，均可选取代; 或者例如Ar1和Ar2与直接键，O，S或（CO）一起形成融合的环系统; R例如是氢，C3-C30环烷基或C1-C18烷基; R1，R2和R3独立地例如是C1-C10卤代烷基; 是有效的光酸发生剂（PAG）。
• [EN] SULPHONIUM SALT INITIATORS<br/>[FR] INITIATEURS À BASE DE SELS DE SULFONIUM
  申请人：CIBA HOLDING INC

  公开号：WO2009047151A1

  公开（公告）日：2009-04-16

  Compounds of the formula (I), wherein X is a single bond, CRaRb O, S, NRC, NCORC, CO, SO or SO2; L, L1, L2, L3, L4, L5, L6, L7 and L8 are for example hydrogen, R1 or COT; T denotes T1 or O-T2; T1 and T2 for example are hydrogen, C1-C20alkyl, C3-C12cycloalkyl, C2-C20alkenyl, C5- C12cycloalkenyl, C6-C14aryl, C3-C12heteroaryl, C1-C20alkyl substituted by one or more D, C2- C20alkyl interrupted by one or more E, C2-C20alkyl substituted by one or more D and inter- rupted by one or more E or Q; R1, R2, R3, R4, Ra, Rb and Rc are T1; D is for example R5, OR5, SR5 or Q1; E is for example O, S, COO or Q2; R5 and R6 for example are hydrogen, C1- C12alkyl or phenyl; Q is for example C6-C12bicycloalkyl, C6-C12bicycloalkenyl or C6- C12tricycloalkyl; Q1 is for example, C6-C14aryl or C3-C12heteroaryl; Q2 is for example C6- C14arylene or C3-C12heteroarylene; Y is an anion; and M is a cation; provided that at least one of L, L1, L2, L3, L4, L5, L6, L7 and L8 is other than hydrogen; and provided that (i) at least one of T1 or T2 is a group Q; or (ii) at least one D is a group Q1; or (iii) at least one E is a group Q2; are suitable as photolatent catalysts.

  化合物的式子（I），其中X是单键，CRaRb O，S，NRC，NCORC，CO，SO或SO2; L，L1，L2，L3，L4，L5，L6，L7和L8例如是氢，R1或COT; T表示T1或O-T2; T1和T2例如是氢，C1-C20烷基，C3-C12环烷基，C2-C20烯基，C5-C12环烯基，C6-C14芳基，C3-C12杂芳基，被一个或多个D取代的C1-C20烷基，被一个或多个E中断的C2-C20烷基，被一个或多个D取代并被一个或多个E或Q中断的C2-C20烷基; R1，R2，R3，R4，Ra，Rb和Rc是T1; D例如是R5，OR5，SR5或Q1; E例如是O，S，COO或Q2; R5和R6例如是氢，C1-C12烷基或苯基; Q例如是C6-C12双环烷基，C6-C12双环烯基或C6-C12三环烷基; Q1例如是C6-C14芳基或C3-C12杂芳基; Q2例如是C6-C14芳撑基或C3-C12杂芳撑基; Y是阴离子; M是阳离子; 前提是L，L1，L2，L3，L4，L5，L6，L7和L8中至少有一个不是氢; 并且前提是（i）至少有一个T1或T2是Q组; 或（ii）至少有一个D是Q1组; 或（iii）至少有一个E是Q2组; 适用于光潜催化剂。
• Oxime sulfonates and the use thereof as latent acids
  申请人：Yamato Hitoshi

  公开号：US20100167178A1

  公开（公告）日：2010-07-01

  Compounds of the formula (I), (II) or (III), wherein R 1 is for example C 1 -C 18 alkylsulfonyl, C 1 -C 10 haloalkylsulfonyl, camphorylsulfonyl, phenyl-C 1 -C 3 alkylsulfonyl, phenylsulfonyl, naphthylsulfonyl, anthrylsulfonyl, phenanthrylsulfonyl or heteroarylsulfonyl, R′ 1 is for example phenylenedisulfonyl, R 2 is for example CN, C 1 -C 10 haloalkyl or C 1 -C 10 haloalkyl which is substituted by (IV); Ar 1 is for example phenyl optionally substituted by a group of formula (IV); Ar′ 1 is for example phenylene which optionally is substituted by a group of formula (IV); A 1 , A 2 and A 3 independently of each other are for example hydrogen, halogen, CN, or C 1 -C 18 alkyl; D 2 is for example a direct bond, O, (CO)O, (CO)S, SO 2 , OSO 2 or C 1 -C 18 alkylene; or A 3 and D 2 together form C 3 -C 30 cycloalkenyl; or A 2 and D 2 together with the carbon of the ethylenically unsaturated double bond to which they are attached form C 3 -C 30 cycloalkyl; D 3 and D 4 for example independently of each other are a direct bond, O, S, C 1 -C 18 alkylene or C 3 -C 30 cycloalkylene provided that at least one of the radicals R 2 , Ar 1 or Ar′ 1 comprises a group of the formula (IV); are suitable as photolatent acid donors and for the preparation of corresponding polymers to be employed in chemically amplified photoresists.

  化合物的公式为（I），（II）或（III），其中R1例如为C1-C18烷基磺酰基，C1-C10卤代烷基磺酰基，樟脑磺酰基，苯基-C1-C3烷基磺酰基，苯基磺酰基，萘基磺酰基，蒽基磺酰基，菲磺酰基或杂环芳基磺酰基，R'1例如为苯基二磺酰基，R2例如为CN，C1-C10卤代烷基或被（IV）取代的C1-C10卤代烷基；Ar1例如为苯基，可选地被公式（IV）的基团取代；Ar'1例如为苯基，可选地被公式（IV）的基团取代；A1，A2和A3独立地例如为氢，卤素，CN或C1-C18烷基；D2例如为直接键，O，（CO）O，（CO）S，SO2，OSO2或C1-C18烷基；或A3和D2一起形成C3-C30环烯基；或A2和D2与它们所附着的乙烯基双键的碳一起形成C3-C30环烷基；D3和D4例如独立地为直接键，O，S，C1-C18烷基或C3-C30环烷基，至少其中之一的基团R2，Ar1或Ar'1包含公式（IV）的基团，适用作光激发酸给体，并用于制备相应的聚合物，以用于化学增强型光刻胶。
• [EN] SULPHONIUM SALT INITIATORS<br/>[FR] INITIATEURS DE SEL DE SULFONIUM
  申请人：CIBA HOLDING INC

  公开号：WO2009047105A1

  公开（公告）日：2009-04-16

  Compounds of the Formula (I), wherein L1, L'1, L'1, L2, L'2, L'2, L3, L'3, L'3, L4, L'4 and L'4 for example are hydrogen or COT; R, R' and R' for example are hydrogen,C6-C12aryl or C3-C20heteroaryl; X, X' and X' for exampleare O, S, single bond, NRa or NCORa, T is for example hydrogen, C1-C20alkyl, C3-C12cycloalkyl, C2- C20alkenyl, C5-C12cycloalkenyl, C7-C18cycloalkylenaryl, C5-C18cycloalkylenheteroaryl, C6- C14aryl, providedthat at least one of R, R' or R' is unsubstitutedor substituted C3- C20heteroaryl; and Y is an inorganic or organic anion; are suitable as photolatent acid generators.

  式(I)的化合物，其中L1，L'1，L'1，L2，L'2，L'2，L3，L'3，L'3，L4，L'4和L'4例如是氢或COT；R，R'和R'例如是氢，C6-C12芳基或C3-C20杂环芳基；X，X'和X'例如是O，S，单键，NRa或NCORa，T例如是氢，C1-C20烷基，C3-C12环烷基，C2-C20烯基，C5-C12环烯基，C7-C18环烷基芳基，C5-C18环烷基杂环芳基，C6-C14芳基，前提是至少有一个R，R'或R'是未取代或取代的C3-C20杂环芳基；而Y是无机或有机阴离子；适用于光酸发生剂。