((1,1-二氟乙基)磺酰基)苯 | 805242-49-3

• 分子结构分类: 有机化合物 - 苯类化合物 - 苯和取代衍生物
• 中文名称: ((1,1-二氟乙基)磺酰基)苯
• 英文名称: 1,1-difluoroethyl phenyl sulfone
• 英文别名: 1,1-difluoroethylsulfonylbenzene
• CAS: 805242-49-3
• 化学式: C₈H₈F₂O₂S
• 分子量: 206.213
• InChiKey: BNVSVUNYTUTSIA-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  2.6
• 重原子数：
  13
• 可旋转键数：
  2
• 环数：
  1.0
• sp3杂化的碳原子比例：
  0.25
• 拓扑面积：
  42.5
• 氢给体数：
  0
• 氢受体数：
  4

反应信息

• 作为反应物：
  描述：

  三乙基氯硅烷 、 ((1,1-二氟乙基)磺酰基)苯 在 magnesium granule 作用下， 以 四氢呋喃 、 六甲基磷酰三胺 为溶剂， 反应 1.0h， 以35%的产率得到(1,1-difluoroethyl)triethylsilane
  参考文献：
  名称：

  Synthesis of 1,1-difluoroethylsilanes and their application for the introduction of the 1,1-difluoroethyl group

  摘要：

  1,1-Difluoroethysilanes (R3SiCF2CH3, R=Me or Et) were synthesized from 1,1-difluoroethyl phenyl sulfone and chlorosilanes using magnesium metal via reductive 1,1-difluoroethylation. It was confirmed that 1,1-difluoroethylsilanes were effective 1,1-difluoroethylating reagents for carbonyl compounds. (C) 2007 Elsevier B.V. All rights reserved.

  DOI：

  10.1016/j.jfluchem.2007.03.013
• 作为产物：
  描述：

  二氟甲基苯硫醚 在 potassium tert-butylate 、 双氧水 作用下， 以 溶剂黄146 、 N,N-二甲基甲酰胺 为溶剂， 生成 ((1,1-二氟乙基)磺酰基)苯
  参考文献：
  名称：

  Synthesis of 1,1-difluoroethylsilanes and their application for the introduction of the 1,1-difluoroethyl group

  摘要：

  1,1-Difluoroethysilanes (R3SiCF2CH3, R=Me or Et) were synthesized from 1,1-difluoroethyl phenyl sulfone and chlorosilanes using magnesium metal via reductive 1,1-difluoroethylation. It was confirmed that 1,1-difluoroethylsilanes were effective 1,1-difluoroethylating reagents for carbonyl compounds. (C) 2007 Elsevier B.V. All rights reserved.

  DOI：

  10.1016/j.jfluchem.2007.03.013

文献信息

• Nucleophilic substitution reactions of difluorormethyl phenyl sulfone with alkyl halides leading to the facile synthesis of terminal 1,1-difluoro-1-alkenes and difluoromethylalkanes
  申请人：Prakash Surya G. K.

  公开号：US20060052643A1

  公开（公告）日：2006-03-09

  (Benzenesulfonyl)difluoromethyl anion, in situ generated from difluoromethyl phenyl sulfone and a base, was found to easily undergo nucleophilic substitution reactions (S N 2) with primary alkyl halides, elemental halogens, and perfluoroalkyl halides with good selectivity. The formed (benzenesufonyl)difluoromethylalkanes are useful intermediates for the facile preparation of 1,1-difluoro-1-alkenes and difluorometbylalkanes. Thus, difluoromethyl phenyl sulfone acts as both “CF 2 ═” and “CF 2 H − ” synthons.

  从二氟甲基苯磺酰酸和碱生成的(Benzenesulfonyl)difluoromethyl阴离子，在原位生成后，被发现容易与一级烷基卤化物、元素卤素和全氟烷基卤化物发生亲核取代反应（SN2），具有良好的选择性。形成的（苯磺酰基）二氟甲基烷烃是制备1,1-二氟-1-烯和二氟甲基烷烃的方便中间体。因此，二氟甲基苯磺酰酸同时作为“CF2═”和“CF2H−”合成子。
• [EN] NUCLEOPHILIC SUBSTITUTION REACTIONS OF DIFLUOROMETHYL PHENYL SULFONE WITH ALKYL HALIDES LEADING TO THE FACILE SYNTHESIS OF TERMINAL 1,1-DIFLUORO-1-ALKENES AND DIFLUOROMETHYLALKANES<br/>[FR] REACTIONS DE SUBSTITUTION NUCLEOPHILIQUE DU DIFLUOROMETHYL- PHENYLSULFONE PAR DES HALOGENURES D'ALKYLE CONDUISANT A UNE SYNTHESE FACILE DE 1,1-DIFLUORO-1-ALCENES ET DE DIFLUOROMETHYLALCANES
  申请人：UNIV SOUTHERN CALIFORNIA

  公开号：WO2005097739A2

  公开（公告）日：2005-10-20

  (Benzenesulfonyl)difluoromethyl anion, in situ generated from difluoromethyl phenyl sulfone and a base, was found to easily undergo nucleophilic substitution reactions (SN2 with primary alkyl halides, elemental halogens, and perfluoroalkyl halides with good selectivity. The formed (Benzenesulfonyl) difluoromethylalkanes are useful intermediates for the facile preparation of 1,1-difluoro-1alkenes and difluoromethylalkanes. Thus, difluoromethyl phenyl sulfone acts as both “CF2=” and CF2H” synthons.

  (苯磺酰基)二氟甲基阴离子，由二氟甲基苯磺酮和碱原位生成，被发现易于进行核苷酸取代反应（SN2反应），以主要的烷基卤化物、元素卤素和全氟烷基卤化物为底物，显示出良好的选择性。形成的（苯磺酰基）二氟甲基烷烃是制备1,1-二氟-1-烯烃和二氟甲基烷烃的有用中间体。因此，二氟甲基苯磺酮既可以作为“CF₂=”型化学模型，也可以作为“CF₂H”型化学模型。
• Difluoromethyl Phenyl Sulfone, a Difluoromethylidene Equivalent: Use in the Synthesis of 1,1-Difluoro-1-alkenes
  作者：G. K. Surya Prakash、Jinbo Hu、Ying Wang、George A. Olah

  DOI：10.1002/anie.200460815

  日期：2004.10.4
• Oxime Compound and Resist Composition Containing the Same
  申请人：MASUYAMA Tatsuro

  公开号：US20100021847A1

  公开（公告）日：2010-01-28

  An oxime compound represented by the formula (I): wherein Y represents an unsubstituted or substituted n-valent C6-C14 aromatic hydrocarbon group, n represents an integer of 1 to 6, R 1 ) represents a C1-C30 aliphatic hydrocarbon group etc., R 2 represents a linear or branched chain C1-C20 aliphatic hydrocarbon group etc., W represents —CO—O— etc., Q 1 and Q 2 each independently represent a fluorine atom etc., Z represents a C1-C20 halogenated aliphatic hydrocarbon group etc, and the resist composition containing the same.
• PHOTORESIST COMPOSITION
  申请人：MASUYAMA Tatsuro

  公开号：US20110091808A1

  公开（公告）日：2011-04-21

  The present invention provides a photoresist composition comprising a compound capable of generating an acid and a base by irradiation, a resin having an acid-labile group and being insoluble or poorly soluble in an aqueous alkali solution but becoming soluble in an aqueous alkali solution by the action of an acid, and an acid generator.