双环[2.2.1]庚-2-烯-2-甲酰氯 | 343629-30-1

• 分子结构分类: 有机化合物 - 有机卤素化合物 - 酰卤
• 中文名称: 双环[2.2.1]庚-2-烯-2-甲酰氯
• 英文名称: norbornene-2-carbonylchloride
• 英文别名: Bicyclo[2.2.1]hept-2-ene-2-carbonyl chloride
• CAS: 343629-30-1
• 化学式: C₈H₉ClO
• 分子量: 156.612
• InChiKey: ZSEUGXYKIHYNNF-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  2.6
• 重原子数：
  10
• 可旋转键数：
  1
• 环数：
  2.0
• sp3杂化的碳原子比例：
  0.62
• 拓扑面积：
  17.1
• 氢给体数：
  0
• 氢受体数：
  1

反应信息

• 作为反应物：
  描述：

  双环[2.2.1]庚-2-烯-2-甲酰氯 、 potassium thioacyanate 以 丙酮 为溶剂， 反应 0.5h， 生成 Bicyclo[2.2.1]hept-2-ene-2-carbonyl isothiocyanate
  参考文献：
  名称：

  EP2208728

  摘要：

  公开号：
• 作为产物：
  描述：

  双环[2.2.1]庚-2-烯-3-羧酸 在 N,N-二甲基甲酰胺 草酰氯 作用下， 以 四氢呋喃 、 二氯甲烷 为溶剂， 生成 双环[2.2.1]庚-2-烯-2-甲酰氯
  参考文献：
  名称：

  EP2208728

  摘要：

  公开号：

文献信息

• POLYMERIZABLE MONOMERS
  申请人：Domon Daisuke

  公开号：US20120029193A1

  公开（公告）日：2012-02-02

  A monomer of formula (1) is provided wherein R 1 is hydrogen or a monovalent C 1 -C 6 hydrocarbon group, and R 2 is a group having polymerization functionality. Using the monomer, crosslinking units can be incorporated into a polymer chain. A chemically amplified negative resist composition comprising a base polymer having crosslinking units incorporated therein has a high sensitivity and forms a resist pattern with minimized LER.

  提供了一个式子为（1）的单体，其中R1是氢或一价的C1-C6碳氢基团，R2是具有聚合功能的基团。使用这种单体，可以将交联单元并入聚合物链中。具有交联单元的基聚合物的化学放大负性光阻组合物具有高灵敏度，并形成具有最小LER的光阻图案。
• Novel ester compounds, polymers, resist compositions and patterning process
  申请人：——

  公开号：US20040068124A1

  公开（公告）日：2004-04-08

  Novel ester compounds having formula (1) wherein A 1 is a polymerizable functional group having a double bond, A 2 is furandiyl, tetrahydrofurandiyl or oxanorbornanediyl, R 1 and R 2 each are a monovalent hydrocarbon group, or R 1 and R 2 may bond together to form an aliphatic hydrocarbon ring with the carbon atom, and R 3 is hydrogen or a monovalent hydrocarbon group which may contain a hetero atom are polymerizable into polymers. Resist compositions comprising the polymers are sensitive to high-energy radiation, have an improved sensitivity, resolution, and etching resistance, and lend themselves to micropatterning with electron beams or deep-UV rays. 1

  具有式（1）的新型酯化合物，其中A1是具有双键的可聚合官能团，A2是呋喃基，四氢呋喃基或氧杂-去氢萘二基，R1和R2分别是一价碳氢基团，或者R1和R2可以结合形成带有碳原子的脂肪族碳氢环，R3是氢或可以含有杂原子的一价碳氢基团，可以聚合成聚合物。包含这些聚合物的抗蚀剂组合物对高能辐射敏感，具有改善的敏感性、分辨率和蚀刻抗性，并且适用于使用电子束或深紫外线进行微图案制作。
• Novel compound, polymer, resist composition, and patterning process
  申请人：Hasegawa Koji

  公开号：US20050014092A1

  公开（公告）日：2005-01-20

  There is disclosed a polymer containing at least a repeating unit represented by the following general formula (1), and the resist composition containing the polymer as a base resin, especially a chemically amplified resist composition. There can be provided a resist composition which has etching resistance in a practical use level, and is excellent in an adhesion property with a substrate and an affinity with a developer, and has a sensitivity and resolving power which is far excellent compared with a conventional one, wherein swelling is small at the time of development, especially for photolithography which uses a high-energy beam as a light source, and especially be provided a chemically amplified resist composition.

  本发明公开了一种聚合物，其至少包含由下述通式（1）表示的重复单元，并且该聚合物作为基础树脂含于抗蚀剂组成物中，特别是化学增感抗蚀剂组成物中。本发明可提供一种在实际使用水平上具有蚀刻抗性、与基板具有优异的粘附性和与显影剂具有亲和性，并且具有远优于传统抗蚀剂的感度和分辨率的抗蚀剂组成物，在开发时膨胀小，特别适用于使用高能光束作为光源的光刻技术，特别是化学增感抗蚀剂组成物。
• High silicon content monomers and polymers suitable for 193 nm bilayer resists
  申请人：International Business Machines Corporation

  公开号：US20020127490A1

  公开（公告）日：2002-09-12

  Polymerizable monomers having silicon containing groups that are transparent at 193 nm; and ethylenically unsaturated group are provided. Polymers from these monomers can be used in processes for forming sub-100 nm images with a chemically amplified, radiation sensitive bilayer resist. The bilayer resist is disposed on a substrate and comprises (i) a top imaging layer comprising a radiation sensitive acid generator and (ii) an organic underlayer. The bilayer resist can be used in the manufacturing of integrated circuits.

  提供了具有硅含基团且在193纳米处透明的可聚合单体；以及乙烯基不饱和基团。这些单体形成的聚合物可用于制备具有化学增感、辐射敏感的双层光阻的亚100纳米图像的工艺中。双层光阻被放置在基底上，包括（i）顶部成像层，包括辐射敏感的酸发生剂和（ii）有机底层。该双层光阻可用于集成电路的制造。
• Metathesis polymerized cross-linked halogen-containing copolymer
  申请人：HERCULES INCORPORATED

  公开号：EP0283719A2

  公开（公告）日：1988-09-28

  A cross-linked copolymer containing repeating units derived from dicyclopentadiene and metathesis polymerizable halogen-containing cycloalkenes, a process for producing the copolymer, a process for producing a molded article from the copolymer and a polymerizable composition therefor.

  一种交联共聚物，其含有由双环戊二烯和可偏聚的含卤环烯衍生的重复单元；一种生产该共聚物的工艺；一种用该共聚物和可聚合组合物生产模塑制品的工艺。