TRIARYLMETHANE BLUE DYE COMPOUND, BLUE RESIN COMPOSITION FOR COLOR FILTER CONTAINING SAME AND COLOR FILTER USING SAME
申请人:KYUNG SYNTHETIC CO., LTD.
公开号:US20150060744A1
公开(公告)日:2015-03-05
The present disclosure relates to a blue dye compound for a color filter and a coloring resin composition for a color filter containing the same. Since the blue resin composition according to the present disclosure, which contains the novel triarylmethane blue dye compound or the polymer dye compound obtained using the same as a monomer, has superior solubility in an organic solvent such as propylene glycol monomethyl ether acetate (PGMEA), cyclohexanone, etc. as well as superior miscibility with another pigment and high brightness, it can be used to prepare a color filter exhibiting superior heat resistance, light resistance and brightness.
XANTHENE-BASED PURPLE DYE COMPOUND, COLORING RESIN COMPOSITION FOR COLOR FILTER CONTAINING SAME AND COLOR FILTER USING SAME
申请人:KYUNG-IN SYNTHETIC CO., LTD.
公开号:US20150322265A1
公开(公告)日:2015-11-12
The present disclosure relates to a purple dye compound for a color filter and a coloring resin composition for a color filter containing the same. The novel xanthene-based purple dye compound or the polymer dye compound obtained using the same as a monomer has superior solvent resistance and superior miscibility with a pigment in an organic solvent. Further, it exhibits superior heat resistance, chemical resistance, light resistance and brightness due to the homopolymer structure. Accordingly, a coloring resin composition containing the same can be used widely as a dye for synthetic resins and synthetic fibers, as a coloring agent for polymer materials, for a color filter used in LCDs, PDPs, etc., and so forth.
PHOTORESIST COMPOSITION, RESIST-PATTERN FORMING METHOD, POLYMER, AND COMPOUND
申请人:SATO Mitsuo
公开号:US20120258402A1
公开(公告)日:2012-10-11
A photoresist composition includes a polymer that includes a structural unit shown by the following formula (1), and a photoacid generator. R
1
in the formula (1) represents a hydrogen atom, a fluorine atom, a methyl group, or a trifluoromethyl group, Z represents a group that forms a divalent alicyclic group having 3 to 20 carbon atoms together with a carbon atom bonded to X, X represents an alkanediyl group having 1 to 6 carbon atoms, Y represents a hydrogen atom or —CR
2
R
3
(OR
4
), and R
2
to R
4
independently represent a hydrogen atom or a monovalent hydrocarbon group, provided that R
3
and R
4
optionally bond to each other to form a cyclic ether structure together with a carbon atom bonded to R
3
and an oxygen atom bonded to R
4
.
[EN] NOVEL COMPOUND, SEMICONDUCTOR MATERIAL, AND METHODS FOR MANUFACTURING COATING AND SEMICONDUCTOR USING THE SAME<br/>[FR] NOUVEAU COMPOSÉ, MATÉRIAU SEMI-CONDUCTEUR, PROCÉDÉS DE FABRICATION DE REVÊTEMENT ET SEMI-CONDUCTEUR L'UTILISANT
申请人:MERCK PATENT GMBH
公开号:WO2018115043A1
公开(公告)日:2018-06-28
An object is to provide a semiconductor material and coating having high solubility in solvents and having advantageous filling property, high heat resistance, and/or high etching resistance. Another object is to provide a method for manufacturing a semiconductor using the semiconductor material. Still another object is to provide a novel compound. Provided are: a semiconductor material consisting of a specific aromatic hydrocarbon ring derivative; methods for manufacturing a coating and a semiconductor using the semiconductor material; and a compound consisting of a specific aromatic hydrocarbon ring derivative.