4:2 fluorotelomer sulfonic acid | 757124-72-4

• 分子结构分类: 有机化合物 - 有机酸及其衍生物 - 有机磺酸及其衍生物
• 英文名称: 4:2 fluorotelomer sulfonic acid
• 英文别名: 1H,1H,2H,2H-Perfluorohexanesulphonic acid；3,3,4,4,5,5,6,6,6-nonafluorohexane-1-sulfonic acid
• CAS: 757124-72-4
• 化学式: C₆H₅F₉O₃S
• 分子量: 328.156
• InChiKey: TXGIGTRUEITPSC-UHFFFAOYSA-N

物化性质

• 密度：
  1.679±0.06 g/cm3(Predicted)

计算性质

• 辛醇/水分配系数(LogP)：
  2.6
• 重原子数：
  19
• 可旋转键数：
  5
• 环数：
  0.0
• sp3杂化的碳原子比例：
  1.0
• 拓扑面积：
  62.8
• 氢给体数：
  1
• 氢受体数：
  12

反应信息

• 作为反应物：
  描述：

  1-乙基咪唑 、 4:2 fluorotelomer sulfonic acid 以 乙醇 为溶剂， 反应 24.0h， 生成 3-ethyl-1H-imidazol-3-ium 3,3,4,4,5,5,6,6,6-nonafluorohexane-1-sulfonate
  参考文献：
  名称：

  WO2006/51897

  摘要：

  公开号：
• 作为产物：
  描述：

  在 nickel dichloride 水 、 锌 作用下， 以 四氢呋喃 为溶剂， 反应 12.0h， 生成 4:2 fluorotelomer sulfonic acid
  参考文献：
  名称：

  WO2006/51897

  摘要：

  公开号：

文献信息

• Positive photosensitive composition
  申请人：Kodama Kunihiko

  公开号：US20070003871A1

  公开（公告）日：2007-01-04

  A positive photosensitive composition comprises a compound capable of generating a specified sulfonic acid upon irradiation with one of an actinic ray and radiation and (B) a resin capable of decomposing under the action of an acid to increase the solubility in an alkali developer.

  一种正性光敏组合物包括一种化合物，该化合物能够在接受活性光线或辐射照射后产生一种指定的磺酸，并且（B）一种树脂，该树脂在酸作用下分解以增加在碱性显影剂中的溶解度。
• METHOD FOR FORMING MULTILAYER RESIST
  申请人：DAIKIN INDUSTRIES, LTD.

  公开号：EP1686425A1

  公开（公告）日：2006-08-02

  There is formed a laminated resist which exhibits sufficient reflection reducing effect in a photolithography process using light of vacuum ultraviolet region and also has sufficient developing characteristics in a developing process. The method of forming the laminated photoresist comprises (I) a step for forming the photoresist layer (L1) on a substrate and (II) a step for forming the antireflection layer (L2) on the photoresist layer (L1) by applying the coating composition containing the fluorine-containing polymer (A) having hydrophilic group Y. The fluorine-containing polymer (A) contains a structural unit derived from a fluorine-containing ethylenic monomer having hydrophilic group Y and is characterized in that (i) the hydrophilic group Y contains an acidic OH group having a pKa value of not more than 11, (ii) a fluorine content is not less than 50 % by mass, and (iii) the number of moles of the hydrophilic group Y in 100 g of the fluorine-containing polymer (A) is not less than 0.14.

  形成了一种层状光刻胶，它在使用真空紫外区光的光刻工艺中显示出足够的减反射效果，并且在显影工艺中具有足够的显影特性。形成层状光刻胶的方法包括：(I) 在基底上形成光刻胶层 (L1) 的步骤；(II) 在光刻胶层 (L1) 上形成抗反射层 (L2) 的步骤，该步骤通过涂敷含有亲水基团 Y 的含氟聚合物 (A) 的涂层组合物来实现。含氟聚合物(A)含有由具有亲水基团 Y 的含氟乙烯单体衍生的结构单元，其特征在于：(i) 亲水基团 Y 含有 pKa 值不大于 11 的酸性 OH 基团；(ii) 氟含量不小于 50%（按质量计）；(iii) 100 克含氟聚合物(A)中亲水基团 Y 的摩尔数不小于 0.14。
• PEROXIDE-CURABLE FLUOROELASTOMER COMPOSITION
  申请人：DAIKIN INDUSTRIES, LTD.

  公开号：EP1865025A1

  公开（公告）日：2007-12-12

  The present invention provides a peroxide-vulcanizable fluorine-containing elastomer composition which is remarkably improved in fluidity and thereby exhibits improved processability, though conventional fluorine-containing elastomer compositions could be molded only by a molding process having a problem in its productivity, for instance, compression molding or transfer molding which has been used so far as a general molding process. The present invention further provides a molded article obtained by vulcanizing the composition. The present invention also provides a fluorine-containing elastomer composition in which a large amount of a filler can be blended. Specifically, the present invention relates to the fluorine-containing elastomer composition comprising a fluorine-containing elastomer (A) composed of a structural unit derived from vinylidene fluoride and/ or a structural unit of tetrafluoroethylene and a structural unit derived from at least one other monomer, and having (a) a number average molecular weight (Mn) of 30,000 to 70,000 g/mol, and (b) an iodine content of 0.3 to 1.0 % by weight and an organoperoxide vulcanizing agent (B).

  本发明提供了一种可过氧化物硫化的含氟弹性体组合物，该组合物的流动性得到了显著改善，从而显示出更好的可加工性，尽管传统的含氟弹性体组合物只能通过生产率有问题的成型工艺进行成型，例如迄今为止作为一般成型工艺使用的压缩成型或传递成型。本发明进一步提供了一种通过硫化该组合物获得的模塑制品。本发明还提供了一种可掺入大量填料的含氟弹性体组合物。具体地说，本发明涉及含氟弹性体组合物，该组合物包括一种含氟弹性体 (A)，该弹性体由衍生自偏氟乙烯和/或四氟乙烯的结构单元和衍生自至少一种其他单体的结构单元组成，并且具有 (a) 30,000 至 70,000 g/mol 的数均分子量 (Mn)，以及 (b) 0.3 至 1.0 %（重量）的碘含量和一种有机过氧化物硫化剂 (B)。
• PEROXIDE CROSS-LINKED FLUORINE-CONTAINING ELASTOMER COMPOSITION
  申请人：Daikin Industries, Ltd.

  公开号：EP2264100A1

  公开（公告）日：2010-12-22

  The present invention provides a fluorine-containing elastomer composition of which viscosity can be decreased without increasing an amount of expensive monomer while maintaining physical properties in normal state of a branched fluorine-containing elastomer. The composition is a peroxide-crosslinkable fluorine-containing elastomer composition comprising (A) a branched fluorine-containing elastomer having peroxide-crosslinkable cure site, which has a number average molecular weight of from 1,000 to 300,000 and a Mark-Houwink gradient "a" of less than 0.6 when an absolute weight molecular weight and an intrinsic viscosity are plotted on a Mark-Houwink plot having an axis of abscissa of absolute weight molecular weight and an axis of ordinate of intrinsic viscosity, and (B) a straight chain type fluorine-containing polymer having a number average molecular weight of from 1,000 to 250,000 and a Mark-Houwink gradient "a" of not less than 0.6.

  本发明提供了一种含氟弹性体组合物，它可以在不增加昂贵单体用量的情况下降低粘度，同时保持支链含氟弹性体正常状态下的物理性能。该组合物是一种可过氧化物交联的含氟弹性体组合物，包括 (A) 具有可过氧化物交联固化位点的支链含氟弹性体，该弹性体的平均分子量为 1,000 至 300,000 之间，当绝对分子量和 Mark-Houwink 梯度 "a "小于 0.(B) 平均分子量为 1,000 至 250,000 的直链型含氟聚合物，其 Mark-Houwink 梯度 "a "不小于 0.6。
• Method of forming laminated resist
  申请人：Araki Takayuki

  公开号：US20070196763A1

  公开（公告）日：2007-08-23

  There is formed a laminated resist which exhibits sufficient reflection reducing effect in a photolithography process using light of vacuum ultraviolet region and also has sufficient developing characteristics in a developing process. The method of forming the laminated photoresist comprises (I) a step for forming the photoresist layer (L 1 ) on a substrate and (II) a step for forming the antireflection layer (L 2 ) on the photoresist layer (L 1 ) by applying the coating composition containing the fluorine-containing polymer (A) having hydrophilic group Y. The fluorine-containing polymer (A) contains a structural unit derived from a fluorine-containing ethylenic monomer having hydrophilic group Y and is characterized in that (i) the hydrophilic group Y contains an acidic OH group having a pKa value of not more than 11, (ii) a fluorine content is not less than 50% by mass, and (iii) the number of moles of the hydrophilic group Y in 100 g of the fluorine-containing polymer (A) is not less than 0.14.