申请人:Nippon Kayaku Kabushiki Kaisha
公开号:EP1170315A1
公开(公告)日:2002-01-09
The present invention is intended to provide a resin and a resin composition that can be diluted with water and is excellent in providing a cured product (curing, adhesion, and water resistance); a resin composition that is suitable for a solder resist and an interlayer dielectric layer because the cured product is excellent in flexibility, soldering-heat resistance or the like and allows a development with an organic solvent or a dilute alkali solution; a photosensitive resin composition suitable for an etching resist or a cover lay; and a photosensitive film obtained thereby.
A urethane oligomer (A) obtained by reacting a polyol compound(a) with a polybasic acid anhydride(b-1) having at least two acid anhydride groups per molecule, a polyisocyanate compound(c), and a hydroxy compound having ethylenically unsaturated groups; and
A resin composition and a photosensitive film comprising (1) the above oligomer (A); (2) one or more resins selected from an unsaturated group-containing polycarboxylic acid (B), a reactive diluent(C-1)such as (meth)acrylates, an unreactive diluent(C-2)such as carbitol acetate and a thermoplastic polymer(D); and (3) a photopolymerization initiator.
本发明的目的是提供一种树脂和树脂组合物,该树脂和树脂组合物可以用水稀释,并在提供固化产品(固化、粘合和耐水性)方面具有优异性能;一种树脂组合物,该树脂组合物适用于阻焊层和层间介电层,因为固化产品具有优异的柔韧性、耐焊热性或类似性能,并可以用有机溶剂或稀碱溶液显影;一种感光树脂组合物,该树脂组合物适用于蚀刻阻焊层或覆盖层;以及由此获得的感光薄膜。
一种聚氨酯低聚物 (A),由多元醇化合物 (a) 与每分子至少有两个酸酐基团的多基酸酐 (b-1)、多异氰酸酯化合物 (c) 和具有乙烯不饱和基团的羟基化合物反应而得;以及
一种树脂组合物和感光胶片,包括(1)上述低聚物(A);(2)一种或多种树脂,选自含不饱和基团的聚羧酸(B)、活性稀释剂(C-1)(如(甲基)丙烯酸酯)、非活性稀释剂(C-2)(如乙酸卡必酯)和热塑性聚合物(D);以及(3)一种光聚合引发剂。