Fluorine-Containing Sulfonic Acid Salt, Fluorine-Containing Sulfonic Acid Salt Resin, Resist Composition, and Pattern Forming Method Using Same
申请人:Central Glass Company, Limited
公开号:US20150198879A1
公开(公告)日:2015-07-16
Disclosed is a fluorine-containing sulfonic acid salt resin having a repeating unit represented by the following general formula (3). In the formula, each A independently represents a hydrogen atom, a fluorine atom or a trifluoromethyl group, and n represents an integer of 1-10. W represents a bivalent linking group, R
01
represents a hydrogen atom or a monovalent organic group, and M
+
represents a monovalent cation. A resist composition containing this resin is further superior in sensitivity, resolution and reproducibility of mask pattern and is capable of forming a pattern with a low LER.
An object of the present invention is to provide methods of discovering drugs effective for tough targets, which have conventionally been discovered only with difficulty. The present invention relates to novel methods for cyclizing peptide compounds, and novel peptide compounds and libraries comprising the same, to achieve the above object.
AbstractA palladium‐catalyzed intramolecular CH bond sulfuration reaction of aryl thiocarbamates has been developed. This strategy provides a new route to benzo[d][1,3]oxathiol‐2‐ones with tolerance of a wide range of substituents. Mechanistic studies suggested that the CH activation–sulfuration to afford 2‐imino‐1,3‐benzoxathiole intermediate might involve an electrophilic palladation process.magnified image
Regiocontrolled Carbonylsulfanylations at ortho-Position of Phenols and at α-Position of Ketones Using Chlorocarbonylsulfenyl Chloride