New Generation of Organosilyl Radicals by Photochemically Induced Homolytic Cleavage of Silicon−Boron Bonds
作者:Akira Matsumoto、Yoshihiko Ito
DOI:10.1021/jo000547w
日期:2000.9.1
wavelength than 300 nm, undergo photolysis to afford pairs of an organosilyl radical and a bis(diisopropylamino)boryl radical by homolytic scission of the silicon-boron bonds. Generation of organosilyl radical and organoboryl radical was confirmed by trapping experiments using TEMPO (2,2,6,6-tetramethylpiperidine N-oxyl). The organosilyl radical thus generated induces not only silylation of mono-olefins
与双(二乙基氨基)有机甲硅烷基硼烷不同,在大于300 nm的波长处具有紫外线吸收的双(二异丙氨基氨基)有机甲硅烷基硼烷经过光解,通过硅-硼键的均相裂变得到一对有机甲硅烷基和双(二异丙基氨基)硼烷基。 。通过使用TEMPO(2,2,6,6-四甲基哌啶N-氧基)的捕获实验确认了有机甲硅烷基和有机硼基的产生。由此产生的有机甲硅烷基基团不仅引起单烯烃的甲硅烷基化和二烯的甲硅烷基化,而且还引发聚合反应以提供带有有机甲硅烷基末端的聚合物。另一方面,所产生的双(二异丙基氨基)硼基不掺入烯烃加合物中。