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乙烯-1,1,2,2-四羧酸 | 4363-44-4

中文名称
乙烯-1,1,2,2-四羧酸
中文别名
——
英文名称
2,3-Dicarboxy-but-2-enedioic acid
英文别名
ethenetetracarboxylic acid;Aethentetracarbonsaeure;Aethylen-tetracarbonsaeure;Ethylentetracarbonsaeure;Ethylenetetracarboxylic acid;ethene-1,1,2,2-tetracarboxylic acid
乙烯-1,1,2,2-四羧酸化学式
CAS
4363-44-4
化学式
C6H4O8
mdl
——
分子量
204.093
InChiKey
AIJZIRPGCQPZSL-UHFFFAOYSA-N
BEILSTEIN
——
EINECS
——
  • 物化性质
  • 计算性质
  • ADMET
  • 安全信息
  • SDS
  • 制备方法与用途
  • 上下游信息
  • 反应信息
  • 文献信息
  • 表征谱图
  • 同类化合物
  • 相关功能分类
  • 相关结构分类

物化性质

  • 熔点:
    155-165 °C (decomp)
  • 沸点:
    528.0±50.0 °C(Predicted)
  • 密度:
    2.055±0.06 g/cm3(Predicted)

计算性质

  • 辛醇/水分配系数(LogP):
    1.2
  • 重原子数:
    14
  • 可旋转键数:
    4
  • 环数:
    0.0
  • sp3杂化的碳原子比例:
    0.0
  • 拓扑面积:
    149
  • 氢给体数:
    4
  • 氢受体数:
    8

SDS

SDS:c6618237e91fd6c514b4d3ecb48ba76c
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上下游信息

  • 上游原料
    中文名称 英文名称 CAS号 化学式 分子量
  • 下游产品
    中文名称 英文名称 CAS号 化学式 分子量

反应信息

点击查看最新优质反应信息

文献信息

  • COMPOSITION CONTAINING VINYL-GROUP-CONTAINING COMPOUND
    申请人:TOKYO OHKA KOGYO CO., LTD.
    公开号:US20160046552A1
    公开(公告)日:2016-02-18
    A composition containing a novel vinyl-group-containing compound. This composition contains a vinyl-group-containing compound represented by general formula (1). In the formula: W 1 and W 2 represent a group represented by general formula (2) (where a ring (Z) is an aromatic hydrocarbon ring, X is a single bond or —S—, R 1 is a single bond or a C1-4 alkylene group, R 2 is a specific substituent group such as a monovalent hydrocarbon, and m is an integer equal to 0 or higher), a group represented by general formula (4) (where the ring (Z), X, R 1 , R 2 , and m are as previously stated), a hydroxyl group, or a (meth)acryloyloxy group; rings (Y 1 , Y 2 ) are aromatic hydrocarbon rings; R represents a single bond or a specific divalent group; R 3a and R 3b represent a cyano group, a halogen atom, or a monovalent hydrocarbon group; and n1 and n2 are integers of 0-4.
    这个组合物包含一种含有新颖乙烯基团的化合物。该组合物包含一个由通式(1)表示的含有乙烯基团的化合物。在该式中:W1和W2代表由通式(2)表示的一个基团(其中环(Z)是芳香烃环,X是一个单键或—S—,R1是一个单键或C1-4烷基基团,R2是特定的取代基团,如一价碳氢化合物,m是大于或等于0的整数),一个由通式(4)表示的基团(其中环(Z)、X、R1、R2和m如前述),一个羟基,或一个(甲基)丙烯酰氧基团;环(Y1、Y2)是芳香烃环;R代表一个单键或一个特定的二价基团;R3a和R3b代表基、卤素原子或一价碳氢基团;n1和n2是0-4的整数。
  • Process for producing solvent-soluble polyimide
    申请人:Mitsubishi Gas Chemical Company, Inc.
    公开号:US20040266979A1
    公开(公告)日:2004-12-30
    In the process of the present invention, a solvent-soluble polyimide is produced by polycondensing at least one tetracarboxylic acid component with at least one diamine component in a solvent in the presence of a tertiary amine. The tetracarboxylic acid component is selected from the group consisting of tetracarboxylic dianhydrides represented by the following formula 1: 1 wherein R is as defined in the specification, and tetracarboxylic acids and their derivatives represented by the following formula 2: 2 wherein R and Y 1 to Y 4 are as defined in the specification. Unlike the conventional techniques using an excessively large amount of a chemical imidation agent such as acetic anhydride and a chemical imidation catalyst such as triethylamine, in the process of the present invention, the solvent-soluble polyimide having a high polymerization degree is easily produced in a solvent with good productivity by using only a catalytic amount of the tertiary amine.
    在本发明的过程中,通过在溶剂中与三级胺共存下,将至少一种四羧酸组分与至少一种二胺组分进行聚合缩合反应,制备出可溶于溶剂的聚酰亚胺。所述四羧酸组分选自以下化学式1所表示的四羧酸二酐:1其中R如规范中定义,以及以下化学式2所表示的四羧酸及其衍生物:2其中R和Y1至Y4如规范中定义。与传统技术使用过量的化学亚酰胺剂(如乙酸酐)和化学亚酰胺催化剂(如三乙胺)不同,在本发明的过程中,仅使用催化量的三级胺,即可在溶剂中高效地制备出高聚合度的可溶于溶剂的聚酰亚胺
  • Metal-Clad White Laminate
    申请人:Oishi Jitsuo
    公开号:US20070292709A1
    公开(公告)日:2007-12-20
    The present invention provides a metal-clad white laminate including: a white resin layer which is composed of a resin composition obtained by mixing a polyimide having a repeating unit as represented by a particular chemical structural formula with a white pigment; and at least one metal layer, the white resin layer being an adhesive layer for the metal layer. The metal-clad white laminate of the present invention uses a white resin composition which has high reflectance and whiteness and excellent light resistance, and is easy to be reduced in thickness and weight.
    本发明提供了一种属包覆的白色层压板,包括:由将具有特定化学结构式所代表的重复单元的聚酰亚胺与白色颜料混合而得的树脂组合物组成的白色树脂层;以及至少一层属,其中白色树脂层为属层的粘合层。本发明的属包覆白色层压板采用了具有高反射率和白度以及优异的耐光性的白色树脂组合物,易于减少厚度和重量。
  • PROCESS AND APPARATUS FOR PRODUCTION OF COLORLESS TRANSPARENT RESIN FILM
    申请人:OISHI Jitsuo
    公开号:US20100187719A1
    公开(公告)日:2010-07-29
    A method for producing a colorless transparent resin film by a solution flow casting method containing: flow-casting an organic solvent solution of a polyamic acid or a polyimide on a support; and drying, the method containing at least the following step (1), step (2) and step (3) in this order, and an apparatus therefor: (1) a step of flow-casting an organic solvent solution of a polyamic acid or polyamide on a support, (2) a step of evaporating the organic solvent while blowing a gas having an oxygen content of from 0.001 to 15% by volume at a temperature of from 100 to 170° C. onto the flow-cast material, and releasing as a self-supporting film from the support, and (3) a step of performing the following step (3-1) and step (3-2) in this order: (3-1) a step of lowering a residual ratio of the organic solvent in the self-supporting film while blowing a gas having an oxygen content of 15% by volume or less at a temperature of from 100 to 250° C. onto the film by using at least one dryer of a type of blowing a heated gas, and (3-2) a step of lowering the residual ratio of the organic solvent in the self-supporting film while blowing a gas having an oxygen content of 5% by volume or less at a temperature of from 150 to 400° C. onto the film by using at least one dryer of a type of blowing a heated gas.
    一种通过溶液流铸法制备无色透明树脂薄膜的方法,包括:在支撑物上流铸聚酰胺酸或聚酰亚胺的有机溶剂溶液;并干燥,该方法至少包括以下步骤(1)、步骤(2)和步骤(3),并提供相应的设备:(1)在支撑物上流铸聚酰胺酸或聚酰亚胺的有机溶剂溶液;(2)在向流铸材料吹送氧含量为0.001至15%体积的气体的同时,蒸发有机溶剂,温度在100至170°C之间,从支撑物上释放为自支撑膜;(3)按照以下步骤(3-1)和步骤(3-2)的顺序执行:(3-1)在使用至少一种吹送加热气体的干燥器的情况下,以15%体积以下的氧含量的气体在100至250°C的温度下吹送,降低自支撑膜中有机溶剂的残留比率;(3-2)在使用至少一种吹送加热气体的干燥器的情况下,以5%体积以下的氧含量的气体在150至400°C的温度下吹送,降低自支撑膜中有机溶剂的残留比率。
  • THIN FILM TRANSISTOR SUBSTRATE
    申请人:FUKUDA Shunji
    公开号:US20130126860A1
    公开(公告)日:2013-05-23
    A main object of the present invention is to provide a TFT substrate having excellent switching characteristics. The object is attained by providing a thin film transistor substrate comprising: a substrate, and a thin film transistor having an oxide semiconductor layer that is formed on the substrate and is formed from an oxide semiconductor, and a semiconductor layer-adjoining insulating layer formed to be in contact with the oxide semiconductor layer, wherein at least one semiconductor layer-adjoining insulating layer included in the thin film transistor is a photosensitive polyimide insulating layer formed by using a photosensitive polyimide resin composition.
    本发明的主要目的是提供一种具有优异开关特性的TFT基板。该目标通过提供一种薄膜晶体管基板来实现,该基板包括:基板和薄膜晶体管,所述薄膜晶体管具有在基板上形成的氧化物半导体层,该氧化物半导体层由氧化物半导体形成,并且与氧化物半导体层接触的半导体层相邻的绝缘层,其中,在薄膜晶体管中包括的至少一个半导体层相邻的绝缘层是使用光敏聚酰亚胺树脂组合物形成的光敏聚酰亚胺绝缘层来实现的。
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同类化合物

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