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2-[(2,3-环氧丙氧基)甲基]-2-(羟基甲基)丙烷-1,3-二醇 | 55206-69-4

中文名称
2-[(2,3-环氧丙氧基)甲基]-2-(羟基甲基)丙烷-1,3-二醇
中文别名
——
英文名称
2-((2,3-Epoxypropoxy)methyl)-2-(hydroxymethyl)propane-1,3-diol
英文别名
2-(hydroxymethyl)-2-(oxiran-2-ylmethoxymethyl)propane-1,3-diol
2-[(2,3-环氧丙氧基)甲基]-2-(羟基甲基)丙烷-1,3-二醇化学式
CAS
55206-69-4
化学式
C8H16O5
mdl
——
分子量
192.21
InChiKey
SRTFSXUQGZSYIO-UHFFFAOYSA-N
BEILSTEIN
——
EINECS
——
  • 物化性质
  • 计算性质
  • ADMET
  • 安全信息
  • SDS
  • 制备方法与用途
  • 上下游信息
  • 反应信息
  • 文献信息
  • 表征谱图
  • 同类化合物
  • 相关功能分类
  • 相关结构分类

计算性质

  • 辛醇/水分配系数(LogP):
    -2.2
  • 重原子数:
    13
  • 可旋转键数:
    7
  • 环数:
    1.0
  • sp3杂化的碳原子比例:
    1.0
  • 拓扑面积:
    82.4
  • 氢给体数:
    3
  • 氢受体数:
    5

文献信息

  • METHOD FOR PREPARING A COMPOUND COMPRISING AT LEAST ONE BETA-HYDROXY-URETHANE UNIT AND/OR AT LEAST ONE UPSILON-HYDROXY-URETHANE UNIT
    申请人:Soules Aurélien
    公开号:US20140378648A1
    公开(公告)日:2014-12-25
    The invention relates to a method for preparing a compound comprising at least one β-hydroxy-urethane unit and/or at least one γ-hydroxy-urethane unit, consisting in reacting a compound (A) comprising at least one cyclocarbonate reactive unit with a compound (B) comprising at least one amino reactive unit (—NH2) in the presence of a catalyst. The invention also relates to the use of a catalyst comprising at least one organometallic complex and a co-catalyst chosen from the group of Lewis bases and/or tetra-alkyl ammonium salts, in order to catalyse the method of the invention. The invention relates to the technical field of preparing urethane derivatives.
    该发明涉及一种制备至少含有一个β-羟基脲基和/或至少含有一个γ-羟基脲基的化合物的方法,包括将至少含有一个环碳酸酯反应单元的化合物(A)与至少含有一个氨基反应单元(—NH2)的化合物(B)在催化剂存在下反应。该发明还涉及使用至少含有一个有机金属配合物和从Lewis碱和/或四烷基铵盐组中选择的共催化剂的催化剂,以催化该发明的方法。该发明涉及制备脲基衍生物的技术领域。
  • [EN] KETAL ESTER DERIVATIVES<br/>[FR] DÉRIVÉS CÉTO-ESTERS
    申请人:SEGETIS INC
    公开号:WO2010036884A1
    公开(公告)日:2010-04-01
    The present disclosure relates to the preparation of acrylate, alkacrylate, allyl, and polycarbonate derivatives of hydroxy ketal esters, and uses thereof.
    本公开涉及羟基缩醛酮酯的丙烯酸酯、烯丙酸酯、烯丙基和聚碳酸酯衍生物的制备以及它们的用途。
  • PHOTOSENSITIVE INSULATION RESIN COMPOSITION AND CURED PRODUCT THEREOF
    申请人:Ito Atsushi
    公开号:US20090239080A1
    公开(公告)日:2009-09-24
    An object of the present invention is to provide a cured product which is excellent in characteristics such as an electric insulation property, a heat impact resistance, an adhesive property and the like and to provide a photosensitive insulation resin composition from which the above cured product can be obtained and which is suited to uses such as an interlayer insulation film, a surface protecting layer and the like in semiconductor elements. The photosensitive insulation resin composition according to the present invention is characterized by comprising (A) a copolymer comprising 10 to 99 mole % of a constitutional unit (A1) represented by the following Formula (1) and 90 to 1 mole % of a constitutional unit (A2) represented by the following Formula (2) (provided that the total of all constitutional units constituting the above copolymer (A) is 100 mole %): (wherein R 1 represents an alkyl group having 1 to 4 carbon atoms, an alkoxy group or an aryl group; R 2 represents a hydrogen atom or methyl; m is an integer of 1 to 3, and n is an integer of 0 to 3; and m+n≦5; R 3 represents an alkyl group having 1 to 4 carbon atoms, an alkoxy group or an aryl group; R 4 represents a hydrogen atom or methyl; and k is an integer of 0 to 3), (B) a compound (B1) having an oxetanyl group, (C) a photosensitive acid generator, (D) a solvent and (F) cross-linked fine particles.
    本发明的目的是提供一种具有优异的电气绝缘性、耐热冲击性、粘附性等特性的固化产品,并提供一种光敏绝缘树脂组合物,该组合物适用于半导体元件中的层间绝缘膜、表面保护层等用途。本发明的光敏绝缘树脂组合物的特点在于包括(A)共聚物,该共聚物包括以下式(1)所表示的构成单元(A1)的10至99摩尔%和以下式(2)所表示的构成单元(A2)的90至1摩尔%(其中,构成上述共聚物(A)的所有构成单元的总和为100摩尔%):(式中,R1表示具有1至4个碳原子的烷基、烷氧基或芳基;R2表示氢原子或甲基;m为1至3的整数,n为0至3的整数;且m+n≤5;R3表示具有1至4个碳原子的烷基、烷氧基或芳基;R4表示氢原子或甲基;k为0至3的整数),(B)具有氧杂环丙基基团的化合物(B1),(C)光敏酸发生剂,(D)溶剂和(F)交联细粒子。
  • PHOTOSENSITIVE INSULATING RESIN COMPOSITION, CURED PRODUCT THEREOF AND ABA BLOCK COPOLYMER
    申请人:ITO Atsushi
    公开号:US20110172349A1
    公开(公告)日:2011-07-14
    A photosensitive insulating resin composition includes a block copolymer, a crosslinking agent, a photosensitive compound, and a solvent. The block copolymer includes a first structural unit shown by a following formula (1) and a second structural unit shown by a following formula (2), wherein R 1 represents a hydrogen atom or an alkyl group having 1 to 4 carbon atoms, and R 2 represents an alkyl group having 1 to 4 carbon atoms.
    一种光敏绝缘树脂组合物,包括嵌段共聚物、交联剂、光敏化合物和溶剂。嵌段共聚物包括以下公式(1)所示的第一结构单元和以下公式(2)所示的第二结构单元,其中R1代表氢原子或具有1至4个碳原子的烷基基团,R2代表具有1至4个碳原子的烷基基团。
  • RESIN COMPOSITION, POLYMER, CURED FILM AND ELECTRONIC PART
    申请人:HIRO Akito
    公开号:US20130012618A1
    公开(公告)日:2013-01-10
    Provided are a resin composition capable of forming a cured film excellent in elongation properties; a polymer suitable as a component contained in the composition; a cured film formed from the composition; and an electronic part including the cured film. The resin composition includes (A) a polymer containing a structural unit represented by the formula (a1) and a structural unit represented by the formula (a2); and (F) a solvent, wherein in the formula (a1), R 1 s are each independently a hydrogen atom or hydroxyl group, provided that at least one R 1 is hydroxyl group; and R 2 is a hydrogen atom or a C1-4 alkyl group; and in the formula (a2), R 3 s are each independently a group having a cationic polymerizable group, or a hydrogen atom, provided that at least one R 3 is a group having a cationic polymerizable group; and R 4 is a hydrogen atom or a C1-4 alkyl group.
    提供了一种树脂组合物,能够形成具有良好延展性的固化膜;一种适用于组合物中的组分的聚合物;由该组合物形成的固化膜;以及包括固化膜的电子部件。该树脂组合物包括(A)含有由公式(a1)表示的结构单元和由公式(a2)表示的结构单元的聚合物;以及(F)溶剂,其中在公式(a1)中,R1分别是氢原子或羟基,但至少一个R1是羟基;R2是氢原子或C1-4烷基;在公式(a2)中,R3分别是具有阳离子聚合物化基团的基团或氢原子,但至少一个R3是具有阳离子聚合物化基团的基团;R4是氢原子或C1-4烷基。
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