2-trifluoromethyl acrylic acid 2-propyl ester

• 分子结构分类: 有机化合物 - 有机酸及其衍生物 - 羧酸及其衍生物
• 英文名称: 2-trifluoromethyl acrylic acid 2-propyl ester
• 英文别名: 2-(Trifluoromethyl)acrylic acid isopropyl ester；propan-2-yl 2-(trifluoromethyl)prop-2-enoate
• 化学式: C₇H₉F₃O₂
• 分子量: 182.142
• InChiKey: XPPLDNPZALIXHM-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  2.4
• 重原子数：
  12
• 可旋转键数：
  3
• 环数：
  0.0
• sp3杂化的碳原子比例：
  0.57
• 拓扑面积：
  26.3
• 氢给体数：
  0
• 氢受体数：
  5

反应信息

• 作为产物：
  描述：

  1,2-二溴-3,3,3-三氟丙烷 、 一氧化碳 、 异丙醇 在 bis-triphenylphosphine-palladium(II) chloride 三乙胺 作用下， 以 四氢呋喃 为溶剂， 120.0 ℃ 、1.0 MPa 条件下， 反应 5.0h， 以53.1%的产率得到2-trifluoromethyl acrylic acid 2-propyl ester
  参考文献：
  名称：

  EP1637514

  摘要：

  公开号：

文献信息

• BICYCLOHEXANE DERIVATIVE AND PRODUCTION METHOD FOR SAME
  申请人：Mitsubishi Gas Chemical Company, Inc.

  公开号：EP2524907A1

  公开（公告）日：2012-11-21

  A bicyclohexane derivative compound useful in the field of photoresist, the field of intermediate of drugs and pesticides, and the like, and a manufacturing method of the same are provided. A bicyclohexane derivative compound represented by the following general formula (II) is provided. (In formula (II), Y independently represents an alkyl group of 1 to 10 carbons, a halogen atom, an acyloxy group, an alkoxycarbonyl group or a hydroxyl group, X1 represents a halogen atom, m represents an integer of 0 to 11, and m' represents an integer of 0 to 10.)

  提供了一种在光刻胶领域、药物和杀虫剂的中间体领域等领域中有用的一种萜环己烷衍生物化合物，以及其制备方法。提供了由下述通用公式（II）表示的一种萜环己烷衍生物化合物。（在公式（II）中，Y独立表示1至10个碳原子的烷基、卤素原子、酰氧基、烷氧羰基或羟基，X1表示卤素原子，m表示0至11的整数，m'表示0至10的整数。）
• RESIST POLYMER, RESIST COMPOSITION, PROCESS FOR PATTERN FORMATION, AND STARTING COMPOUNDS FOR PRODUCTION OF THE RESIST POLYMER
  申请人：Momose Hikaru

  公开号：US20090198065A1

  公开（公告）日：2009-08-06

  To provide a resist polymer comprising, as a structural unit, an acid-decomposable unit having a structure represented by formula (1) or (2) which exhibits a small line edge roughness and produces little defects in DUV excimer laser lithography or the like. In formulas (1) and (2), n represents an integer of 2 to 24; J represents a single bond or a divalent hydrocarbon group which may have a substituent/heteroatom when n=2, or represents an n-valent hydrocarbon group which may have a substituent/heteroatom when n≧3; E represents a residue of a polymerization terminator, a chain transfer agent or a polymerization initiator; K 1 and K 2 each represent at least one selected from alkylene, cycloalkylene, oxyalkylene, arylene, a divalent thiazoline ring, a divalent oxazoline ring and a divalent imidazoline ring; L 1 and L 2 each represent at least one selected from —C(O)O—, —C(O)— and —OC(O)—; M 1 , M 2 and M 3 each represent at least one selected from alkylene, cycloalkylene, oxyalkylene and arylene; Y, Y 1 and Y 2 each represent an acid-decomposable linkage; k1, k2, l1, l2, m1, m2, and m3 each represent 0 or 1; and R 1 represents H or a methyl group.

  提供一种抗蚀聚合物，其由一个具有结构式（1）或（2）所表示的酸分解单元作为结构单元，能够在DUV准分子激光微影或类似工艺中表现出小的线边粗糙度并产生少量缺陷。在式（1）和（2）中，n表示2至24的整数；J表示单键或二价碳氢基团，当n=2时可以具有取代基/杂原子，或者当n≥3时可以表示n价碳氢基团，可以具有取代基/杂原子；E表示聚合终止剂、链转移剂或聚合引发剂的残基；K1和K2分别表示至少选择自烷基、环烷基、氧烷基、芳烃、二价噻唑环、二价噁唑环和二价咪唑环中的至少一种；L1和L2分别表示至少选择自—C（O）O—、—C（O）—和—OC（O）—中的至少一种；M1、M2和M3分别表示至少选择自烷基、环烷基、氧烷基和芳烃中的至少一种；Y、Y1和Y2分别表示酸分解键；k1、k2、l1、l2、m1、m2和m3分别表示0或1；R1表示H或甲基基团。
• Adamantane derivatives and resin compositions using the same as raw material
  申请人：Furukawa Kikuo

  公开号：US20050158662A1

  公开（公告）日：2005-07-21

  The adamantane derivatives of the present invention which are represented by the general formula (1): wherein X is a hydrogen atom, alkyl, halogen-containing alkyl, halogen, or hydroxyl-, halogen-, nitrile- or ether-containing hydrocarbyl, and a plurality of X groups, if any, may be the same or different from each other; n 1 is an integer of 1 to 14; R 1 to R 4 may be the same or different from each other and are independently alkyl or halogen-containing alkyl; and Y 1 and Y 2 may be the same or different from each other and are independently a hydrogen atom or a group represented by the general formula (2): wherein R 5 to R 7 may be the same or different from each other and are independently a hydrogen atom, alkyl, halogen or halogen-containing alkyl, are excellent in optical properties, heat resistance and acid-dissociating property, and useful as crosslinking-type resins, optical materials such as optical fibers, light wave guides, optical disk substrates and photoresists as well as raw materials thereof, intermediate products of medicines or agricultural chemicals, and various other industrial products.

  本发明的金刚烷衍生物由一般式（1）表示：其中X为氢原子，烷基，含卤素的烷基，卤素，或含有羟基，卤素，腈基或醚基的烃基，如果有多个X基团，则它们可以相同或不同；n1为1到14的整数；R1到R4可以相同或不同，且独立地为烷基或含卤素的烷基；Y1和Y2可以相同或不同，且独立地为氢原子或由一般式（2）表示的基团：其中R5到R7可以相同或不同，且独立地为氢原子，烷基，卤素或含卤素的烷基。这些金刚烷衍生物在光学性能，耐热性和酸解离性方面表现优异，并且可用作交联型树脂，光学材料，例如光纤，光波导，光盘基板和光刻胶以及其原材料，药物或农药的中间体和各种其他工业产品。
• ADAMANTANE DERIVATIVE, METHOD FOR PRODUCING SAME, POLYMER USING SAME AS STARTING MATERIAL, AND RESIN COMPOSITION
  申请人：Arai Yoshihisa

  公开号：US20110319584A1

  公开（公告）日：2011-12-29

  Provided are an adamantane derivative represented by the following formula (1), a method for producing the same, a polymer containing an acrylate compound having the adamantane structure represented by formula (1) in a repeat unit, and a functional resin composition which contains the polymer, has excellent alkali developability and substrate adhesiveness, and can improve the resolution and the line edge roughness as a chemically amplified resist sensitive to far-ultraviolet rays represented by KrF excimer laser light, ArF excimer laser light, F 2 excimer laser light or EUV without spoiling fundamental properties thereof as a resist such as pattern forming properties, dry etching resistance, heat resistance and the like. In the formula, R 1 through R 3 , which may be the same or different, each represent a hydrogen atom, an alkyl group having a carbon number of 1 to 3, or a halogen-containing alkyl group; R 4 through R 8 , which may be the same or different, each represent an alkyl group having a carbon number of 1 to 3 or a halogen-containing alkyl group; X, which may be the same or different, represents a hydrogen atom, an alkyl group having a carbon number of 1 to 3, or a alkoxy group having a carbon number of 1 to 3; and n represents 14.

  提供了以下公式（1）所代表的金刚烷衍生物，以及制备该衍生物的方法，包含在重复单元中具有公式（1）所代表的金刚烷结构的丙烯酸酯化合物的聚合物，以及包含该聚合物的功能性树脂组成物。该组成物具有优异的碱性显影性和基板粘附性，作为化学增强的抗Far-UV线（KrF准分子激光光、ArF准分子激光光、F2准分子激光光或EUV）的敏化剂，可以提高分辨率和线边粗糙度，同时不破坏其作为抗性的基本性质，如图案形成性能，干法刻蚀抗性，耐热性等。在公式中，R1至R3，可以相同也可以不同，分别代表氢原子，碳数为1到3的烷基或含卤素的烷基；R4至R8，可以相同也可以不同，分别代表碳数为1到3的烷基或含卤素的烷基；X，可以相同也可以不同，代表氢原子，碳数为1到3的烷基或碳数为1到3的烷氧基；n代表14。
• BICYCLOHEXANE DERIVATIVE COMPOUND AND MANUFACTURING METHOD OF THE SAME
  申请人：Echigo Masatoshi

  公开号：US20130030211A1

  公开（公告）日：2013-01-31

  A bicyclohexane derivative compound useful in the field of photoresist, the field of intermediate of drugs and pesticides, and the like, and a manufacturing method of the same are provided. A bicyclohexane derivative compound represented by the following general formula (II) is provided. (In formula (II), Y independently represents an alkyl group of 1 to 10 carbons, a halogen atom, an acyloxy group, an alkoxycarbonyl group or a hydroxyl group, X 1 represents a halogen atom, m represents an integer of 0 to 11, and m represents an integer of 0 to 10.)

  提供了一种在光刻领域、药物和农药中间体领域等方面有用的双环己烷衍生物化合物，以及其制造方法。提供了一种由以下通式（II）表示的双环己烷衍生物化合物。（在式（II）中，Y独立表示1至10个碳原子的烷基，卤素原子，酰氧基，烷氧羰基或羟基，X1表示卤素原子，m表示0至11的整数，n表示0至10的整数。）