2,3-二氯丙基丙烯酸酯 | 24910-84-7

• 分子结构分类: 有机化合物 - 有机酸及其衍生物 - 羧酸及其衍生物
• 中文名称: 2,3-二氯丙基丙烯酸酯
• 中文别名: 5'-胸苷酸-5'-腺嘌呤酸(1:1)
• 英文名称: 2,3-dichloro-1-propyl acrylate
• 英文别名: 2-chloro-1-(chloromethyl)ethyl acrylate；acrylic acid-(2,3-dichloro-propyl ester)；Acrylsaeure-(2,3-dichlor-propylester)；1-Acryloyloxy-2,3-dichlor-propan；2,3-dichloropropyl acrylate；2,3-dichloropropyl prop-2-enoate
• CAS: 24910-84-7
• 化学式: C₆H₈Cl₂O₂
• 分子量: 183.034
• InChiKey: VNBVMEJAPNHJSI-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  2
• 重原子数：
  10
• 可旋转键数：
  5
• 环数：
  0.0
• sp3杂化的碳原子比例：
  0.5
• 拓扑面积：
  26.3
• 氢给体数：
  0
• 氢受体数：
  2

安全信息

• 海关编码：
  2916129000

反应信息

• 作为反应物：
  描述：

  2,3-二氯丙基丙烯酸酯 在 水 作用下， 以 甲基叔丁基醚 为溶剂， 反应 24.0h， 生成 2,3-二氯-1-丙醇
  参考文献：
  名称：

  Biocatalytic preparation of dichloropropyl acrylates. Application to the synthesis of poly(dichloropropyl acrylates)

  摘要：

  The synthesis of dichloropropyl acrylates from dichloropropyl dodecanoates through a transesterification process using diverse commercial lipases and whole cells (fungal resting cells) is presented. The synthesis was carried out in a solvent-free media using a conventional batch system and a packed bed reactor (PBR). The effect of water activity on the process depended on the lipase used. The commercial enzyme CALB (Candida antarctica lipase B immobilized onto a macroporous acrylic resin) showed the best performance as a biocatalyst, achieving a yield of 50% and productivity of 7.2 mu mol min(-1) g(-1) in the batch reactor and 33% and 35.8 mu mol min(-1) g(-1) in the PBR. Finally, polymeric material was prepared by suspension polymerization of the dichloropropyl acrylates synthesized using PBR. Particles with diameters between 170 and 380 mu m were obtained with a yield of 85% after 18 h reaction. (C) 2013 Elsevier B.V. All rights reserved.

  DOI：

  10.1016/j.molcatb.2013.03.005
• 作为产物：
  描述：

  2,3-二氯-1-丙醇 、 丙烯酸乙酯 生成 2,3-二氯丙基丙烯酸酯
  参考文献：
  名称：

  Acrylic Esters of Some Substituted Alkanols

  摘要：

  DOI：

  10.1021/ja01167a116

文献信息

• Article comprising a negative X-ray resist containing poly(2,3-dichloro-1-propyl acrylate) and poly(glycidyl methacrylate-co-ethyl acrylate) and method using this resist
  申请人：Western Electric Company, Incorporated

  公开号：EP0015459A1

  公开（公告）日：1980-09-17

  This invention relates to negative x-ray resists useful in the production of high-resolution patterned images. The x-ray resist contains a mixture of poly(2,3-dichloro-1-propyl acrylate) and poly(glycidyl methacrylate-co-ethyl acrylate), with the latter forming between 1 percent and 20 percent by weight, of the total polymer mixture. This ray resist has adhesive and resolving properties superior to those of poly(2,3-dichloro-↑- propyl acrylate). Superior properties of the mixture are attributed to the fact that the two polymers form a compatible polymer mixture which is a relatively rare and unpredictable event in polymer chemistry.

  本发明涉及用于制作高分辨率图案图像的负X射线抗蚀剂。X 射线抗蚀剂含有聚（2,3-二氯-1-丙基丙烯酸酯）和聚（甲基丙烯酸缩水甘油酯-丙烯酸乙酯）的混合物，后者占聚合物混合物总量的 1%至 20%（按重量计）。这种射线抗蚀剂的粘合性和溶解性优于聚（2,3-二氯-↑-丙基丙烯酸酯）。混合物的优异性能归功于两种聚合物形成了一种相容的聚合物混合物，这在聚合物化学中是比较罕见和不可预测的。
• Novel resin composition, coating material comprising said resin composition and method for forming coatings
  申请人：Asahi Kasei Kogyo Kabushiki Kaisha

  公开号：EP0052330A1

  公开（公告）日：1982-05-26

  A resin composition comprising (A) a polymer having, in the molecule, at least two groups represented by the following structural formula (I): wherein R1 is isopropyl, sec-butyl, tert-butyl, a C2-20 alkyl group, a C3-20 cycloalkyl group, a C5-20 alkenyl group, a C3-20 hydroxyalkyl group, a C5-20 alkoxyalkyl group, a C3-20 aminoalkyl group, a C6-20 aryl group or a C6-20 arylalkyl group, and n is 0, 1 or 2, and (B) a polymer having an electron attractive group and an α,β-ethylenic double bond adjacent thereto. Though said composition is stable at room temperature, it is crosslinked and cured at high temperatures because the amino group of the polymer (A) adds to the double bond of the polymer (B). Accordingly, said resin composition is suitable for use as a cathodic electrocoating material.

  一种树脂组合物，包含(A)一种聚合物，其分子中至少有两个由以下结构式(I)代表的基团： 其中 R1 为异丙基、仲丁基、叔丁基、C2-20 烷基、C3-20 环烷基、C5-20 烯基、C3-20 羟烷基、C5-20 烷氧基烷基、C3-20 氨基烷基、C6-20 芳基或 C6-20 芳烷基，n 为 0、1 或 2；以及 (B) 具有引电子基团和邻接α,β-乙烯双键的聚合物。虽然所述组合物在室温下稳定，但由于聚合物（A）的氨基与聚合物（B）的双键相加，因此在高温下会发生交联和固化。因此，所述树脂组合物适合用作阴极电涂层材料。
• Copolymer/terpolymer/polyol dispersions for preparing polyurethanes having improved combustion resistance
  申请人：UNION CARBIDE CORPORATION

  公开号：EP0158885A1

  公开（公告）日：1985-10-23

  A stable polymer/polyol dispersion is provided, which is useful in the preparation of polyurethane foams having improved combustion resistance and which contain (a) a polyol having a hydroxyl number from about 20 to about 150; (b) a copolymer containing from about 0.5 weight percent to about 90 weight percent, based on the weight of the copolymer, of polymerized acrylonitrile and from about 10 weight percent to about 99.5 weight percent, based on the copolymer, of at least one other polymerized halocarbon-free monomer, wherein the copolymer is characterized by a cross- linking coefficient of less than about 55; and (c) a terpolymer containing from about 0.5 weight percent to about 45 weight percent, based on the terpolymer, of a polymerized halocarbon monomer, from about 20 weight percent to about 50 weight percent based on the terpolymer, of polymerized acrylonitrile and from about 79.5 weight percent to about 5% weight percent, based on the terpolymer, of at least one other polymerized ethylenically unsaturated monomer; wherein the total amount of polyol is from about 45 weight percent to about 95 weight percent, based on the total weight of the dispersion, the total amount of copolymer and terpolymer in the polyol is from about 5 weight percent to about 55 weight percent, based on the total weight of the dispersion, and the weight ratio of copolymer to terpolymer is such that the amount of aliphatic chlorine of bromine is from about 0.2 weight percent to about 18 weight percent based on the total weight of the dispersion.

  本发明提供了一种稳定的聚合物/多元醇分散体，可用于制备耐燃烧性更好的聚氨酯泡沫，其中包含 (a) 羟基数约为 20 至 150 的多元醇； (b) 一种共聚物，以共聚物重量为基准，含有约 0.5 重量％至约 90 重量％的聚合丙烯腈和约 10 重量％至约 99.5 重量％的至少一种其他聚合无卤单体，其中共聚物的特征是交联系数小于约 55；以及 (c) 三元共聚物，含有约 0.5%至约 45%的聚合卤烃单体、约 20%至约 50%的聚合丙烯腈和约 79.5%至约 5%的聚合乙烯基不饱和单体； 其中多元醇的总量占分散液总重量的约 45%至约 95%，多元醇中共聚物和三元共聚物的总量占分散液总重量的约 5%至约 55%，共聚物和三元共聚物的重量比为，脂肪族氯溴的含量占分散液总重量的约 0.2%至约 18%。
• Electron beam and X-ray resists
  申请人：AMERICAN CYANAMID COMPANY

  公开号：EP0231922A2

  公开（公告）日：1987-08-12

  Polymers are disclosed comprising a poly(vinyl alcohol) backbone with the following groups or combination of groups bound to the backbone: (A) (substituted alkyl)benzoyl groups; or (B) (substituted alkyl)benzoyl groups, and (vinyl)benzoyl groups; or (C) (substituted alkyl)benzoyl groups, and (halo) benzoyl groups or (2-carboxy-3,4,5,6-tetrachloro) benzoyl groups; (D) (substituted alkyl)benzoyl groups, (vinyl)benzoyl groups, and (halo)benzoyl groups or (2-carboxy-3,4,5,6-tetrachloro)benzoyl groups; (E) (vinyl)benzoyl groups, and (halo)benzoyl groups or (2-carboxy-3,4,5,6-tetrachloro) benzoyl groups; or (F) (halo)benzoyl groups. Each of these polymers can optionally contain, bound to the poly(vinyl alcohol) backbone, (trialkylsily) benzoyl groups. The benzoyl groups are randomly bound to the poly(vinyl alcohol) by ester linkages. Residual pendant hydroxy groups remain after the attachment of the benzoyl groups. Also disclosed are the use of these polymers as radiation sensitive resists, such as, for example, x-ray and/or E-beam resists.

  已公开的聚合物由聚（乙烯醇）骨架组成，骨架上结合有以下基团或基团组合： (A) (取代的烷基)苯甲酰基团；或 (B) (取代的烷基)苯甲酰基团和(乙烯基)苯甲酰基团；或 (C) (取代的烷基)苯甲酰基和(卤代)苯甲酰基或(2-羧基-3,4,5,6-四氯)苯甲酰基； (D) (取代烷基)苯甲酰基、(乙烯基)苯甲酰基和(卤代)苯甲酰基或 (2-羧基-3,4,5,6-四氯)苯甲酰基； (E) (乙烯基)苯甲酰基和(卤代)苯甲酰基或(2-羧基-3,4,5,6-四氯)苯甲酰基；或 (F) (卤代)苯甲酰基。 这些聚合物中的每一种都可以选择含有与聚（乙烯醇）骨架结合的（三烷基）苯甲酰基。 苯甲酰基通过酯键与聚乙烯醇随机结合。连接苯甲酰基后，残留的悬垂羟基仍然存在。 还公开了这些聚合物作为辐射敏感抗蚀剂的用途，例如 X 射线和/或电子束抗蚀剂。
• ULTRAVIOLET-ABSORBING POLYMER MATERIAL AND PHOTOETCHING PROCESS
  申请人：TERUMO KABUSHIKI KAISHA

  公开号：EP0380667A1

  公开（公告）日：1990-08-08

  An ultraviolet-absorbing polymer material which comprises a copolymer between a (meth)acrylic es. ter monomer and a monomer having at least one fluorine atom as the substituent is disclosed. Also disclosed is a photoetching process which comprises forming a resist membrane on a base, irradiating it with a light beam of a first wavelength through a photomask, optionally conducting development of the resist, and irradiating it with a light beam of a second wavelength in a photodissociable gas atmosphere to conduct etching with reactive radicals generated by the dissociation.

  本发明公开了一种紫外线吸收聚合物材料，它由(甲基)丙烯酸酯单体和至少有一个氟原子作为取代基的单体之间的共聚物组成。本发明还公开了一种光蚀刻工艺，该工艺包括在基底上形成抗蚀膜，用第一波长的光束通过光掩膜照射抗蚀膜，选择性地对抗蚀膜进行显影，然后在光解离气体环境中用第二波长的光束照射抗蚀膜，用解离产生的活性自由基进行蚀刻。