SALT AND PHOTORESIST COMPOSITION CONTAINING THE SAME
申请人:Ichikawa Koji
公开号:US20100316952A1
公开(公告)日:2010-12-16
A salt represented by the formula (a1):
wherein Q
1
and Q
2
each independently represent a fluorine atom or a C1-C4 perfluoroalkyl group,
X
1
represents —CO—O—X
a1
— or —CH
2
—O—X
a2
— wherein X
a1
and X
a2
independently each represent a C1-C15 alkylene group and one or more —CH
2
— in the alkylene group can be replaced by —O— or —CO—,
Y
1
represents a C3-C36 alicyclic hydrocarbon group or a C6-C24 aromatic hydrocarbon group, and the alicyclic hydrocarbon group and the aromatic hydrocarbon group can have one or more substituents, and one or more —CH
2
— in the alicyclic hydrocarbon group can be replaced by —O— or —CO—, and
Z
+
represents an organic cation.
SALT, ACID GENERATOR, PHOTORESIST COMPOSITION, AND METHOD FOR PRODUCING PHOTORESIST PATTERN
申请人:SUMITOMO CHEMICAL COMPANY, LIMITED
公开号:US20160170298A1
公开(公告)日:2016-06-16
A salt represented by the formula (I):
wherein Q
1
and Q
2
each independently represent a fluorine atom or a C
1
to C
6
perfluoroalkyl group;
R
1
represents a C
1
to C
12
alkyl group in which a methylene group may be replaced by an oxygen atom or a carbonyl group;
A
1
represents a C
2
to C
8
alkanediyl group; and
R
2
represents a C
5
to C
18
alicyclic hydrocarbon group in which a hydrogen atom may be replaced by a hydroxy group, and in which a methylene group may be replaced by an oxygen atom or a carbonyl group, and which alicyclic hydrocarbon group may have a cyclic ketal structure optionally having a fluorine atom; and
“m” represents an integer of 0, 1, 2 or 3.