2-trifluoromethyl acrylic acid 2-methyl-1-propyl ester

• 分子结构分类: 有机化合物 - 有机酸及其衍生物 - 羧酸及其衍生物
• 英文名称: 2-trifluoromethyl acrylic acid 2-methyl-1-propyl ester
• 英文别名: 2-Methylpropyl 2-(trifluoromethyl)prop-2-enoate
• 化学式: C₈H₁₁F₃O₂
• 分子量: 196.169
• InChiKey: FOVGANUDVFJLLX-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  3.2
• 重原子数：
  13
• 可旋转键数：
  4
• 环数：
  0.0
• sp3杂化的碳原子比例：
  0.62
• 拓扑面积：
  26.3
• 氢给体数：
  0
• 氢受体数：
  5

反应信息

• 作为产物：
  描述：

  异丁醇 、 1,2-二溴-3,3,3-三氟丙烷 、 一氧化碳 在 bis-triphenylphosphine-palladium(II) chloride 三乙胺 作用下， 以 甲苯 为溶剂， 120.0 ℃ 、1.0 MPa 条件下， 反应 5.0h， 以65.1%的产率得到2-trifluoromethyl acrylic acid 2-methyl-1-propyl ester
  参考文献：
  名称：

  EP1637514

  摘要：

  公开号：

文献信息

• RESIST POLYMER, RESIST COMPOSITION, PROCESS FOR PATTERN FORMATION, AND STARTING COMPOUNDS FOR PRODUCTION OF THE RESIST POLYMER
  申请人：Momose Hikaru

  公开号：US20090198065A1

  公开（公告）日：2009-08-06

  To provide a resist polymer comprising, as a structural unit, an acid-decomposable unit having a structure represented by formula (1) or (2) which exhibits a small line edge roughness and produces little defects in DUV excimer laser lithography or the like. In formulas (1) and (2), n represents an integer of 2 to 24; J represents a single bond or a divalent hydrocarbon group which may have a substituent/heteroatom when n=2, or represents an n-valent hydrocarbon group which may have a substituent/heteroatom when n≧3; E represents a residue of a polymerization terminator, a chain transfer agent or a polymerization initiator; K 1 and K 2 each represent at least one selected from alkylene, cycloalkylene, oxyalkylene, arylene, a divalent thiazoline ring, a divalent oxazoline ring and a divalent imidazoline ring; L 1 and L 2 each represent at least one selected from —C(O)O—, —C(O)— and —OC(O)—; M 1 , M 2 and M 3 each represent at least one selected from alkylene, cycloalkylene, oxyalkylene and arylene; Y, Y 1 and Y 2 each represent an acid-decomposable linkage; k1, k2, l1, l2, m1, m2, and m3 each represent 0 or 1; and R 1 represents H or a methyl group.

  提供一种抗蚀聚合物，其由一个具有结构式（1）或（2）所表示的酸分解单元作为结构单元，能够在DUV准分子激光微影或类似工艺中表现出小的线边粗糙度并产生少量缺陷。在式（1）和（2）中，n表示2至24的整数；J表示单键或二价碳氢基团，当n=2时可以具有取代基/杂原子，或者当n≥3时可以表示n价碳氢基团，可以具有取代基/杂原子；E表示聚合终止剂、链转移剂或聚合引发剂的残基；K1和K2分别表示至少选择自烷基、环烷基、氧烷基、芳烃、二价噻唑环、二价噁唑环和二价咪唑环中的至少一种；L1和L2分别表示至少选择自—C（O）O—、—C（O）—和—OC（O）—中的至少一种；M1、M2和M3分别表示至少选择自烷基、环烷基、氧烷基和芳烃中的至少一种；Y、Y1和Y2分别表示酸分解键；k1、k2、l1、l2、m1、m2和m3分别表示0或1；R1表示H或甲基基团。
• METHOD FOR PRODUCING FLUORINE-CONTAINING ACRYLATE
  申请人：Tosoh F-Tech, Inc.

  公开号：EP1637514A1

  公开（公告）日：2006-03-22

  A process for producing a fluorine-containing acrylic acid ester represented by CH2=C(Rf) (COOR) characterized in that 1-bromo-1-perfluoroalkylethene represented by CH2=CBr-Rf, or 1,2-dibromo-1-perfluoroalkylethane represented by CH2CBr-CHBr-Rf is allowed to react with an alcohol represented by ROH in the presence of a palladium catalyst, carbon monoxide, and two or more kinds of bases. The fluorine-containing acrylic acid ester is a useful compound having wide applications in materials for pharmaceuticals and functional polymers.

  一种以 CH2=C(Rf) (COOR) 为代表的含氟丙烯酸酯的生产工艺，其特征在于以 CH2=CBr-Rf 为代表的 1-溴-1-全氟烷基乙烯或以 CH2CBr-CHBr-Rf 为代表的 1,2-二溴-1-全氟烷基乙烷在钯催化剂、一氧化碳和两种或两种以上碱的存在下与以 ROH 为代表的醇反应。这种含氟丙烯酸酯是一种有用的化合物，在药物材料和功能聚合物中有着广泛的应用。
• Method for producing fluorine-containing acrylate
  申请人：Fuchikami Takamasa

  公开号：US20060122423A1

  公开（公告）日：2006-06-08

  A process for producing a fluorine-containing acrylic acid ester represented by CH 2 ═C(Rf)(COOR) characterized in that 1-bromo-1-perfluoroalkylethene represented by CH 2 ═CBr—Rf, or 1,2-dibromo-1-perfluoroalkylethane represented by CH 2 CBr—CHBr—Rf is allowed to react with an alcohol represented by ROH in the presence of a palladium catalyst, carbon monoxide, and two or more kinds of bases. The fluorine-containing acrylic acid ester is a useful compound having wide applications in materials for pharmaceuticals and functional polymers.

  一种生产以 CH 2 ═C(Rf)(COOR)为代表的含氟丙烯酸酯的工艺，其特征在于以CH 2 ═CBr-Rf，或 1,2-二溴-1-全氟烷基乙烷，其代表符号为 CH 2 在钯催化剂、一氧化碳和两种或两种以上碱的存在下，CBr-CHBr-Rf 与 ROH 所代表的醇发生反应。这种含氟丙烯酸酯是一种有用的化合物，在药物材料和功能聚合物中有着广泛的应用。
• EP1637514B1
  申请人：——

  公开号：EP1637514B1

  公开（公告）日：2014-05-07
• Resist polymer, resist composition, process for pattern formation, and starting compounds for production of the resist polymer
  申请人：Momose Hikaru

  公开号：US20070190449A1

  公开（公告）日：2007-08-16

  To provide a resist polymer comprising, as a structural unit, an acid-decomposable unit having a structure represented by formula (1) or (2) which exhibits a small line edge roughness and produces little defects in DUV excimer laser lithography or the like. In formulas (1) and (2), n represents an integer of 2 to 24; J represents a single bond or a divalent hydrocarbon group which may have a substituent/heteroatom when n=2, or represents an n-valent hydrocarbon group which may have a substituent/heteroatom when n≧3; E represents a residue of a polymerization terminator, a chain transfer agent or a polymerization initiator; K 1 and K 2 each represent at least one selected from alkylene, cycloalkylene, oxyalkylene, arylene, a divalent thiazoline ring, a divalent oxazoline ring and a divalent imidazoline ring; L 1 and L 2 each represent at least one selected from —C(O)O—, —C(O)— and —OC(O)—; M 1 , M 2 and M 3 each represent at least one selected from alkylene, cycloalkylene, oxyalkylene and arylene; Y, Y 1 and Y 2 each represent an acid-decomposable linkage; k1, k2, l1, l2, m1, m2, m3 and n1 each represent 0 or 1; and R 1 represents H or a methyl group.