2,2-dimethyl-N-pentylbutanamide

• 分子结构分类: 有机化合物 - 脂质和类脂质分子 - 脂肪酰基
• 英文名称: 2,2-dimethyl-N-pentylbutanamide
• 英文别名: 2,2-dimethyl-butyric acid pentylamide；2,2-Dimethyl-N-pentyl-butyramid；2,2-Dimethyl-buttersaeure-pentylamid
• 化学式: C₁₁H₂₃NO
• mdl: MFCD02860465
• 分子量: 185.31
• InChiKey: VXFURJUHKQZABY-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  3.1
• 重原子数：
  13
• 可旋转键数：
  6
• 环数：
  0.0
• sp3杂化的碳原子比例：
  0.909
• 拓扑面积：
  29.1
• 氢给体数：
  1
• 氢受体数：
  1

反应信息

• 作为反应物：
  描述：

  2,2-dimethyl-N-pentylbutanamide 、 丙烯酸乙酯 在 5-(trifluoromethyl)pyridine-3-sulfonic acid 、 silver(I) acetate 、 palladium diacetate 作用下， 反应 36.0h， 以64%的产率得到ethyl (E)-5-methyl-5-(pentylcarbamoyl)hept-2-enoate
  参考文献：
  名称：

  利用天然酰胺的羰基配位进行钯催化的 C(sp3 )-H 烯化。

  摘要：

  据报道，Pd II催化弱配位天然酰胺的 C(sp 3 )−H 烯化反应。以前的C(sp 3 )−H烯化方案的三个主要缺点，1)产物的原位环化，2)与含α-H的底物不相容，3)外源导向基团的安装，通过利用羰基配位来解决酰胺引导 C(sp 3 )−H 激活的能力。该方法首次能够对多种天然酰胺底物（包括仲酰胺、叔酰胺和环酰胺）进行直接 C(sp 3 )−H 官能化。该方法的实用性通过烯烃化产物的多种转化得到证明。

  DOI：

  10.1002/anie.201906075
• 作为产物：
  描述：

  戊腈 在 乙醚 、 氨 、 钴 作用下， 125.0 ℃ 、17.16 MPa 条件下， 生成 2,2-dimethyl-N-pentylbutanamide
  参考文献：
  名称：

  Mechanism of the Photoöxidation of Amides

  摘要：

  DOI：

  10.1021/ja01521a021

文献信息

• RESIST COMPOSITION AND METHOD FOR FORMING RESIST PATTERN
  申请人：TOKYO OHKA KOGYO CO., LTD.

  公开号：US20170371241A1

  公开（公告）日：2017-12-28

  A resist composition containing a resin component having a structural unit represented by general formula (a0-1), and a compound represented by general formula (b1). In general formula (a0-1), R is a hydrogen atom, an alkyl group, or a halogenated alkyl group. Va 1 is a divalent hydrocarbon group. n a1 represents an integer of 0 to 2. Ra′ 12 and Ra′ 13 are a monovalent chain saturated hydrocarbon group having 1 to 10 carbon atoms or a hydrogen atom. Ra′ 14 is a phenyl group, a naphthyl group, or an anthryl group. In general formula (b1), R b1 represents a cyclic hydrocarbon group. Y b1 represents a divalent linking group containing an ester bond. V b1 represents an alkylene group, a fluorinated alkylene group, or a single bond. m is an integer of 1 or more, and M m+ is an m-valent organic cation.

  一种电阻组分，包含具有一般式（a0-1）所代表的结构单元的树脂组分，以及一种由一般式（b1）所代表的化合物。在一般式（a0-1）中，R是氢原子、烷基或卤代烷基。Va1是双价碳氢基团。na1表示0至2的整数。Ra′12和Ra′13是具有1至10个碳原子的单价链饱和碳氢基团或氢原子。Ra′14是苯基、萘基或蒽基。在一般式（b1）中，Rb1代表环烃基。Yb1代表含有酯键的双价连接基团。Vb1代表烷基、氟化烷基或单键。m是1或更多的整数，Mm+是m价有机阳离子。
• RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, COMPOUND, AND ACID GENERATOR
  申请人：TOKYO OHKA KOGYO CO., LTD.

  公开号：US20180149973A1

  公开（公告）日：2018-05-31

  A resist composition including a base component which exhibits changed solubility in a developing solution under action of acid, and a compound (B1) having an anion moiety and a cation moiety and being represented by general formula (b1) (wherein R 01 to R 014 each independently represents a hydrogen atom or a hydrocarbon group which may have a substituent, or two or more of R 01 to R 014 may be mutually bonded to form a ring structure, provided that at least two of R 01 to R 014 are mutually bonded to form a ring structure, and at least one of R 01 to R 014 has an anion group, and the anion moiety as a whole forms an anion having a valency of n; n represents an integer of 1 or more; represents an integer of 1 or more; and M m+ represents an organic cation having a valency of m).

  一种抗蚀组合物，包括在酸的作用下在显影溶液中表现出改变溶解度的基础组分，以及一种具有阴离子基团和阳离子基团的化合物（B1），其由一般式（b1）表示（其中R01至R014分别独立地表示氢原子或可能具有取代基的碳氢基团，或者R01至R014中的两个或两个以上可能相互键合形成环结构，前提是至少两个R01至R014相互键合形成环结构，至少一个R01至R014具有阴离子基团，整体上阴离子基团形成带有价数n的阴离子；n表示1或更多的整数；表示1或更多的整数；Mm+表示具有价数m的有机阳离子）。
• Shape memory polymers
  申请人：Anthamatten Mitchell L.

  公开号：US20080177303A1

  公开（公告）日：2008-07-24

  The present disclosure relates to Shape Memory Polymers (SMP's) comprising function groups that allow the polymers to be elastically deformed, utilized in the elastically deformed state, and subsequently returned to the original polymorphic shape.

  本公开涉及形状记忆聚合物（SMP），其中包含允许聚合物弹性变形的功能基团，可在弹性变形状态下使用，并随后返回到原始的多态形状。
• Shape Memory Polymers
  申请人：Anthamatten Mitchell L.

  公开号：US20110251364A1

  公开（公告）日：2011-10-13

  The present disclosure relates to Shape Memory Polymers (SMP's) comprising function groups that allow the polymers to be elastically deformed, utilized in the elastically deformed state, and subsequently returned to the original polymorphic shape.

  本公开涉及具有功能基团的形状记忆聚合物（SMP），这些功能基团使聚合物能够弹性变形，在弹性变形状态下使用，并随后返回到原始的多形态形状。
• METHOD FOR MANUFACTURING POLYMER COMPOUND
  申请人：TOKYO OHKA KOGYO CO., LTD.

  公开号：US20170166664A1

  公开（公告）日：2017-06-15

  A method for manufacturing a polymer compound which has a constituent unit (a10) which includes a hydroxy group and a constituent unit (a1) which includes an acid decomposable group of which a polarity increases due to an effect of an acid, the method including copolymerizing a monomer for deriving a constituent unit (a0) which includes a group which protects a phenolic hydroxyl group or a hydroxy group of a carboxy group with an organic silicon compound and a monomer for deriving the constituent unit (a1) and obtaining a prepolymer which has the constituent unit (a0) and the constituent unit (a1), and selectively deprotecting the constituent unit (a0) by reacting a compound which has a fluoride anion with the prepolymer and obtaining a polymer compound which has the constituent unit (a10) and the constituent unit (a1).