The invention relates to a polysaccharide polymer of formula (I):
PS—(O—CO-L-X)a(OH)b (I)
in which PS denotes the basic backbone of the polysaccharide bearing the hydroxyl groups;
L is a divalent hydrocarbon-based group comprising from 1 to 20 carbon atoms;
X denotes a photoactive group of azide or diazirine type;
a denotes the content of OH groups substituted with the photoactive group;
b denotes the content of unsubstituted free OH groups;
a being between 0.02 and 0.5; b being between 0.5 and 0.98;
and a+b=1.
The invention also relates to a composition comprising the polymer (I) in a physiologically acceptable medium, and also to a cosmetic process for caring for the skin, comprising the topical application to the skin of said composition and exposure of the treated skin to light radiation.
本发明涉及一种式 (I) 的
多糖聚合物:
PS-(O-CO-L-X)a(OH)b (I)
其中 PS 表示带有羟基的
多糖基本骨架;
L 是由 1 至 20 个碳原子组成的二价烃基;
X 表示
叠氮或重氮基类型的光活性基团;
a 表示被光活性基团取代的 OH 基团的含量;
b 表示未取代的游离 OH 基团的含量;
a 介于 0.02 和 0.5 之间;b 介于 0.5 和 0.98 之间;
a+b=1。
本发明还涉及一种包含在生理上可接受的介质中的聚合物(I)的组合物,还涉及一种用于护理皮肤的美容工艺,包括将所述组合物局部施用到皮肤上,并将处理过的皮肤暴露在光辐射下。