The invention relates to a polishing liquid for metal film comprising 7.0% by weight or more of an oxidizer for metal, a water-soluble polymer, an oxidized metal dissolving agent, a metal anticorrosive agent and water, provided that the total amount of the polishing liquid for metal film is 100% by weight,
wherein the water-soluble polymer has a weight average molecular weight of 150,000 or more and is at least one member selected from among a polycarboxylic acid, a salt of a polycarboxylic acid, and a polycarboxylic acid ester. According to the invention, provided is a polishing liquid for metal film, by which polishing can be performed at a high rate even under a polishing pressure as low as 1 psi or lower, and such that a polished film after polishing is excellent in planarity, furthermore, with which a high polishing rate can be obtained even in an initial stage of polishing, and provided is a polishing method using the polishing liquid.
本发明涉及一种
金属膜抛光液,它由 7.0%(按重量计)或更多的
金属氧化剂、
水溶性聚合物、
氧化金属溶解剂、
金属
防腐剂和
水组成,条件是
金属膜抛光液的总量按重量计为 100%、
其中,
水溶性聚合物的重量平均分子量为 150,000 或以上,并且至少是选自聚
羧酸、聚
羧酸盐和聚
羧酸酯中的一种。根据本发明,提供了一种用于
金属膜的抛光液,通过该抛光液,即使在低至 1 psi 或更低的抛光压力下也能以高抛光率进行抛光,并且抛光后的抛光膜平面度极佳,此外,通过该抛光液,即使在抛光的初始阶段也能获得高抛光率,还提供了一种使用该抛光液的抛光方法。