Novel polymers, resist compositions and patterning process
申请人:——
公开号:US20010033989A1
公开(公告)日:2001-10-25
Polymers having fluorinated ester groups are novel. Using the polymers, resist compositions featuring low absorption of F
2
excimer laser light are obtained.
Polymer, chemically amplified resist composition and patterning process
申请人:Shin-Etsu Chemical Co., Ltd.
公开号:US20020004569A1
公开(公告)日:2002-01-10
Polymers comprising recurring units of cycloolefin having fluorinated alkyl introduced therein are novel and have transparency and alkali solubility. Using the polymers, resist compositions featuring low absorption of F
2
excimer laser light are obtained.
Copolymers containing fluorine, method for the production and use thereof
申请人:——
公开号:US20040242822A1
公开(公告)日:2004-12-02
The present invention relates to relates to copolymers containing fluorine, aqueous compositions containing said copolymers, and the use of said copolymers and compositions for surface treatment.